JPH05311279A - Hot dip tin or solder plated material - Google Patents

Hot dip tin or solder plated material

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Publication number
JPH05311279A
JPH05311279A JP34086891A JP34086891A JPH05311279A JP H05311279 A JPH05311279 A JP H05311279A JP 34086891 A JP34086891 A JP 34086891A JP 34086891 A JP34086891 A JP 34086891A JP H05311279 A JPH05311279 A JP H05311279A
Authority
JP
Japan
Prior art keywords
phosphor bronze
tin
solder
plating
hot dip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34086891A
Other languages
Japanese (ja)
Inventor
Kazuhiko Fukamachi
一彦 深町
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikko Kinzoku KK
Original Assignee
Nikko Kinzoku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikko Kinzoku KK filed Critical Nikko Kinzoku KK
Priority to JP34086891A priority Critical patent/JPH05311279A/en
Publication of JPH05311279A publication Critical patent/JPH05311279A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To improve the thermal peeling resistance of an Sn or solder plating layer, at the time of applying hot dip plating of Sn or solder to parts made of phosphor bronze, by limiting the contents of oxygen, sulfur and phosphorus in the phosphor bronze stock to respective specified values or below. CONSTITUTION:At the time of applying hot dip plating of Sn or solder to electric parts or the like using phosphor bronze as stock, phosphor bronze in which the content of oxygen as impurities in the phosphor bronze is limited to <=20ppm and the content of sulfur to <=40ppm or the content of phosphorus to <=800ppm 15 used. This parts made of phosphor bronze are subjected to degreasing, pickling and flux treatment and are thereafter immersed into hot dip Sn or hot dip solder, by which a phosphor bronze member having an Sn plating layer or a solder plating layer excellent in thermal peeling resistance can be manufactured.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電子部品のコネクタ接触
子(コンタクト)あるいはリードの金属材料として使用
され、長時間時効による錫あるいは錫合金めっき層の剥
離、すなわち熱剥離を生じないりん青銅の溶融錫、はん
だめっき材を提供するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used as a metallic material for a connector contact or a lead of an electronic component and is a phosphor bronze that does not cause peeling of a tin or tin alloy plating layer due to long-term aging, that is, heat peeling It provides a molten tin and a solder plating material.

【0002】[0002]

【従来の技術】りん青銅はプレス加工性と強度に優れる
銅合金であるため、電子部品用の金属材料として多用さ
れている。特にコネクタの接触子あるいは部品のリード
材などで一般的な金属材料である。そして、これらの部
品の金属材料として使用されるにあたっては、接点にお
ける接触抵抗の低減、はんだ付け性の向上などの目的で
錫または錫に鉛を合金化した錫合金(はんだ)めっきが
施される。
2. Description of the Related Art Phosphor bronze is a copper alloy which is excellent in press workability and strength and is therefore widely used as a metal material for electronic parts. In particular, it is a general metal material such as a contactor of a connector or a lead material of parts. When used as a metal material for these parts, tin or tin alloy (solder) plating in which lead is alloyed with tin is applied for the purpose of reducing contact resistance at contacts and improving solderability. .

【0003】ところがりん青銅の錫またははんだめっき
材は、めっき後長時間時効すると、めっき皮膜の錫と母
材の銅との反応拡散が進み、この反応拡散にともない母
在中のりんが拡散層と母材との界面近傍でのカーケンド
ールボイドの形成を促進してめっき層の密着性が低下す
るために剥離を生じる。この現象はめっき直後は密着性
が良好であるにもかかわらず、時効による拡散、偏析な
どの熱的な過程により生じるため熱剥離と称する。銅と
錫の反応拡散は常温でも進行するため、熱剥離は常温時
効でも生じるが、昇温環境下では更に起こり易くなる。
However, when tin or solder plating material of phosphor bronze is aged for a long time after plating, reaction diffusion between tin of the plating film and copper of the base material proceeds, and along with this reaction diffusion, phosphorus in the mother layer diffuses. The formation of Kirkendall voids in the vicinity of the interface between the base metal and the base material promotes the adhesion of the plating layer to decrease, resulting in peeling. This phenomenon is called thermal exfoliation because it occurs due to a thermal process such as diffusion and segregation due to aging, although the adhesion is good immediately after plating. Since the reaction diffusion of copper and tin proceeds even at room temperature, thermal exfoliation occurs even at room temperature aging, but it is more likely to occur in a temperature rising environment.

【0004】一方、りん青銅の錫、はんだめっき材が使
用される電子部品は、電子機器の内部は高密度実装化な
どの影響もあり、常温より高い温度となる。従ってめっ
き材の熱剥離は加速される傾向がある。電子部品で熱剥
離が生じた場合、回路の断線を招くため、めっき材の熱
剥離は致命的欠陥となる。
On the other hand, electronic parts using phosphor bronze tin and a solder plating material are heated to a temperature higher than room temperature due to high density mounting inside the electronic equipment. Therefore, thermal peeling of the plated material tends to be accelerated. When the heat peeling occurs in the electronic component, the circuit is broken, and thus the heat peeling of the plated material becomes a fatal defect.

【0005】従来、りん青銅錫、はんだめっき材の熱剥
離を防止する方法として、ニッケルを下地めっきとして
施す方法、銅を下地めっきとして2μm以上の厚みで施
す方法、下地めっきを省略して施した錫、はんだめっき
皮膜を加熱溶融処理(リフロー処理)する方法、あるい
は下地めっきを施さず溶融めっきを施す方法などであ
る。しかし、ニッケル下地めっきを施すとプレス加工性
の低下を招き、銅下地めっきを2μm以上の厚みで施す
とめっきの生産性が著しくて低下するなどの問題があ
る。また、下地めっきを省略してめっき皮膜をリフロー
処理する方法は、めっきの生産性も高く熱剥離に対する
信頼性も最も高いため、りん青銅錫、はんだめっき材の
耐熱剥離性材料として現在最も普及している。また、溶
融めっきも下地を省略したリフローめっきと同程度の耐
熱剥離性を有するが、時効温度やプレス加工などの条件
によっては、極めて軽微ではあるが数万時間の時効で熱
剥離が生じることがある。そして、溶融めっきは電気め
っきのようにめっき浴や通電が不要であるため生産性が
高いという利点を有する。そこで、溶融錫めっき材の耐
熱剥離性の一層の向上が望まれていた。
Conventionally, as a method for preventing thermal peeling of phosphor bronze tin or solder plating material, nickel is used as an undercoat, copper is used as an undercoat in a thickness of 2 μm or more, and the undercoat is omitted. Examples of the method include a method of heat-melting (reflowing) tin or a solder-plated film, or a method of performing hot-dip plating without applying base plating. However, when nickel undercoating is applied, press workability is deteriorated, and when copper undercoating is applied to a thickness of 2 μm or more, there is a problem that productivity of plating is significantly reduced. In addition, the method of reflowing the plating film by omitting the base plating has the highest productivity of plating and the highest reliability against thermal peeling, so it is currently the most widely used heat-resistant peeling material for phosphor bronze tin and solder plating. ing. Also, hot dip plating has the same level of heat-resistant peelability as reflow plating without the underlying layer, but depending on the conditions such as aging temperature and press working, thermal peeling can occur with aging for tens of thousands of hours, although it is extremely slight. is there. And, unlike electroplating, hot dipping does not require a plating bath or electricity, and thus has an advantage of high productivity. Therefore, it has been desired to further improve the heat-resistant peelability of the hot-dip plated material.

【0006】[0006]

【発明が解決しようとする課題】本発明は、耐熱剥離性
の溶融錫、はんだめっき材を提供しようとするものであ
る。
DISCLOSURE OF THE INVENTION The present invention is intended to provide a hot-peeling molten tin and a solder plating material.

【0007】[0007]

【課題を解決するための手段】上述の現状の下に、りん
青銅錫、はんだめっき材の一層の耐熱剥離性の向上を達
成すべく各種の実験を行い、以下に示す発明に至った。
Under the above circumstances, various experiments were conducted in order to further improve the heat-resistant peeling property of phosphor bronze tin and solder plated materials, and the invention described below was achieved.

【0008】1)りん青銅の錫または錫合金溶融めっき
材においてりん青銅母材の酸素を20ppm以下かつ硫
黄を40ppm以下であることを特徴とする溶融錫、は
んだめっき材。
1) Hot-dip tin or solder-plated material in which tin or tin alloy hot-dip plated phosphor bronze has a phosphor bronze base material having an oxygen content of 20 ppm or less and a sulfur content of 40 ppm or less.

【0009】2)りん青銅中のりん濃度が800ppm
以下であることを特徴とする上記1)項記載の溶融錫、
はんだめっき材。
2) The phosphorus concentration in phosphor bronze is 800 ppm.
The molten tin according to the above item 1), characterized in that:
Solder plating material.

【0010】ここでりん青銅とはJISに規定される錫
3.5〜9.0%、りん0.03〜0.35%の範囲の
もののみならず、錫1.0%以上でりんを含み錫、はん
だめっきが施された場合に熱剥離が起こる危険がある銅
合金を示す錫、りんの他、ニッケル、亜鉛等他の添加元
素を含むものも包含するものである。
Here, phosphor bronze is not limited to those in the range of 3.5 to 9.0% tin and 0.03 to 0.35% phosphorus specified by JIS, and phosphorus is contained in 1.0% or more tin. It also includes tin and tin, which represents a copper alloy that may cause thermal peeling when subjected to solder plating, and tin and phosphorus, as well as those containing other additive elements such as nickel and zinc.

【0011】これらの銅合金は、炉材、モールド材から
の硫黄の混入、原料からの硫黄の混入などに配慮して所
定の合金成分で溶解し、鋳塊に鋳込まれる。場合によっ
ては溶解用フラックスの調整、マグネシウムなどの微量
添加などの方法で鋳塊中の硫黄濃度を調整されることも
ある。鋳塊中の酸素はりんの脱酸効果の制御、雰囲気の
制御などにより所望の濃度に調整される。また、鋳塊を
板、条あるいは線などに加工する工程での熱処理による
内部酸化によっても製品の酸素濃度が上昇しないよう注
意が必要である。いずれにしても、合金中の硫黄濃度お
よび酸素濃度は合金成分や加工方法に応じて適宜選択で
きる。
These copper alloys are melted with a predetermined alloy component in consideration of the mixing of sulfur from the furnace material and the molding material and the mixing of sulfur from the raw material, and are cast into the ingot. In some cases, the sulfur concentration in the ingot may be adjusted by adjusting the melting flux or adding a trace amount of magnesium or the like. Oxygen in the ingot is adjusted to a desired concentration by controlling the deoxidizing effect of phosphorus and the atmosphere. In addition, it is necessary to be careful so that the oxygen concentration of the product does not rise due to internal oxidation due to the heat treatment in the process of processing the ingot into a plate, strip or wire. In any case, the sulfur concentration and oxygen concentration in the alloy can be appropriately selected depending on the alloy components and the processing method.

【0012】熱剥離は反応拡散層と母材との界面近傍で
カーケンダールボイドが生成しめっき層の密着性が低下
することが主な原因であるが、カーケンダールボイドの
内面にはりん、硫黄、酸素などが表面偏析して熱剥離を
促進する。そこで、本発明は母材におけるそれら有害元
素の濃度を制御して熱剥離を抑制しようとするものであ
る。硫黄および酸素濃度の制御と共にりん濃度を800
ppm以下に抑えると一層耐熱剥離性が向上する。
Thermal peeling is mainly caused by the formation of Kirkendall voids in the vicinity of the interface between the reaction diffusion layer and the base material, which lowers the adhesion of the plating layer. However, the inner surface of the Kirkendall voids contains phosphorus. , Sulfur, oxygen, etc. segregate on the surface to promote thermal exfoliation. Therefore, the present invention is intended to suppress the thermal peeling by controlling the concentrations of these harmful elements in the base material. Adjust phosphorus concentration to 800 with control of sulfur and oxygen concentration.
When the content is controlled to be ppm or less, the heat-resistant peeling property is further improved.

【0013】めっきは板、条、線等の素材の段階でも、
プレスなどによる加工を加えた後でも施される。まず、
脱脂、酸洗等の表面活性化を行った後、錫またははんだ
が溶融メッキされる。はんだは主に錫に鉛を5〜45%
程度合金化したものが一般的であるがビスマス、亜鉛な
どを合金化する場合もある。熱剥離は錫を主成分とする
めっき皮膜で起こり、その他のめっき合金元素を含む場
合も本発明に含まれる。
Plating is possible even at the stage of material such as plate, strip, wire,
It is applied even after processing such as pressing. First,
After surface activation such as degreasing and pickling, tin or solder is hot-plated. Solder is mainly tin with lead of 5 to 45%
It is generally alloyed to some extent, but bismuth, zinc, etc. may be alloyed. The heat peeling occurs in the plating film containing tin as a main component, and the present invention also includes the case of containing other plating alloy elements.

【0014】所望の形状のりん青銅はアルカリ溶液によ
る脱脂、酸洗による活性化など湿式による前処理、ある
いは無酸化炉などによる前処理など公知のものが使用で
きる。錫、はんだめっきの溶融めっきは目的のめっき組
成の溶融金属中にりん青銅を通入して行なわれる。これ
に先立ち、前処理後塩化亜鉛系フラックスなどを施すこ
とは特に問題はない。溶融金属から引き上げられためっ
き材は、皮膜が溶融状態のままでめっき厚が制御され
る。めっき厚みの制御はメカニカルワイパー、エアーナ
イフなど公知の方法が適応できる。
As the phosphor bronze having a desired shape, known ones such as degreasing with an alkaline solution, wet pretreatment such as activation by pickling, or pretreatment with a non-oxidizing furnace can be used. The hot-dip plating of tin or solder plating is carried out by inserting phosphor bronze into a hot-dip metal having a desired plating composition. Prior to this, there is no particular problem in applying zinc chloride flux after pretreatment. The plating thickness of the plated material pulled up from the molten metal is controlled while the coating remains in a molten state. A known method such as a mechanical wiper or an air knife can be applied to control the plating thickness.

【0015】こうして、作製されたりん青銅錫、はんだ
めっき材は極めて高い耐熱剥離性を有する。
The phosphor bronze tin and the solder plating material thus produced have extremely high heat-resistant peeling property.

【0016】以下、実施例および比較例によって本発明
を更に具体的に説明する。
Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples.

【0017】[0017]

【実施例】3種類の組成のりん青銅(表1)を溶製した
後、冷間加工と熱処理を繰り返し0.2mm厚の板を作
製した。これを脱脂、酸洗し、さらにGX−5(旭化学
研究所)に浸漬しフラックス処理した。この後直ちに3
00℃の溶融錫または溶融9/1(90%Sn−10%
Pb)はんだ中に浸漬した。3秒間浸漬した後、これを
引き上げ空冷した。
Example After phosphor bronze (Table 1) having three compositions was melted, cold working and heat treatment were repeated to manufacture a 0.2 mm thick plate. This was degreased, pickled, and further immersed in GX-5 (Asahi Chemical Laboratory) for flux treatment. Immediately after this 3
Molten tin or molten 9/1 (90% Sn-10%
Pb) Immersed in solder. After soaking for 3 seconds, it was pulled up and air-cooled.

【0018】めっき材は10mmW×50mmLの試験
片に切り出し、0.4mmの曲げ半径で180度曲げ
(U曲げ)を施し、85℃で所定時間時効した後、平板
に曲げ戻し、曲げ部内側のめっき剥離の有無を目視観察
することにより、めっき材の耐熱剥離性を評価した。
The plated material was cut into a test piece of 10 mmW × 50 mmL, bent 180 degrees (U-bend) with a bending radius of 0.4 mm, aged at 85 ° C. for a predetermined time, and then bent back to a flat plate, By visually observing the presence or absence of peeling of the plating, the heat-resistant peeling property of the plated material was evaluated.

【0019】結果を表1に示す。The results are shown in Table 1.

【0020】[0020]

【表1】 [Table 1]

【0021】[0021]

【発明の効果】以上説明したように、本発明のめっき材
は、耐熱剥離性が高く、これを用いることによって、信
頼性の高い電気部品を製造することができる。
As described above, the plated material of the present invention has a high heat-resistant peeling property, and by using this, a highly reliable electric component can be manufactured.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 りん青銅母材の表面に、錫または錫合金
溶融めっき層を有するめっき材において、りん青銅母材
の酸素含有量が20ppm以下、かつ、硫黄含有量が4
0ppm以下であることを特徴とする溶融錫、はんだめ
っき材。
1. A plated material having a tin or tin alloy hot-dip plated layer on the surface of a phosphor bronze base material, wherein the phosphor bronze base material has an oxygen content of 20 ppm or less and a sulfur content of 4 or less.
Molten tin, a solder plating material characterized by being 0 ppm or less.
【請求項2】 りん青銅母材中のりん濃度が800pp
m以下であることを特徴とする請求項1記載の溶融錫、
はんだめっき材。
2. The phosphorus concentration in the phosphor bronze base material is 800 pp.
2. The molten tin according to claim 1, wherein the molten tin is less than or equal to m.
Solder plating material.
JP34086891A 1991-12-24 1991-12-24 Hot dip tin or solder plated material Pending JPH05311279A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34086891A JPH05311279A (en) 1991-12-24 1991-12-24 Hot dip tin or solder plated material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34086891A JPH05311279A (en) 1991-12-24 1991-12-24 Hot dip tin or solder plated material

Publications (1)

Publication Number Publication Date
JPH05311279A true JPH05311279A (en) 1993-11-22

Family

ID=18341058

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34086891A Pending JPH05311279A (en) 1991-12-24 1991-12-24 Hot dip tin or solder plated material

Country Status (1)

Country Link
JP (1) JPH05311279A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007100136A (en) * 2005-09-30 2007-04-19 Nikko Kinzoku Kk Copper alloy for lead frame excellent in uniform plating property

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007100136A (en) * 2005-09-30 2007-04-19 Nikko Kinzoku Kk Copper alloy for lead frame excellent in uniform plating property

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