JPH0554622B2 - - Google Patents

Info

Publication number
JPH0554622B2
JPH0554622B2 JP18102584A JP18102584A JPH0554622B2 JP H0554622 B2 JPH0554622 B2 JP H0554622B2 JP 18102584 A JP18102584 A JP 18102584A JP 18102584 A JP18102584 A JP 18102584A JP H0554622 B2 JPH0554622 B2 JP H0554622B2
Authority
JP
Japan
Prior art keywords
illumination
inspected
image
binarization
defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP18102584A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6157837A (ja
Inventor
Yukihiro Goto
Nobushi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP18102584A priority Critical patent/JPS6157837A/ja
Publication of JPS6157837A publication Critical patent/JPS6157837A/ja
Publication of JPH0554622B2 publication Critical patent/JPH0554622B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Closed-Circuit Television Systems (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP18102584A 1984-08-30 1984-08-30 外観検査装置 Granted JPS6157837A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18102584A JPS6157837A (ja) 1984-08-30 1984-08-30 外観検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18102584A JPS6157837A (ja) 1984-08-30 1984-08-30 外観検査装置

Publications (2)

Publication Number Publication Date
JPS6157837A JPS6157837A (ja) 1986-03-24
JPH0554622B2 true JPH0554622B2 (enExample) 1993-08-13

Family

ID=16093445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18102584A Granted JPS6157837A (ja) 1984-08-30 1984-08-30 外観検査装置

Country Status (1)

Country Link
JP (1) JPS6157837A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0541551Y2 (enExample) * 1987-02-16 1993-10-20
JP2801916B2 (ja) * 1988-09-29 1998-09-21 大日本印刷株式会社 欠陥検査装置
JPH04297886A (ja) * 1991-03-05 1992-10-21 Mitsubishi Electric Corp レーザ測距装置
JP3189500B2 (ja) * 1993-06-25 2001-07-16 松下電器産業株式会社 電子部品の外観検査装置および外観検査方法
JP5022793B2 (ja) * 2007-07-02 2012-09-12 日東電工株式会社 半導体ウエハの欠陥位置検出方法
CN104458763A (zh) * 2014-12-12 2015-03-25 元亮科技有限公司 广视野表面缺陷检测装置
JP7102271B2 (ja) * 2018-07-17 2022-07-19 ファスフォードテクノロジ株式会社 半導体製造装置および半導体装置の製造方法
CN110208286B (zh) * 2019-06-21 2020-08-28 上海精测半导体技术有限公司 一种检测设备

Also Published As

Publication number Publication date
JPS6157837A (ja) 1986-03-24

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees