JPH0552487B2 - - Google Patents

Info

Publication number
JPH0552487B2
JPH0552487B2 JP58100689A JP10068983A JPH0552487B2 JP H0552487 B2 JPH0552487 B2 JP H0552487B2 JP 58100689 A JP58100689 A JP 58100689A JP 10068983 A JP10068983 A JP 10068983A JP H0552487 B2 JPH0552487 B2 JP H0552487B2
Authority
JP
Japan
Prior art keywords
light source
lens
fly
eye lens
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58100689A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59226317A (ja
Inventor
Masato Shibuya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP58100689A priority Critical patent/JPS59226317A/ja
Publication of JPS59226317A publication Critical patent/JPS59226317A/ja
Publication of JPH0552487B2 publication Critical patent/JPH0552487B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0911—Anamorphotic systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58100689A 1983-06-06 1983-06-06 照明装置 Granted JPS59226317A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58100689A JPS59226317A (ja) 1983-06-06 1983-06-06 照明装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58100689A JPS59226317A (ja) 1983-06-06 1983-06-06 照明装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP1087787A Division JPH01295215A (ja) 1989-04-06 1989-04-06 照明装置

Publications (2)

Publication Number Publication Date
JPS59226317A JPS59226317A (ja) 1984-12-19
JPH0552487B2 true JPH0552487B2 (ru) 1993-08-05

Family

ID=14280693

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58100689A Granted JPS59226317A (ja) 1983-06-06 1983-06-06 照明装置

Country Status (1)

Country Link
JP (1) JPS59226317A (ru)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0785140B2 (ja) * 1985-11-22 1995-09-13 株式会社ニコン 照明光学系
JPH0624180B2 (ja) * 1986-04-02 1994-03-30 株式会社日立製作所 投影露光方法及びその装置
JPS62199714U (ru) * 1986-06-06 1987-12-19
JPH07113736B2 (ja) * 1986-09-26 1995-12-06 キヤノン株式会社 照明装置
JP2606797B2 (ja) * 1986-10-24 1997-05-07 キヤノン株式会社 照明装置及びそれを用いた照明方法
JP2552123B2 (ja) * 1986-11-13 1996-11-06 キヤノン株式会社 画像投影装置
JP2569711B2 (ja) * 1988-04-07 1997-01-08 株式会社ニコン 露光制御装置及び該装置による露光方法
US4918583A (en) * 1988-04-25 1990-04-17 Nikon Corporation Illuminating optical device
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
JP2706350B2 (ja) * 1990-04-27 1998-01-28 キヤノン株式会社 レーザによる孔明け加工機
US6819414B1 (en) 1998-05-19 2004-11-16 Nikon Corporation Aberration measuring apparatus, aberration measuring method, projection exposure apparatus having the same measuring apparatus, device manufacturing method using the same measuring method, and exposure method
JP2000193443A (ja) * 1998-12-28 2000-07-14 Hitachi Ltd パタ―ン欠陥検査方法及びその装置
US6900888B2 (en) 2001-09-13 2005-05-31 Hitachi High-Technologies Corporation Method and apparatus for inspecting a pattern formed on a substrate
US6927847B2 (en) 2001-09-13 2005-08-09 Hitachi High-Technologies Corporation Method and apparatus for inspecting pattern defects
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
JP4260587B2 (ja) 2003-09-18 2009-04-30 株式会社日立ハイテクノロジーズ パターン欠陥検査装置
EP1670043B1 (en) 2003-09-29 2013-02-27 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
TWI457712B (zh) 2003-10-28 2014-10-21 尼康股份有限公司 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI494972B (zh) 2004-02-06 2015-08-01 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US7796274B2 (en) 2004-06-04 2010-09-14 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
KR20170089028A (ko) 2005-05-12 2017-08-02 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 디바이스 제조 방법
CN101203802B (zh) * 2005-06-20 2010-05-19 松下电器产业株式会社 二维图像显示装置、照明光源及曝光照明装置
US7948606B2 (en) 2006-04-13 2011-05-24 Asml Netherlands B.V. Moving beam with respect to diffractive optics in order to reduce interference patterns
US7728954B2 (en) 2006-06-06 2010-06-01 Asml Netherlands B.V. Reflective loop system producing incoherent radiation
US7649676B2 (en) 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5740190B2 (ja) * 2011-03-28 2015-06-24 ギガフォトン株式会社 レーザシステムおよびレーザ生成方法
JP5708925B2 (ja) * 2011-05-10 2015-04-30 大日本印刷株式会社 露光装置及び露光用光学装置
JP6090415B2 (ja) * 2015-11-27 2017-03-08 大日本印刷株式会社 光学モジュール

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50103976A (ru) * 1974-01-12 1975-08-16
JPS5681813A (en) * 1979-12-08 1981-07-04 Nippon Telegr & Teleph Corp <Ntt> Mask lighting optical system
JPS56160040A (en) * 1980-05-14 1981-12-09 Canon Inc Printing device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50103976A (ru) * 1974-01-12 1975-08-16
JPS5681813A (en) * 1979-12-08 1981-07-04 Nippon Telegr & Teleph Corp <Ntt> Mask lighting optical system
JPS56160040A (en) * 1980-05-14 1981-12-09 Canon Inc Printing device

Also Published As

Publication number Publication date
JPS59226317A (ja) 1984-12-19

Similar Documents

Publication Publication Date Title
JPH0552487B2 (ru)
JP3264224B2 (ja) 照明装置及びそれを用いた投影露光装置
EP0266203B1 (en) An illumination device
JP3913287B2 (ja) フォトリソグラフィー用ハイブリッド照明系
TW396397B (en) Illumination system and exposure apparatus having the same
US4619508A (en) Illumination optical arrangement
JP2655465B2 (ja) 反射型ホモジナイザーおよび反射型照明光学装置
TWI358615B (en) Illumination system
JP2006065348A (ja) 正または負の光学力を有する光学要素を用いる照射プロフィール形成方法
JP3278277B2 (ja) 投影露光装置及びこれを用いたデバイス製造方法
JP2997351B2 (ja) 照明光学装置
JPH05509178A (ja) 顕微鏡のための共焦点画像システム
JPH0375846B2 (ru)
JPS63114186A (ja) 照明装置
JPS63100461A (ja) 照明装置
JPH0744141B2 (ja) 照明光学装置
JP2712342B2 (ja) 照明光学装置およびそれを用いた露光装置
JPH1062710A (ja) 照明光学系
JPH0624180B2 (ja) 投影露光方法及びその装置
JPS62265613A (ja) 光ビ−ムの２次元町偏向装置
JPS6381420A (ja) 照明装置
JP2788434B2 (ja) 投影露光方法及びその装置
JPH04123017A (ja) 位相シフト素子及びそれを用いたレーザ装置
JPH01109720A (ja) 照明装置
JP2004047786A (ja) 照明光学装置，露光装置および露光方法