JPH0547091B2 - - Google Patents

Info

Publication number
JPH0547091B2
JPH0547091B2 JP11886386A JP11886386A JPH0547091B2 JP H0547091 B2 JPH0547091 B2 JP H0547091B2 JP 11886386 A JP11886386 A JP 11886386A JP 11886386 A JP11886386 A JP 11886386A JP H0547091 B2 JPH0547091 B2 JP H0547091B2
Authority
JP
Japan
Prior art keywords
measurement
reticle
light
detection means
light beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11886386A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62274248A (ja
Inventor
Eiichi Murakami
Michio Kono
Akyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61118863A priority Critical patent/JPS62274248A/ja
Publication of JPS62274248A publication Critical patent/JPS62274248A/ja
Priority to US07/348,177 priority patent/US4886975A/en
Priority to US07/406,090 priority patent/US5017798A/en
Publication of JPH0547091B2 publication Critical patent/JPH0547091B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4704—Angular selective
    • G01N2021/4711—Multiangle measurement
    • G01N2021/4719—Multiangle measurement using a optical fibre array
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61118863A 1986-02-14 1986-05-23 表面状態測定装置 Granted JPS62274248A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP61118863A JPS62274248A (ja) 1986-05-23 1986-05-23 表面状態測定装置
US07/348,177 US4886975A (en) 1986-02-14 1989-05-02 Surface examining apparatus for detecting the presence of foreign particles on two or more surfaces
US07/406,090 US5017798A (en) 1986-02-14 1989-09-12 Surface examining apparatus for detecting the presence of foreign particles on two or more surfaces

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61118863A JPS62274248A (ja) 1986-05-23 1986-05-23 表面状態測定装置

Publications (2)

Publication Number Publication Date
JPS62274248A JPS62274248A (ja) 1987-11-28
JPH0547091B2 true JPH0547091B2 (fr) 1993-07-15

Family

ID=14746996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61118863A Granted JPS62274248A (ja) 1986-02-14 1986-05-23 表面状態測定装置

Country Status (1)

Country Link
JP (1) JPS62274248A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4875780A (en) * 1988-02-25 1989-10-24 Eastman Kodak Company Method and apparatus for inspecting reticles
JP3101290B2 (ja) * 1989-03-15 2000-10-23 キヤノン株式会社 表面状態検査装置、露光装置、及び表面状態検査方法
JP5506555B2 (ja) * 2010-06-11 2014-05-28 キヤノン株式会社 異物検査装置、それを用いた露光装置及びデバイスの製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61260632A (ja) * 1985-05-15 1986-11-18 Hitachi Ltd 異物検査装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61260632A (ja) * 1985-05-15 1986-11-18 Hitachi Ltd 異物検査装置

Also Published As

Publication number Publication date
JPS62274248A (ja) 1987-11-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term