JPH045258B2 - - Google Patents

Info

Publication number
JPH045258B2
JPH045258B2 JP58241376A JP24137683A JPH045258B2 JP H045258 B2 JPH045258 B2 JP H045258B2 JP 58241376 A JP58241376 A JP 58241376A JP 24137683 A JP24137683 A JP 24137683A JP H045258 B2 JPH045258 B2 JP H045258B2
Authority
JP
Japan
Prior art keywords
resist
plate
cooling
chamber
sensitivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58241376A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60133727A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58241376A priority Critical patent/JPS60133727A/ja
Publication of JPS60133727A publication Critical patent/JPS60133727A/ja
Publication of JPH045258B2 publication Critical patent/JPH045258B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58241376A 1983-12-21 1983-12-21 レジストパタ−ンの形成方法 Granted JPS60133727A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58241376A JPS60133727A (ja) 1983-12-21 1983-12-21 レジストパタ−ンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58241376A JPS60133727A (ja) 1983-12-21 1983-12-21 レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS60133727A JPS60133727A (ja) 1985-07-16
JPH045258B2 true JPH045258B2 (Direct) 1992-01-30

Family

ID=17073361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58241376A Granted JPS60133727A (ja) 1983-12-21 1983-12-21 レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS60133727A (Direct)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07113207B2 (ja) * 1993-01-28 1995-12-06 技研興業株式会社 魚巣ブロック

Also Published As

Publication number Publication date
JPS60133727A (ja) 1985-07-16

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term