JPH0541980B2 - - Google Patents

Info

Publication number
JPH0541980B2
JPH0541980B2 JP63292539A JP29253988A JPH0541980B2 JP H0541980 B2 JPH0541980 B2 JP H0541980B2 JP 63292539 A JP63292539 A JP 63292539A JP 29253988 A JP29253988 A JP 29253988A JP H0541980 B2 JPH0541980 B2 JP H0541980B2
Authority
JP
Japan
Prior art keywords
aqueous
photoresist
developer
photoresist developer
solution according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63292539A
Other languages
English (en)
Japanese (ja)
Other versions
JPH02151866A (ja
Inventor
Shii Supensaa Aren
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ATK Launch Systems LLC
Original Assignee
Morton Thiokol Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton Thiokol Inc filed Critical Morton Thiokol Inc
Priority to JP29253988A priority Critical patent/JPH02151866A/ja
Publication of JPH02151866A publication Critical patent/JPH02151866A/ja
Publication of JPH0541980B2 publication Critical patent/JPH0541980B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
JP29253988A 1988-11-21 1988-11-21 フォトレジスト現像液 Granted JPH02151866A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29253988A JPH02151866A (ja) 1988-11-21 1988-11-21 フォトレジスト現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29253988A JPH02151866A (ja) 1988-11-21 1988-11-21 フォトレジスト現像液

Publications (2)

Publication Number Publication Date
JPH02151866A JPH02151866A (ja) 1990-06-11
JPH0541980B2 true JPH0541980B2 (cs) 1993-06-25

Family

ID=17783097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29253988A Granted JPH02151866A (ja) 1988-11-21 1988-11-21 フォトレジスト現像液

Country Status (1)

Country Link
JP (1) JPH02151866A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999053381A1 (en) * 1998-04-15 1999-10-21 Etec Systems, Inc. Photoresist developer and method of development
JP5169658B2 (ja) * 2008-09-11 2013-03-27 東ソー株式会社 レジスト現像液

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57114141A (en) * 1981-01-06 1982-07-15 San Ei Chem Ind Ltd Increasing method for developing power of developer for positive type photosensitive resin
EP0286272B1 (en) * 1987-04-06 1994-01-12 Hoechst Celanese Corporation High contrast, positive photoresist developer containing alkanolamine

Also Published As

Publication number Publication date
JPH02151866A (ja) 1990-06-11

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