JPS55105329A - Inspecting method for pattern - Google Patents

Inspecting method for pattern

Info

Publication number
JPS55105329A
JPS55105329A JP16481278A JP16481278A JPS55105329A JP S55105329 A JPS55105329 A JP S55105329A JP 16481278 A JP16481278 A JP 16481278A JP 16481278 A JP16481278 A JP 16481278A JP S55105329 A JPS55105329 A JP S55105329A
Authority
JP
Japan
Prior art keywords
signal
pattern
sweeped
light
receiver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16481278A
Other languages
Japanese (ja)
Other versions
JPS6227533B2 (en
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16481278A priority Critical patent/JPS55105329A/en
Publication of JPS55105329A publication Critical patent/JPS55105329A/en
Publication of JPS6227533B2 publication Critical patent/JPS6227533B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE: To make inspecting work rapid without using large memory by a method wherein comparison is made between the first sweeped signal which is gained basing on the standard pattern data and the second sweeped signal which is gained by sweeping inspected pattern.
CONSTITUTION: Illumination is made from the light source 2 to the reverse face of the inspected pattern 1 suhc as a reticle and the light receiver 4 receives transmitted surface light through the optical sweeper 3. At this process the optical sweeper 3 sweeps all surface of the pattern 1 referring the position of the moving stage of pattern 1, and the light signal is input to the lighr receiver 4 sequentially. The sweeped signal P which is obtained by the light receiver 4 converting the light signal into the electric signal is injected differential comparator 6 through the amplifier 5. On the another part comparator 6 receives sweeped signal D which is obtained from the pattern generator 7 refering the pattern 1. In addition to this, optical sweeper 3 is drived by the pattern generator 7 and syncronization between signal P and D is maintained. Thus by comparing two signal at differential comparator 6 the display 8 shows the result.
COPYRIGHT: (C)1980,JPO&Japio
JP16481278A 1978-12-28 1978-12-28 Inspecting method for pattern Granted JPS55105329A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16481278A JPS55105329A (en) 1978-12-28 1978-12-28 Inspecting method for pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16481278A JPS55105329A (en) 1978-12-28 1978-12-28 Inspecting method for pattern

Publications (2)

Publication Number Publication Date
JPS55105329A true JPS55105329A (en) 1980-08-12
JPS6227533B2 JPS6227533B2 (en) 1987-06-15

Family

ID=15800379

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16481278A Granted JPS55105329A (en) 1978-12-28 1978-12-28 Inspecting method for pattern

Country Status (1)

Country Link
JP (1) JPS55105329A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138135A (en) * 1981-02-20 1982-08-26 Hitachi Ltd Method and apparatus for inspecting pattern
JPS57159023A (en) * 1981-03-27 1982-10-01 Hitachi Ltd Inspecting device of pattern
JPS58151544A (en) * 1982-03-05 1983-09-08 Nippon Jido Seigyo Kk Defect inspecting device by dark view field
JPS60103616A (en) * 1983-11-11 1985-06-07 Hitachi Tokyo Electronics Co Ltd Method of inspection of defect
JPS60201630A (en) * 1984-03-23 1985-10-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of forming inspecting pattern
US5048094A (en) * 1988-11-29 1991-09-10 Nippon Seiko Kabushiki Kaisha Method and apparatus for checking pattern

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (en) * 1974-03-27 1975-10-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50127574A (en) * 1974-03-27 1975-10-07

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138135A (en) * 1981-02-20 1982-08-26 Hitachi Ltd Method and apparatus for inspecting pattern
JPS57159023A (en) * 1981-03-27 1982-10-01 Hitachi Ltd Inspecting device of pattern
JPS58151544A (en) * 1982-03-05 1983-09-08 Nippon Jido Seigyo Kk Defect inspecting device by dark view field
JPS60103616A (en) * 1983-11-11 1985-06-07 Hitachi Tokyo Electronics Co Ltd Method of inspection of defect
JPH056177B2 (en) * 1983-11-11 1993-01-26 Hitachi Tokyo Erekutoronikusu Kk
JPS60201630A (en) * 1984-03-23 1985-10-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of forming inspecting pattern
JPH032292B2 (en) * 1984-03-23 1991-01-14 Intaanashonaru Bijinesu Mashiinzu Corp
US5048094A (en) * 1988-11-29 1991-09-10 Nippon Seiko Kabushiki Kaisha Method and apparatus for checking pattern

Also Published As

Publication number Publication date
JPS6227533B2 (en) 1987-06-15

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