JPH0532898B2 - - Google Patents

Info

Publication number
JPH0532898B2
JPH0532898B2 JP63240498A JP24049888A JPH0532898B2 JP H0532898 B2 JPH0532898 B2 JP H0532898B2 JP 63240498 A JP63240498 A JP 63240498A JP 24049888 A JP24049888 A JP 24049888A JP H0532898 B2 JPH0532898 B2 JP H0532898B2
Authority
JP
Japan
Prior art keywords
pattern
drawn
positional
resist film
positional accuracy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63240498A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0287614A (ja
Inventor
Yasuo Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP63240498A priority Critical patent/JPH0287614A/ja
Publication of JPH0287614A publication Critical patent/JPH0287614A/ja
Publication of JPH0532898B2 publication Critical patent/JPH0532898B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP63240498A 1988-09-26 1988-09-26 パターン位置精度診断方法および装置 Granted JPH0287614A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63240498A JPH0287614A (ja) 1988-09-26 1988-09-26 パターン位置精度診断方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63240498A JPH0287614A (ja) 1988-09-26 1988-09-26 パターン位置精度診断方法および装置

Publications (2)

Publication Number Publication Date
JPH0287614A JPH0287614A (ja) 1990-03-28
JPH0532898B2 true JPH0532898B2 (enrdf_load_stackoverflow) 1993-05-18

Family

ID=17060410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63240498A Granted JPH0287614A (ja) 1988-09-26 1988-09-26 パターン位置精度診断方法および装置

Country Status (1)

Country Link
JP (1) JPH0287614A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0287614A (ja) 1990-03-28

Similar Documents

Publication Publication Date Title
US7486097B2 (en) Proximity sensitive defect monitor
US5383136A (en) Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate
KR960035135A (ko) 노광마스크의 제조방법
US6261843B1 (en) Test pattern for monitoring metal corrosion on integrated circuit wafers
US4399205A (en) Method and apparatus for determining photomask alignment
JP3363082B2 (ja) パターンの合わせずれの電気的測定方法
KR900002188B1 (ko) 패턴의 현상방법 및 그 장치
JPH0532898B2 (enrdf_load_stackoverflow)
JP3337563B2 (ja) 現像処理方法
JP2867384B2 (ja) ホトレジスト層パターン測定方法
JP3146816B2 (ja) 電子部品の製造方法
JPH10335229A (ja) マスクの合わせずれ評価用テストパターン
JPS6346742A (ja) ホトマスク検査方法
Lin Proximity-and Astigmatism-Tolerant Testsites For Electrical Linewidth Measurement
JP3076398B2 (ja) プロセス診断方法及び装置
KR19990065763A (ko) 전기저항 측정을 이용한 정렬정도 측정방법
JPH11340133A (ja) 重ね合わせ精度測定方法及び半導体製造装置
JPH1047946A (ja) 寸法測定方法
JPS63175425A (ja) 電極構成体
JP2853471B2 (ja) 半導体集積回路装置の製造方法
JP3144250B2 (ja) 自動現像方法及び装置
JPS62226639A (ja) 半導体装置の合せずれ検出方法
Littlehale Determining process latitude with electrically measurable test structures
JPS59153104A (ja) パタン精度測定方法
JP2003059818A (ja) マスクの位置合わせ検出方法

Legal Events

Date Code Title Description
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090518

Year of fee payment: 16

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090518

Year of fee payment: 16