JPH0546106B2 - - Google Patents
Info
- Publication number
- JPH0546106B2 JPH0546106B2 JP57072428A JP7242882A JPH0546106B2 JP H0546106 B2 JPH0546106 B2 JP H0546106B2 JP 57072428 A JP57072428 A JP 57072428A JP 7242882 A JP7242882 A JP 7242882A JP H0546106 B2 JPH0546106 B2 JP H0546106B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- electrode
- tft
- amorphous silicon
- doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57072428A JPS58190061A (ja) | 1982-04-28 | 1982-04-28 | アモルファスシリコン半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57072428A JPS58190061A (ja) | 1982-04-28 | 1982-04-28 | アモルファスシリコン半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58190061A JPS58190061A (ja) | 1983-11-05 |
JPH0546106B2 true JPH0546106B2 (enrdf_load_stackoverflow) | 1993-07-13 |
Family
ID=13489004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57072428A Granted JPS58190061A (ja) | 1982-04-28 | 1982-04-28 | アモルファスシリコン半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58190061A (enrdf_load_stackoverflow) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5968975A (ja) * | 1982-10-12 | 1984-04-19 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
JPS59124162A (ja) * | 1982-12-29 | 1984-07-18 | Sharp Corp | 薄膜トランジスタ |
JPS6014473A (ja) * | 1983-07-05 | 1985-01-25 | Asahi Glass Co Ltd | 薄膜トランジスタの電極構造 |
JPH0682839B2 (ja) * | 1984-08-21 | 1994-10-19 | セイコー電子工業株式会社 | 表示用パネルの製造方法 |
JPS61193485A (ja) * | 1985-02-22 | 1986-08-27 | Matsushita Electric Ind Co Ltd | 薄膜トランジスタアレイの製造方法 |
US4855806A (en) * | 1985-08-02 | 1989-08-08 | General Electric Company | Thin film transistor with aluminum contacts and nonaluminum metallization |
US4933296A (en) * | 1985-08-02 | 1990-06-12 | General Electric Company | N+ amorphous silicon thin film transistors for matrix addressed liquid crystal displays |
JPS6292371A (ja) * | 1985-10-18 | 1987-04-27 | Hitachi Ltd | 薄膜トランジスタおよびその製造方法 |
JPS6490560A (en) * | 1987-10-01 | 1989-04-07 | Casio Computer Co Ltd | Thin-film transistor |
US5188974A (en) * | 1987-10-31 | 1993-02-23 | Canon Kabushiki Kaisha | Method of manufacturing semiconductor device |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5137150B2 (enrdf_load_stackoverflow) * | 1971-12-20 | 1976-10-14 | ||
JPS581542B2 (ja) * | 1974-03-20 | 1983-01-11 | 沖電気工業株式会社 | 半導体集積回路の製造方法 |
JPS51147290A (en) * | 1975-06-13 | 1976-12-17 | Nec Corp | Semiconductor device |
JPS5687364A (en) * | 1979-12-18 | 1981-07-15 | Nec Corp | Semiconductor device |
JPS5833700B2 (ja) * | 1980-03-28 | 1983-07-21 | 義栄 長谷川 | 固定プロ−ブ・ボ−ド |
-
1982
- 1982-04-28 JP JP57072428A patent/JPS58190061A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS58190061A (ja) | 1983-11-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4942441A (en) | Thin film semiconductor device and method of manufacturing the same | |
JPH0752776B2 (ja) | 薄膜トランジスタおよびその製造法 | |
EP0449539A2 (en) | Ohmic contact for thin film transistor | |
JPH0546106B2 (enrdf_load_stackoverflow) | ||
JPH1195256A (ja) | アクティブマトリクス基板 | |
CN102543723A (zh) | 一种栅控二极管半导体器件的制造方法 | |
JPH059941B2 (enrdf_load_stackoverflow) | ||
JPH0746728B2 (ja) | 半導体装置の製造方法 | |
KR19990006206A (ko) | 박막 트랜지스터 및 그의 제조방법 | |
JP2722890B2 (ja) | 薄膜トランジスタおよびその製造方法 | |
JP2592044B2 (ja) | 垂直形薄膜トランジスターの製造方法 | |
JP3420301B2 (ja) | 薄膜トランジスタの製造方法 | |
JPH08172195A (ja) | 薄膜トランジスタ | |
JPS5833872A (ja) | 薄膜電界効果トランジスタの製造方法 | |
JPH0322064B2 (enrdf_load_stackoverflow) | ||
JPH11274505A (ja) | 薄膜トランジスタ構造およびその製造方法 | |
EP0156647A2 (en) | Thin film transistor and method of making the same | |
JPS63129658A (ja) | 相補型電界効果トランジスタ | |
JPS59113666A (ja) | 薄膜トランジスタの製造方法 | |
JPS6144468A (ja) | 半導体装置およびその製造方法 | |
JPH02189935A (ja) | 薄膜トランジスタの製造方法 | |
JPH09307115A (ja) | 薄膜トランジスタ | |
JPH059940B2 (enrdf_load_stackoverflow) | ||
JPS5818966A (ja) | 薄膜電界効果トランジスタの製造方法 | |
JP2888055B2 (ja) | 薄膜トランジスタ |