JPH0560660B2 - - Google Patents
Info
- Publication number
- JPH0560660B2 JPH0560660B2 JP61284627A JP28462786A JPH0560660B2 JP H0560660 B2 JPH0560660 B2 JP H0560660B2 JP 61284627 A JP61284627 A JP 61284627A JP 28462786 A JP28462786 A JP 28462786A JP H0560660 B2 JPH0560660 B2 JP H0560660B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- suction
- cleaning
- suction surface
- pure water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 claims description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000004065 semiconductor Substances 0.000 claims description 10
- 235000012431 wafers Nutrition 0.000 description 73
- 230000032258 transport Effects 0.000 description 7
- 239000000428 dust Substances 0.000 description 4
- 230000003749 cleanliness Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61284627A JPS63137448A (ja) | 1986-11-29 | 1986-11-29 | 半導体ウエハ処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61284627A JPS63137448A (ja) | 1986-11-29 | 1986-11-29 | 半導体ウエハ処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63137448A JPS63137448A (ja) | 1988-06-09 |
JPH0560660B2 true JPH0560660B2 (US07655688-20100202-C00086.png) | 1993-09-02 |
Family
ID=17680912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61284627A Granted JPS63137448A (ja) | 1986-11-29 | 1986-11-29 | 半導体ウエハ処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63137448A (US07655688-20100202-C00086.png) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2588731B2 (ja) * | 1987-10-22 | 1997-03-12 | 東芝機械株式会社 | ロボット式ウエハ搬送装置 |
JPH0286868A (ja) * | 1988-09-21 | 1990-03-27 | Daiken Kagaku Kogyo Kk | 塗膜装置 |
JPH04186860A (ja) * | 1990-11-21 | 1992-07-03 | Hitachi Ltd | 搬送機構 |
US5271702A (en) * | 1992-02-03 | 1993-12-21 | Environmental Research Institute Of Michigan | Robotic substrate manipulator |
US5966635A (en) * | 1997-01-31 | 1999-10-12 | Motorola, Inc. | Method for reducing particles on a substrate using chuck cleaning |
JP4672924B2 (ja) * | 2001-08-02 | 2011-04-20 | 株式会社ディスコ | 吸着パッド洗浄装置及び該装置を用いた吸着パッド洗浄方法 |
JP4748263B2 (ja) * | 2009-09-28 | 2011-08-17 | 東京エレクトロン株式会社 | 塗布、現像装置 |
JP7339860B2 (ja) * | 2019-11-15 | 2023-09-06 | 株式会社ディスコ | 加工装置 |
-
1986
- 1986-11-29 JP JP61284627A patent/JPS63137448A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS63137448A (ja) | 1988-06-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |