JPH0545948B2 - - Google Patents

Info

Publication number
JPH0545948B2
JPH0545948B2 JP62164225A JP16422587A JPH0545948B2 JP H0545948 B2 JPH0545948 B2 JP H0545948B2 JP 62164225 A JP62164225 A JP 62164225A JP 16422587 A JP16422587 A JP 16422587A JP H0545948 B2 JPH0545948 B2 JP H0545948B2
Authority
JP
Japan
Prior art keywords
pattern
group
width
interval
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62164225A
Other languages
English (en)
Japanese (ja)
Other versions
JPS647043A (en
Inventor
Akihiro Hosoya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP16422587A priority Critical patent/JPS647043A/ja
Publication of JPS647043A publication Critical patent/JPS647043A/ja
Publication of JPH0545948B2 publication Critical patent/JPH0545948B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP16422587A 1987-06-30 1987-06-30 Photomask Granted JPS647043A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16422587A JPS647043A (en) 1987-06-30 1987-06-30 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16422587A JPS647043A (en) 1987-06-30 1987-06-30 Photomask

Publications (2)

Publication Number Publication Date
JPS647043A JPS647043A (en) 1989-01-11
JPH0545948B2 true JPH0545948B2 (en:Method) 1993-07-12

Family

ID=15789050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16422587A Granted JPS647043A (en) 1987-06-30 1987-06-30 Photomask

Country Status (1)

Country Link
JP (1) JPS647043A (en:Method)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07153802A (ja) * 1993-11-30 1995-06-16 Nec Corp 半導体装置
TWI268887B (en) 2005-12-29 2006-12-21 Ind Tech Res Inst Wheel arrangement for four-wheeled vehicles

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS582845A (ja) * 1981-06-30 1983-01-08 Toshiba Corp フォトマスク及びパタ−ン評価方法
JPS5883853A (ja) * 1981-11-13 1983-05-19 Nippon Kogaku Kk <Nikon> 投影光学系のディストーシヨン検査方法
JPS5960439A (ja) * 1982-09-30 1984-04-06 Fujitsu Ltd フオト・マスク

Also Published As

Publication number Publication date
JPS647043A (en) 1989-01-11

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