JPH0545382Y2 - - Google Patents
Info
- Publication number
- JPH0545382Y2 JPH0545382Y2 JP1987121334U JP12133487U JPH0545382Y2 JP H0545382 Y2 JPH0545382 Y2 JP H0545382Y2 JP 1987121334 U JP1987121334 U JP 1987121334U JP 12133487 U JP12133487 U JP 12133487U JP H0545382 Y2 JPH0545382 Y2 JP H0545382Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- header pipe
- gas supply
- supply pipes
- mixing device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 claims description 90
- 239000000203 mixture Substances 0.000 description 5
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987121334U JPH0545382Y2 (it) | 1987-08-07 | 1987-08-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987121334U JPH0545382Y2 (it) | 1987-08-07 | 1987-08-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6426373U JPS6426373U (it) | 1989-02-14 |
| JPH0545382Y2 true JPH0545382Y2 (it) | 1993-11-19 |
Family
ID=31368246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987121334U Expired - Lifetime JPH0545382Y2 (it) | 1987-08-07 | 1987-08-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0545382Y2 (it) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003048413A1 (fr) * | 2001-12-03 | 2003-06-12 | Ulvac, Inc. | Melangeur, dispositif et procede de fabrication d'un film mince |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5294434B2 (ja) * | 2012-01-26 | 2013-09-18 | 株式会社御池鐵工所 | 微細化混合装置 |
| TWI552203B (zh) * | 2013-12-27 | 2016-10-01 | Hitachi Int Electric Inc | A substrate processing apparatus, a manufacturing method of a semiconductor device, and a computer-readable recording medium |
-
1987
- 1987-08-07 JP JP1987121334U patent/JPH0545382Y2/ja not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003048413A1 (fr) * | 2001-12-03 | 2003-06-12 | Ulvac, Inc. | Melangeur, dispositif et procede de fabrication d'un film mince |
| US6933010B2 (en) | 2001-12-03 | 2005-08-23 | Ulvac, Inc | Mixer, and device and method for manufacturing thin-film |
| US8118935B2 (en) | 2001-12-03 | 2012-02-21 | Ulvac, Inc. | Mixing box, and apparatus and method for producing films |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6426373U (it) | 1989-02-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4633909A (en) | Apparatus for the rapid in-line mixing of two fluids | |
| KR20020092835A (ko) | 유체 흐름 혼합 장치 | |
| CN102443780A (zh) | 气体排出管及相关的方法 | |
| JPH0545382Y2 (it) | ||
| JPS5948654B2 (ja) | ガス混合装置 | |
| JP2023553760A (ja) | 冷凍用の分液器及びエアコン | |
| CN103924216B (zh) | 等离子发生器混气管路 | |
| US11857933B2 (en) | Systems, apparatuses, and methods for mixing fluids using a conical flow member | |
| JPH07175B2 (ja) | 反応容器のガス取入れ装置 | |
| CN216639641U (zh) | 气体混合装置和半导体工艺设备 | |
| EP1469937A1 (en) | Mixing device | |
| KR20030020239A (ko) | 가스 분배 방법, 가스 분배 장치 및 소음기-촉매 시스템 | |
| JPH11304067A (ja) | 混合流体用管路 | |
| JPH0766130A (ja) | 化学的気相成長（ｃｖｄ）装置 | |
| WO2023005912A1 (zh) | 半导体工艺设备及其进气装置 | |
| CN115206845B (zh) | 一种用于半导体反应设备的进气装置及半导体反应设备 | |
| CN220194506U (zh) | 一种混气结构及混气设备 | |
| CN219841844U (zh) | 一种换热装置及具有换热装置的除氧器 | |
| US20230175526A1 (en) | Centrifugal compressor and method of operating the centrifugal compressor to produce a uniform inlet flow of process gas | |
| JPH0525702Y2 (it) | ||
| CN116770268A (zh) | 一种热处理装置的进气管道及热处理装置 | |
| CN211625253U (zh) | 一种烧嘴砖 | |
| WO2018201717A1 (zh) | 一种pecvd设备炉口进气结构 | |
| JPS6141397B2 (it) | ||
| JPH0750272A (ja) | 半導体製造方法及び装置 |