JPH05311280A - Reflow tin and solder plated material - Google Patents
Reflow tin and solder plated materialInfo
- Publication number
- JPH05311280A JPH05311280A JP34086991A JP34086991A JPH05311280A JP H05311280 A JPH05311280 A JP H05311280A JP 34086991 A JP34086991 A JP 34086991A JP 34086991 A JP34086991 A JP 34086991A JP H05311280 A JPH05311280 A JP H05311280A
- Authority
- JP
- Japan
- Prior art keywords
- tin
- reflow
- plating
- solder
- phosphor bronze
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は電子部品のコネクタ接触
子(コンタクト)あるいはリードの金属材料として使用
され、長時間時効による錫あるいは錫合金めっき層の剥
離、すなわち熱剥離を生じないりん青銅のリフロー錫、
はんだめっき材を提供するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used as a metallic material for a connector contact or a lead of an electronic component and is a phosphor bronze that does not cause peeling of a tin or tin alloy plating layer due to long-term aging, that is, heat peeling Reflow tin,
A solder plated material is provided.
【0002】[0002]
【従来の技術】りん青銅はプレス加工性と強度に優れる
銅合金であるため、電子部品用の金属材料として多用さ
れている。特にコネクタの接触子あるいは部品のリード
材などで一般的な金属材料である。そして、これらの部
品の金属材料として使用されるにあたっては、接点にお
ける接触抵抗の低減、はんだ付け性の向上などの目的で
錫または錫に鉛を合金化した錫合金(はんだ)めっきが
施される。2. Description of the Related Art Phosphor bronze is a copper alloy which is excellent in press workability and strength and is therefore widely used as a metal material for electronic parts. In particular, it is a general metal material such as a contactor of a connector or a lead material of parts. When used as a metal material for these parts, tin or tin alloy (solder) plating in which lead is alloyed with tin is applied for the purpose of reducing contact resistance at contacts and improving solderability. .
【0003】ところがりん青銅の錫またははんだめっき
材は、めっき後長時間時効すると、めっき皮膜の錫と母
材の銅との反応拡散が進み、この反応拡散にともない母
在中のりんが拡散層と母材との界面近傍でのカーケンド
ールボイドの形成を促進してめっき層の密着性が低下す
るために剥離を生じる。この現象はめっき直後は密着性
が良好であるにもかかわらず、時効による拡散、偏析な
どの熱的な過程により生じるため熱剥離と称する。銅と
錫の反応拡散は常温でも進行するため、熱剥離は常温時
効でも生じるが、昇温環境下では更に起こり易くなる。However, when tin or solder plating material of phosphor bronze is aged for a long time after plating, reaction diffusion between tin of the plating film and copper of the base material proceeds, and along with this reaction diffusion, phosphorus in the mother layer diffuses. The formation of Kirkendall voids in the vicinity of the interface between the base metal and the base material promotes the adhesion of the plating layer to decrease, resulting in peeling. This phenomenon is called thermal exfoliation because it occurs due to a thermal process such as diffusion and segregation due to aging, although the adhesion is good immediately after plating. Since the reaction diffusion of copper and tin proceeds even at room temperature, thermal exfoliation occurs even at room temperature aging, but it is more likely to occur in a temperature rising environment.
【0004】一方、りん青銅の錫、はんだめっき材が使
用される電子部品は、電子機器の内部は高密度実装化な
どの影響もあり、常温より高い温度となる。従ってめっ
き材の熱剥離は加速される傾向がある。電子部品で熱剥
離が生じた場合、回路の断線を招くため、めっき材の熱
剥離は致命的欠陥となる。On the other hand, electronic parts using phosphor bronze tin and a solder plating material are heated to a temperature higher than room temperature due to high density mounting inside the electronic equipment. Therefore, thermal peeling of the plated material tends to be accelerated. When the heat peeling occurs in the electronic component, the circuit is broken, and thus the heat peeling of the plated material becomes a fatal defect.
【0005】従来、りん青銅錫、はんだめっき材の熱剥
離を防止する方法として、ニッケルを下地めっきとして
施す方法、銅を下地めっきとして2μm以上の厚みで施
す方法、下地めっきを省略して施した錫、はんだめっき
皮膜を加熱溶融処理(リフロー処理)する方法などであ
る。しかし、ニッケル下地めっきを施すとプレス加工性
の低下を招き、銅下地めっきを2μm以上の厚みで施す
とめっきの生産性が著しくて低下するなどの問題があ
る。また、下地めっきを省略してめっき皮膜をリフロー
処理する方法は、めっきの生産性も高く熱剥離に対する
信頼性も最も高いため、現在りん青銅錫、はんだめっき
材の耐熱剥離性材料として現在最も普及している。とこ
ろが、時効温度やプレス加工などの条件によっては、極
めて軽微ではあるが数万時間の時効で熱剥離が生じるこ
とがある。従って、りん青銅錫、はんだめっき材の耐熱
剥離性の一層の向上が望まれていた。Conventionally, as a method for preventing thermal peeling of phosphor bronze tin or solder plating material, nickel is used as an undercoat, copper is used as an undercoat in a thickness of 2 μm or more, and the undercoat is omitted. For example, a method of heat-melting (reflowing) the tin or solder plating film may be used. However, when nickel undercoating is applied, press workability is deteriorated, and when copper undercoating is applied to a thickness of 2 μm or more, there is a problem that productivity of plating is significantly reduced. In addition, the method of reflowing the plating film by omitting the base plating has high productivity of plating and the highest reliability against thermal peeling, so it is currently the most popular heat-resistant peeling material for phosphor bronze tin and solder plating. is doing. However, depending on conditions such as aging temperature and press working, thermal peeling may occur after aging for tens of thousands of hours although it is extremely slight. Therefore, it has been desired to further improve the heat-resistant peeling property of phosphor bronze tin and solder plated materials.
【0006】[0006]
【発明が解決しようとする課題】本発明は、耐熱剥離性
のリフロー錫およびはんだめっき材を提供しようとする
ものである。DISCLOSURE OF THE INVENTION The present invention is intended to provide a reflow tin and a solder-plated material having a heat-resistant peeling property.
【0007】[0007]
【課題を解決するための手段】上述の現状の下に、りん
青銅錫、はんだめっき材の一層の耐熱剥離性の向上を達
成すべく各種の実験を行い、以下に示す発明に至った。Under the above circumstances, various experiments were conducted in order to further improve the heat-resistant peeling property of phosphor bronze tin and solder plated materials, and the invention described below was achieved.
【0008】1)りん青銅の錫または錫合金めっきを電
気メッキ後めっき皮膜を加熱溶融した錫または錫合金め
っき材においてりん青銅母材の酸素を20ppm以下か
つ硫黄を40ppm以下であることを特徴とするリフロ
ー錫およびはんだめっき材。 2)りん青銅中のりん濃度が800ppm以下であるこ
とを特徴とする上記1)項記載のリフロー錫およびはん
だめっき材。1) In a tin or tin alloy plated material obtained by electroplating tin or tin alloy plating of phosphor bronze and heating and melting the plated film, the phosphor bronze base material has oxygen of 20 ppm or less and sulfur of 40 ppm or less. Reflow tin and solder plated material. 2) The reflow tin and solder-plated product according to the above item 1), wherein the phosphorus concentration in phosphor bronze is 800 ppm or less.
【0009】ここでりん青銅とはJISに規定される錫
3.5〜9.0%、りん0.03〜0.35%の範囲の
もののみならず、錫1.0%以上でりんを含み錫、はん
だめっきが施された場合に熱剥離が起こる危険がある銅
合金を示す錫、りんの他、ニッケル、亜鉛等他の添加元
素を含むものも包含するものである。Here, phosphor bronze is not limited to those in the range of 3.5 to 9.0% tin and 0.03 to 0.35% phosphorus specified in JIS, and phosphorus is contained in 1.0% or more tin. It also includes tin and tin, which represents a copper alloy that may cause thermal peeling when subjected to solder plating, and tin and phosphorus, as well as those containing other additive elements such as nickel and zinc.
【0010】これらの銅合金は、炉材、モールド材から
の硫黄の混入、原料からの硫黄の混入などに配慮して所
定の合金成分で溶解し、鋳塊に鋳込まれる。場合によっ
ては溶解用フラックスの調整、マグネシウムなどの微量
添加などの方法で鋳塊中の硫黄濃度を調整されることも
ある。鋳塊中の酸素はりんの脱酸効果の制御、雰囲気の
制御などにより所望の濃度に調整される。また、鋳塊を
板、条あるいは線などに加工する工程での熱処理による
内部酸化によっても製品の酸素濃度が上昇しないよう注
意が必要である。いずれにしても、合金中の硫黄濃度お
よび酸素濃度は合金成分や加工方法に応じて適宜選択で
きる。These copper alloys are melted with a predetermined alloy component in consideration of the mixing of sulfur from the furnace material and the molding material, the mixing of sulfur from the raw material, and the like are cast into an ingot. In some cases, the sulfur concentration in the ingot may be adjusted by adjusting the melting flux or adding a trace amount of magnesium or the like. Oxygen in the ingot is adjusted to a desired concentration by controlling the deoxidizing effect of phosphorus and the atmosphere. In addition, it is necessary to be careful so that the oxygen concentration of the product does not rise due to internal oxidation due to the heat treatment in the process of processing the ingot into a plate, strip or wire. In any case, the sulfur concentration and oxygen concentration in the alloy can be appropriately selected depending on the alloy components and the processing method.
【0011】熱剥離は反応拡散層と母材との界面近傍で
カーケンドールボイドが生成しめっき層の密着性が低下
することが主な原因であるが、カーケンドールボイドの
内面にはりん、硫黄、酸素などが表面偏析して熱剥離を
促進する。そこで、本発明は母材におけるそれら有害元
素の濃度を制御して熱剥離を抑制しようとするものであ
る。硫黄および酸素濃度の制御と共にりん濃度を800
ppm以下に抑えると一層耐熱剥離性が向上する。Thermal peeling is mainly caused by the formation of Kirkendall voids in the vicinity of the interface between the reaction diffusion layer and the base material, which lowers the adhesion of the plating layer. However, the inner surface of Kirkendall voids contains phosphorus and sulfur. , Oxygen, etc. segregate on the surface to promote thermal exfoliation. Therefore, the present invention is intended to suppress the thermal peeling by controlling the concentrations of these harmful elements in the base material. Adjust phosphorus concentration to 800 with control of sulfur and oxygen concentration.
When the content is controlled to be ppm or less, the heat-resistant peeling property is further improved.
【0012】めっきは板、条、線等の素材の段階でも、
プレスなどによる加工を加えた後でも施される。まず、
脱脂、酸洗等の表面活性化を行った後、錫またははんだ
が電気メッキされる。はんだは主に錫に鉛を5〜45%
程度合金化したものが一般的であるがビスマスなどを合
金化する場合もある。熱剥離は錫を主成分とするめっき
皮膜で起こり、その他のめっき合金元素を含む場合も本
発明に含まれる。Plating is performed even at the stage of material such as plate, strip, wire,
It is applied even after processing such as pressing. First,
After surface activation such as degreasing and pickling, tin or solder is electroplated. Solder is mainly tin with lead of 5 to 45%
It is generally alloyed to some extent, but bismuth or the like may be alloyed. The heat peeling occurs in the plating film containing tin as a main component, and the present invention also includes the case of containing other plating alloy elements.
【0013】錫、はんだめっきの電気めっきには、硫酸
浴、有機酸浴、ほうふっ化浴、アルカリ浴等各種のもの
が知られているが、めっき浴、めっき条件によらず本発
明は有効である。電気メッキ後めっき材は皮膜の融点以
上に加熱されリフロー処理が施される。リフロー処理に
おける加熱方法、雰囲気および皮膜の急冷凝固(クエン
チ)の方法は公知の方法が適応できる。Various kinds of electroplating such as tin and solder plating are known such as sulfuric acid bath, organic acid bath, bromide bath, and alkaline bath. The present invention is effective regardless of the plating bath and plating conditions. Is. After electroplating, the plated material is heated above the melting point of the coating and subjected to reflow treatment. Known methods can be applied to the heating method, atmosphere, and rapid solidification (quenching) method of the film in the reflow treatment.
【0014】以下、実施例および比較例によって本発明
を更に具体的に説明する。Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples.
【0015】[0015]
【実施例】3種類の組成のりん青銅(Cu−8.2%S
n−0.01P)を溶製した後、冷間加工と熱処理を繰
り返し0.2mm厚の板を作製した。これを脱脂、酸洗
し、錫またははんだを電気めっき後リフロー処理した。
電気メッキ条件を次に示す。EXAMPLE Phosphor bronze (Cu-8.2% S of three compositions)
After n-0.01P) was melted, cold working and heat treatment were repeated to produce a 0.2 mm thick plate. This was degreased and pickled, and tin or solder was electroplated and then reflowed.
The electroplating conditions are shown below.
【0016】 錫めっき めっき浴:硫酸第一錫 70g/L 硫酸 70g/L 有機添加剤 10g/L 浴温 :25℃ 電流密度:3A/dm2 めっき厚:1.5μm 9/1はんだめっき めっき浴:メタンスルホン酸錫 60g/L メタンスルホン酸 70g/L 有機添加剤 10g/L 浴温 :25℃ 電流密度:3A/dm2 めっき厚:1.5μm めっき材は10mmW×50mmLの試験片に切り出
し、0.4mmの曲げ半径で180度曲げ(U曲げ)を
施し、85℃で所定時間時効した後、平板に曲げ戻し、
曲げ部内側のめっき剥離の有無を目視観察することによ
り、めっき材の耐熱剥離性を評価した。Tin plating Plating bath: Stannous sulfate 70 g / L Sulfuric acid 70 g / L Organic additive 10 g / L Bath temperature: 25 ° C. Current density: 3 A / dm 2 Plating thickness: 1.5 μm 9/1 Solder plating Plating bath : Tin methanesulfonate 60 g / L Methanesulfonic acid 70 g / L Organic additive 10 g / L Bath temperature: 25 ° C. Current density: 3 A / dm 2 Plating thickness: 1.5 μm The plating material was cut into a 10 mmW × 50 mmL test piece, Bend 180 degrees (U-bend) with a bending radius of 0.4 mm, age at 85 ° C for a predetermined time, and then bend back to a flat plate.
The heat-resistant peeling property of the plated material was evaluated by visually observing the presence or absence of plating peeling inside the bent portion.
【0017】結果を表1に示す。The results are shown in Table 1.
【0018】[0018]
【表1】 [Table 1]
【0019】[0019]
【発明の効果】以上説明したように、本発明のめっき材
は、耐熱剥離性が高く、これを用いることによって、信
頼性の高い電気部品を製造することができる。As described above, the plated material of the present invention has a high heat-resistant peeling property, and by using this, a highly reliable electric component can be manufactured.
Claims (2)
錫または錫合金層を有する錫または錫合金めっき材にお
いて、りん青銅母材の酸素含有量が20ppm以下、か
つ、硫黄含有量が40ppm以下であることを特徴とす
るリフロー錫およびはんだめっき材。1. A tin or tin alloy plated material having an electroplated tin or tin alloy layer on the surface of a phosphor bronze base material, wherein the phosphor bronze base material has an oxygen content of 20 ppm or less and a sulfur content of 40 ppm. A reflow tin and a solder plating material characterized by the following:
m以下であることを特徴とする請求項1記載のリフロー
錫およびはんだめっき材。2. The phosphorus concentration in the phosphor bronze base material is 800 pp.
The reflow tin and the solder plated material according to claim 1, wherein the reflow tin and the solder plated material are m or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34086991A JPH05311280A (en) | 1991-12-24 | 1991-12-24 | Reflow tin and solder plated material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34086991A JPH05311280A (en) | 1991-12-24 | 1991-12-24 | Reflow tin and solder plated material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05311280A true JPH05311280A (en) | 1993-11-22 |
Family
ID=18341066
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34086991A Pending JPH05311280A (en) | 1991-12-24 | 1991-12-24 | Reflow tin and solder plated material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05311280A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012007242A (en) * | 2011-08-01 | 2012-01-12 | Jx Nippon Mining & Metals Corp | Cu-Ni-Si ALLOY-TINNED STRIP |
US9666547B2 (en) | 2002-10-08 | 2017-05-30 | Honeywell International Inc. | Method of refining solder materials |
-
1991
- 1991-12-24 JP JP34086991A patent/JPH05311280A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9666547B2 (en) | 2002-10-08 | 2017-05-30 | Honeywell International Inc. | Method of refining solder materials |
JP2012007242A (en) * | 2011-08-01 | 2012-01-12 | Jx Nippon Mining & Metals Corp | Cu-Ni-Si ALLOY-TINNED STRIP |
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