JPH0542101B2 - - Google Patents

Info

Publication number
JPH0542101B2
JPH0542101B2 JP59098724A JP9872484A JPH0542101B2 JP H0542101 B2 JPH0542101 B2 JP H0542101B2 JP 59098724 A JP59098724 A JP 59098724A JP 9872484 A JP9872484 A JP 9872484A JP H0542101 B2 JPH0542101 B2 JP H0542101B2
Authority
JP
Japan
Prior art keywords
ion beam
sample
ion
temperature
metal element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59098724A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60243958A (ja
Inventor
Hifumi Tamura
Yoshihiko Yamamoto
Hiroyasu Shichi
Tooru Ishitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59098724A priority Critical patent/JPS60243958A/ja
Priority to US06/736,123 priority patent/US4687930A/en
Publication of JPS60243958A publication Critical patent/JPS60243958A/ja
Publication of JPH0542101B2 publication Critical patent/JPH0542101B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP59098724A 1984-05-18 1984-05-18 イオンビ−ム装置 Granted JPS60243958A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59098724A JPS60243958A (ja) 1984-05-18 1984-05-18 イオンビ−ム装置
US06/736,123 US4687930A (en) 1984-05-18 1985-05-20 Ion beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59098724A JPS60243958A (ja) 1984-05-18 1984-05-18 イオンビ−ム装置

Publications (2)

Publication Number Publication Date
JPS60243958A JPS60243958A (ja) 1985-12-03
JPH0542101B2 true JPH0542101B2 (de) 1993-06-25

Family

ID=14227464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59098724A Granted JPS60243958A (ja) 1984-05-18 1984-05-18 イオンビ−ム装置

Country Status (2)

Country Link
US (1) US4687930A (de)
JP (1) JPS60243958A (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IE58049B1 (en) * 1985-05-21 1993-06-16 Tekscan Ltd Surface analysis microscopy apparatus
JP2713923B2 (ja) * 1987-10-07 1998-02-16 株式会社日立製作所 集束イオンビームを用いたデバイス加工方法
US4846920A (en) * 1987-12-09 1989-07-11 International Business Machine Corporation Plasma amplified photoelectron process endpoint detection apparatus
JP2811073B2 (ja) * 1988-11-01 1998-10-15 セイコーインスツルメンツ株式会社 断面加工観察装置
US5059785A (en) * 1990-05-30 1991-10-22 The United States Of America As Represented By The United States Department Of Energy Backscattering spectrometry device for identifying unknown elements present in a workpiece
FR2678425A1 (fr) * 1991-06-25 1992-12-31 Cameca Procede de renforcement de l'emission d'ions secondaires positifs dans des matrices oxydees.

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5288900A (en) * 1976-01-19 1977-07-25 Matsushita Electric Ind Co Ltd Ion beam machine tool
JPS5310860U (de) * 1976-07-12 1978-01-30

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3930155A (en) * 1973-01-19 1975-12-30 Hitachi Ltd Ion microprobe analyser

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5288900A (en) * 1976-01-19 1977-07-25 Matsushita Electric Ind Co Ltd Ion beam machine tool
JPS5310860U (de) * 1976-07-12 1978-01-30

Also Published As

Publication number Publication date
JPS60243958A (ja) 1985-12-03
US4687930A (en) 1987-08-18

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