JPH0546091B2 - - Google Patents

Info

Publication number
JPH0546091B2
JPH0546091B2 JP58128912A JP12891283A JPH0546091B2 JP H0546091 B2 JPH0546091 B2 JP H0546091B2 JP 58128912 A JP58128912 A JP 58128912A JP 12891283 A JP12891283 A JP 12891283A JP H0546091 B2 JPH0546091 B2 JP H0546091B2
Authority
JP
Japan
Prior art keywords
resist
cooling
baking
temperature
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58128912A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6021522A (ja
Inventor
Kei Kirita
Yoshihide Kato
Toshiaki Shinozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58128912A priority Critical patent/JPS6021522A/ja
Publication of JPS6021522A publication Critical patent/JPS6021522A/ja
Publication of JPH0546091B2 publication Critical patent/JPH0546091B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58128912A 1983-07-15 1983-07-15 レジストパタ−ン形成方法 Granted JPS6021522A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58128912A JPS6021522A (ja) 1983-07-15 1983-07-15 レジストパタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58128912A JPS6021522A (ja) 1983-07-15 1983-07-15 レジストパタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6021522A JPS6021522A (ja) 1985-02-02
JPH0546091B2 true JPH0546091B2 (Direct) 1993-07-13

Family

ID=14996435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58128912A Granted JPS6021522A (ja) 1983-07-15 1983-07-15 レジストパタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6021522A (Direct)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR860002082B1 (ko) * 1983-01-19 1986-11-24 가부시기가이샤 도시바 레지스트 패턴의 형성 방법 및 장치
DE3689606T2 (de) * 1985-10-22 1994-05-19 Kuraray Co Herstellungsverfahren für Phasengitter vom zusammengesetzten Muster-Refraktionstyp.
JPS63107116A (ja) * 1986-10-24 1988-05-12 Fujitsu Ltd レジストベ−キング方法
JPS63161803U (Direct) * 1987-04-10 1988-10-21
JPS63259559A (ja) * 1987-04-16 1988-10-26 Hitachi Condenser Co Ltd 印刷配線板のパタ−ン形成方法
JPH01133621U (Direct) * 1988-02-29 1989-09-12
CA2183163C (en) * 1994-12-28 2006-08-08 Yoshiyuki Kitamura Coating method and coating apparatus
KR20110038165A (ko) 2003-02-05 2011-04-13 가부시키가이샤 한도오따이 에네루기 켄큐쇼 레지스트 패턴의 형성방법 및 반도체장치의 제조방법
JP5767991B2 (ja) * 2012-03-23 2015-08-26 カヤバ工業株式会社 流体圧シリンダ

Also Published As

Publication number Publication date
JPS6021522A (ja) 1985-02-02

Similar Documents

Publication Publication Date Title
KR860002082B1 (ko) 레지스트 패턴의 형성 방법 및 장치
JPH0257334B2 (Direct)
JPH0546091B2 (Direct)
US4897337A (en) Method and apparatus for forming resist pattern
JPH061759B2 (ja) レジストパタ−ンの形成方法
JPS60176236A (ja) レジスト処理装置
JPH0480531B2 (Direct)
JPS61156814A (ja) レジストベ−キング方法およびレジストベ−キング装置
JPS60157225A (ja) レジストパタ−ン形成方法
EP0185366B1 (en) Method of forming resist pattern
JPS61147528A (ja) レジスト処理装置
JPS60117626A (ja) レジストパタ−ンの形成方法及びレジスト処理装置
JPH0464171B2 (Direct)
JPS60117627A (ja) レジストパタ−ンの形成方法及びレジスト処理装置
JPH0746676B2 (ja) レジストパターン形成方法
JPH0465524B2 (Direct)
JPS59132128A (ja) レジストパタ−ンの形成方法及び装置
JPH045258B2 (Direct)
JPH0465525B2 (Direct)
JPS59195828A (ja) レジストパタ−ン形成方法及びレジスト処理装置
JPS60157224A (ja) レジストパタ−ンの形成方法及びレジスト処理装置
JPS60157223A (ja) レジストパタ−ンの形成方法及びレジスト処理装置
JPS61147527A (ja) レジストパタ−ンの形成方法
JPS60157222A (ja) レジストパタ−ン形成方法及びレジスト処理装置
JPS60157226A (ja) レジストパタ−ン形成方法及びレジスト処理装置