JPH0547099B2 - - Google Patents

Info

Publication number
JPH0547099B2
JPH0547099B2 JP61033291A JP3329186A JPH0547099B2 JP H0547099 B2 JPH0547099 B2 JP H0547099B2 JP 61033291 A JP61033291 A JP 61033291A JP 3329186 A JP3329186 A JP 3329186A JP H0547099 B2 JPH0547099 B2 JP H0547099B2
Authority
JP
Japan
Prior art keywords
polymer
resist
molecular weight
silane
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61033291A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62190229A (ja
Inventor
Kazuhide Saigo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP3329186A priority Critical patent/JPS62190229A/ja
Publication of JPS62190229A publication Critical patent/JPS62190229A/ja
Publication of JPH0547099B2 publication Critical patent/JPH0547099B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0754—Non-macromolecular compounds containing silicon-to-silicon bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
JP3329186A 1986-02-17 1986-02-17 シラン系レジスト材料 Granted JPS62190229A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3329186A JPS62190229A (ja) 1986-02-17 1986-02-17 シラン系レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3329186A JPS62190229A (ja) 1986-02-17 1986-02-17 シラン系レジスト材料

Publications (2)

Publication Number Publication Date
JPS62190229A JPS62190229A (ja) 1987-08-20
JPH0547099B2 true JPH0547099B2 (cs) 1993-07-15

Family

ID=12382432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3329186A Granted JPS62190229A (ja) 1986-02-17 1986-02-17 シラン系レジスト材料

Country Status (1)

Country Link
JP (1) JPS62190229A (cs)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990007540A1 (en) * 1988-12-29 1990-07-12 Canon Kabushiki Kaisha New polysilane compound and electrophotographic photoreceptor produced therefrom

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59210940A (ja) * 1983-03-31 1984-11-29 ユニオン・カ−バイド・コ−ポレ−シヨン 炭化珪素用のオレフイン基含有ポリシラン先駆体類
JPS6259632A (ja) * 1985-09-09 1987-03-16 Toyota Central Res & Dev Lab Inc 導電性ポリシランの製造方法

Also Published As

Publication number Publication date
JPS62190229A (ja) 1987-08-20

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