JPH0555016B2 - - Google Patents
Info
- Publication number
- JPH0555016B2 JPH0555016B2 JP61059779A JP5977986A JPH0555016B2 JP H0555016 B2 JPH0555016 B2 JP H0555016B2 JP 61059779 A JP61059779 A JP 61059779A JP 5977986 A JP5977986 A JP 5977986A JP H0555016 B2 JPH0555016 B2 JP H0555016B2
- Authority
- JP
- Japan
- Prior art keywords
- photographic
- cation
- colloidal silica
- paper
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/853—Inorganic compounds, e.g. metals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/95—Photosensitive materials characterised by the base or auxiliary layers rendered opaque or writable, e.g. with inert particulate additives
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Paper (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61059779A JPS62215950A (ja) | 1986-03-17 | 1986-03-17 | 写真感光材料 |
US07/273,156 US4895792A (en) | 1986-03-17 | 1988-11-18 | Photographic light-sensitive Silver halide element with antistatic backing layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61059779A JPS62215950A (ja) | 1986-03-17 | 1986-03-17 | 写真感光材料 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62215950A JPS62215950A (ja) | 1987-09-22 |
JPH0555016B2 true JPH0555016B2 (en, 2012) | 1993-08-16 |
Family
ID=13123119
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61059779A Granted JPS62215950A (ja) | 1986-03-17 | 1986-03-17 | 写真感光材料 |
Country Status (2)
Country | Link |
---|---|
US (1) | US4895792A (en, 2012) |
JP (1) | JPS62215950A (en, 2012) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5258275A (en) * | 1989-10-13 | 1993-11-02 | Konica Corporation | Silver halide photographic light-sensitive material and the process of preparing the same |
US5213887A (en) * | 1991-09-03 | 1993-05-25 | Minnesota Mining And Manufacturing Company | Antistatic coatings |
US5348799A (en) * | 1991-09-03 | 1994-09-20 | Minnesota Mining And Manufacturing Company | Antistatic coatings comprising chitosan acid salt and metal oxide particles |
US5233049A (en) * | 1991-10-29 | 1993-08-03 | Occidental Chemical Corporation | Highly fluorinated bis-imides |
US5244728A (en) * | 1992-02-24 | 1993-09-14 | Eastman Kodak Company | Antistat layers having print retaining qualities |
DE4213869A1 (de) * | 1992-04-28 | 1993-11-04 | Agfa Gevaert Ag | Fotografisches material |
US5344751A (en) * | 1993-05-28 | 1994-09-06 | Minnesota Mining And Manufacturing Company | Antistatic coatings |
US5236818A (en) * | 1992-11-02 | 1993-08-17 | Minnesota Mining And Manufacturing Company | Antistatic coatings |
US6114079A (en) * | 1998-04-01 | 2000-09-05 | Eastman Kodak Company | Electrically-conductive layer for imaging element containing composite metal-containing particles |
US9074167B2 (en) * | 2011-09-28 | 2015-07-07 | Jilin Hengtai Garment Washing and Dyeing Science and Technology Institute | Color enhancing detergent for colored textile and preparation method therefor |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3007878A (en) * | 1956-11-01 | 1961-11-07 | Du Pont | Aquasols of positively-charged coated silica particles and their production |
BE582190A (en, 2012) * | 1958-09-25 | |||
JPS5218020B2 (en, 2012) * | 1972-03-14 | 1977-05-19 | ||
JPS6049894B2 (ja) * | 1980-12-23 | 1985-11-05 | 富士写真フイルム株式会社 | 写真感光材料 |
US4544622A (en) * | 1984-07-19 | 1985-10-01 | Minnesota Mining And Manufacturing Company | Negative-acting photoresist imaging system |
-
1986
- 1986-03-17 JP JP61059779A patent/JPS62215950A/ja active Granted
-
1988
- 1988-11-18 US US07/273,156 patent/US4895792A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS62215950A (ja) | 1987-09-22 |
US4895792A (en) | 1990-01-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |