JPH055368B2 - - Google Patents

Info

Publication number
JPH055368B2
JPH055368B2 JP62260224A JP26022487A JPH055368B2 JP H055368 B2 JPH055368 B2 JP H055368B2 JP 62260224 A JP62260224 A JP 62260224A JP 26022487 A JP26022487 A JP 26022487A JP H055368 B2 JPH055368 B2 JP H055368B2
Authority
JP
Japan
Prior art keywords
mask
stage
wafer
alignment
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62260224A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01101629A (ja
Inventor
Ryoji Tanaka
Hidekazu Kono
Joji Iwata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP62260224A priority Critical patent/JPH01101629A/ja
Publication of JPH01101629A publication Critical patent/JPH01101629A/ja
Publication of JPH055368B2 publication Critical patent/JPH055368B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62260224A 1987-10-14 1987-10-14 マスクとウェハのプリアライメント方法 Granted JPH01101629A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62260224A JPH01101629A (ja) 1987-10-14 1987-10-14 マスクとウェハのプリアライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62260224A JPH01101629A (ja) 1987-10-14 1987-10-14 マスクとウェハのプリアライメント方法

Publications (2)

Publication Number Publication Date
JPH01101629A JPH01101629A (ja) 1989-04-19
JPH055368B2 true JPH055368B2 (ko) 1993-01-22

Family

ID=17345075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62260224A Granted JPH01101629A (ja) 1987-10-14 1987-10-14 マスクとウェハのプリアライメント方法

Country Status (1)

Country Link
JP (1) JPH01101629A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0683276U (ja) * 1993-05-12 1994-11-29 株式会社日立ビルシステムサービス プリント板取外し治具

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH098103A (ja) * 1995-06-19 1997-01-10 Nikon Corp 投影露光装置及び投影露光方法
JP2005340315A (ja) * 2004-05-25 2005-12-08 Nikon Corp 位置合わせ装置、露光装置、位置合わせ方法及び露光方法、並びにデバイス製造方法及び較正用（工具）レチクル

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0683276U (ja) * 1993-05-12 1994-11-29 株式会社日立ビルシステムサービス プリント板取外し治具

Also Published As

Publication number Publication date
JPH01101629A (ja) 1989-04-19

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