JPH0558068B2 - - Google Patents
Info
- Publication number
- JPH0558068B2 JPH0558068B2 JP61147514A JP14751486A JPH0558068B2 JP H0558068 B2 JPH0558068 B2 JP H0558068B2 JP 61147514 A JP61147514 A JP 61147514A JP 14751486 A JP14751486 A JP 14751486A JP H0558068 B2 JPH0558068 B2 JP H0558068B2
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- hydrogen
- thermal conductivity
- carbon
- carbon film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 19
- 239000001257 hydrogen Substances 0.000 claims description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 17
- 229910052799 carbon Inorganic materials 0.000 claims description 17
- 238000000034 method Methods 0.000 description 9
- 229910003460 diamond Inorganic materials 0.000 description 7
- 239000010432 diamond Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 230000002194 synthesizing effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61147514A JPS634068A (ja) | 1986-06-23 | 1986-06-23 | ダイヤモンド状カ−ボン膜 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61147514A JPS634068A (ja) | 1986-06-23 | 1986-06-23 | ダイヤモンド状カ−ボン膜 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS634068A JPS634068A (ja) | 1988-01-09 |
JPH0558068B2 true JPH0558068B2 (fr) | 1993-08-25 |
Family
ID=15432060
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61147514A Granted JPS634068A (ja) | 1986-06-23 | 1986-06-23 | ダイヤモンド状カ−ボン膜 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS634068A (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2728918B2 (ja) * | 1988-11-30 | 1998-03-18 | 株式会社リコー | 液体噴射記録ヘッド |
WO2000071780A1 (fr) * | 1999-05-19 | 2000-11-30 | Mitsubishi Shoji Plastics Corporation | Film dlc, contenant en plastique recouvert de dlc, et procede et appareil de fabrication de contenant en plastique recouvert de dlc |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5842473A (ja) * | 1981-09-07 | 1983-03-11 | Semiconductor Energy Lab Co Ltd | サ−マルヘツド作製方法 |
JPS5842472A (ja) * | 1981-09-07 | 1983-03-11 | Semiconductor Energy Lab Co Ltd | サ−マルヘツド |
JPS60157725A (ja) * | 1984-01-26 | 1985-08-19 | Denki Kagaku Kogyo Kk | 磁気記憶媒体 |
JPS60195092A (ja) * | 1984-03-15 | 1985-10-03 | Tdk Corp | カ−ボン系薄膜の製造方法および装置 |
-
1986
- 1986-06-23 JP JP61147514A patent/JPS634068A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5842473A (ja) * | 1981-09-07 | 1983-03-11 | Semiconductor Energy Lab Co Ltd | サ−マルヘツド作製方法 |
JPS5842472A (ja) * | 1981-09-07 | 1983-03-11 | Semiconductor Energy Lab Co Ltd | サ−マルヘツド |
JPS60157725A (ja) * | 1984-01-26 | 1985-08-19 | Denki Kagaku Kogyo Kk | 磁気記憶媒体 |
JPS60195092A (ja) * | 1984-03-15 | 1985-10-03 | Tdk Corp | カ−ボン系薄膜の製造方法および装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS634068A (ja) | 1988-01-09 |
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