JPH0528829B2 - - Google Patents

Info

Publication number
JPH0528829B2
JPH0528829B2 JP11665085A JP11665085A JPH0528829B2 JP H0528829 B2 JPH0528829 B2 JP H0528829B2 JP 11665085 A JP11665085 A JP 11665085A JP 11665085 A JP11665085 A JP 11665085A JP H0528829 B2 JPH0528829 B2 JP H0528829B2
Authority
JP
Japan
Prior art keywords
polymer
resist
pms
molecular weight
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11665085A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61275746A (ja
Inventor
Tadashi Niwa
Masayuki Kato
Yoshio Taguchi
Shuichi Sawada
Chihiro Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tonen General Sekiyu KK
Original Assignee
Tonen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tonen Corp filed Critical Tonen Corp
Priority to JP11665085A priority Critical patent/JPS61275746A/ja
Publication of JPS61275746A publication Critical patent/JPS61275746A/ja
Publication of JPH0528829B2 publication Critical patent/JPH0528829B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP11665085A 1985-05-31 1985-05-31 スチレン系重合体を成分とするレジスト Granted JPS61275746A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11665085A JPS61275746A (ja) 1985-05-31 1985-05-31 スチレン系重合体を成分とするレジスト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11665085A JPS61275746A (ja) 1985-05-31 1985-05-31 スチレン系重合体を成分とするレジスト

Publications (2)

Publication Number Publication Date
JPS61275746A JPS61275746A (ja) 1986-12-05
JPH0528829B2 true JPH0528829B2 (OSRAM) 1993-04-27

Family

ID=14692478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11665085A Granted JPS61275746A (ja) 1985-05-31 1985-05-31 スチレン系重合体を成分とするレジスト

Country Status (1)

Country Link
JP (1) JPS61275746A (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62215608A (ja) * 1986-03-14 1987-09-22 Shin Etsu Chem Co Ltd アルケニルシリル基含有高分子化合物の製法
JPS62245245A (ja) * 1986-04-18 1987-10-26 Agency Of Ind Science & Technol スチレン系共重合体を成分とするレジスト
JPH01298349A (ja) * 1988-05-27 1989-12-01 Agency Of Ind Science & Technol スチレン系重合体を成分とするレジスト

Also Published As

Publication number Publication date
JPS61275746A (ja) 1986-12-05

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