JPH0556847B2 - - Google Patents
Info
- Publication number
- JPH0556847B2 JPH0556847B2 JP61034136A JP3413686A JPH0556847B2 JP H0556847 B2 JPH0556847 B2 JP H0556847B2 JP 61034136 A JP61034136 A JP 61034136A JP 3413686 A JP3413686 A JP 3413686A JP H0556847 B2 JPH0556847 B2 JP H0556847B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- wafer
- rotation speed
- speed
- coating method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000576 coating method Methods 0.000 claims description 14
- 230000003247 decreasing effect Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3413686A JPS62190838A (ja) | 1986-02-18 | 1986-02-18 | レジスト塗布方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3413686A JPS62190838A (ja) | 1986-02-18 | 1986-02-18 | レジスト塗布方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62190838A JPS62190838A (ja) | 1987-08-21 |
JPH0556847B2 true JPH0556847B2 (ko) | 1993-08-20 |
Family
ID=12405802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3413686A Granted JPS62190838A (ja) | 1986-02-18 | 1986-02-18 | レジスト塗布方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62190838A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102351607B1 (ko) * | 2021-06-18 | 2022-01-18 | 한국수자원공사 | 수계로부터 플라스틱을 분리하는 장치 및 이를 이용한 분리방법 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3280791B2 (ja) | 1994-02-17 | 2002-05-13 | 東京応化工業株式会社 | 塗膜形成方法 |
JP3824334B2 (ja) | 1995-08-07 | 2006-09-20 | 東京応化工業株式会社 | シリカ系被膜形成用塗布液及び被膜形成方法 |
JP5401763B2 (ja) * | 2007-03-30 | 2014-01-29 | 富士通セミコンダクター株式会社 | 塗布液の塗布方法及び半導体装置の製造方法 |
CN111266265B (zh) * | 2018-12-05 | 2021-10-08 | 长鑫存储技术有限公司 | 一种半导体的涂布设备及涂布方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59154444A (ja) * | 1983-02-23 | 1984-09-03 | Toshiba Corp | レジスト塗布方法 |
-
1986
- 1986-02-18 JP JP3413686A patent/JPS62190838A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59154444A (ja) * | 1983-02-23 | 1984-09-03 | Toshiba Corp | レジスト塗布方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102351607B1 (ko) * | 2021-06-18 | 2022-01-18 | 한국수자원공사 | 수계로부터 플라스틱을 분리하는 장치 및 이를 이용한 분리방법 |
Also Published As
Publication number | Publication date |
---|---|
JPS62190838A (ja) | 1987-08-21 |
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