JPH0544016B2 - - Google Patents

Info

Publication number
JPH0544016B2
JPH0544016B2 JP62246654A JP24665487A JPH0544016B2 JP H0544016 B2 JPH0544016 B2 JP H0544016B2 JP 62246654 A JP62246654 A JP 62246654A JP 24665487 A JP24665487 A JP 24665487A JP H0544016 B2 JPH0544016 B2 JP H0544016B2
Authority
JP
Japan
Prior art keywords
film
light
photomask
mask substrate
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62246654A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6488550A (en
Inventor
Kenji Oota
Junji Hirokane
Kazuo Ban
Michinobu Saegusa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP24665487A priority Critical patent/JPS6488550A/ja
Priority to CA000578870A priority patent/CA1315023C/en
Priority to EP88309089A priority patent/EP0310412B1/en
Priority to DE3889053T priority patent/DE3889053T2/de
Priority to EP93202205A priority patent/EP0574092B1/en
Priority to DE3856089T priority patent/DE3856089T2/de
Publication of JPS6488550A publication Critical patent/JPS6488550A/ja
Priority to US07/631,277 priority patent/US5260150A/en
Priority to CA000616373A priority patent/CA1322685C/en
Publication of JPH0544016B2 publication Critical patent/JPH0544016B2/ja
Priority to US08/102,229 priority patent/US5403683A/en
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP24665487A 1987-09-30 1987-09-30 Photomask Granted JPS6488550A (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP24665487A JPS6488550A (en) 1987-09-30 1987-09-30 Photomask
CA000578870A CA1315023C (en) 1987-09-30 1988-09-29 Photo-mask
DE3856089T DE3856089T2 (de) 1987-09-30 1988-09-30 Fotomasken
DE3889053T DE3889053T2 (de) 1987-09-30 1988-09-30 Photomasken.
EP93202205A EP0574092B1 (en) 1987-09-30 1988-09-30 Photo-masks
EP88309089A EP0310412B1 (en) 1987-09-30 1988-09-30 Improvements in photo-masks
US07/631,277 US5260150A (en) 1987-09-30 1990-12-20 Photo-mask with light shielding film buried in substrate
CA000616373A CA1322685C (en) 1987-09-30 1992-05-07 Photo-mask
US08/102,229 US5403683A (en) 1987-09-30 1993-08-05 Photo-mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24665487A JPS6488550A (en) 1987-09-30 1987-09-30 Photomask

Publications (2)

Publication Number Publication Date
JPS6488550A JPS6488550A (en) 1989-04-03
JPH0544016B2 true JPH0544016B2 (cs) 1993-07-05

Family

ID=17151633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24665487A Granted JPS6488550A (en) 1987-09-30 1987-09-30 Photomask

Country Status (1)

Country Link
JP (1) JPS6488550A (cs)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2589276Y2 (ja) * 1990-03-07 1999-01-27 株式会社きもと 表面保護フィルム
JP2000206671A (ja) 1999-01-13 2000-07-28 Mitsubishi Electric Corp フォトマスク、フォトマスクの製造方法、および半導体集積回路装置の製造方法
JP3760086B2 (ja) * 2000-07-07 2006-03-29 株式会社ルネサステクノロジ フォトマスクの製造方法
CN1846174A (zh) * 2003-08-25 2006-10-11 凸版光掩膜公司 光掩模及保护其光学性能的方法
JP5064041B2 (ja) * 2007-01-18 2012-10-31 株式会社エスケーエレクトロニクス 表面に保護膜を形成したフォトマスク及びその製造方法
JP2008310092A (ja) * 2007-06-15 2008-12-25 Shin Etsu Chem Co Ltd フォトマスク
JP2016018187A (ja) * 2014-07-11 2016-02-01 株式会社ディスコ 露光マスクの製造方法
JP2016028442A (ja) * 2015-10-08 2016-02-25 大日本印刷株式会社 テンプレート
JP6308281B2 (ja) * 2016-10-21 2018-04-11 大日本印刷株式会社 テンプレートの製造方法
CN109265013A (zh) * 2018-10-16 2019-01-25 彩虹（合肥）液晶玻璃有限公司 蚀刻装置及清洗设备

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023595A (cs) * 1973-06-29 1975-03-13

Also Published As

Publication number Publication date
JPS6488550A (en) 1989-04-03

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