JPH0527973B2 - - Google Patents

Info

Publication number
JPH0527973B2
JPH0527973B2 JP60034555A JP3455585A JPH0527973B2 JP H0527973 B2 JPH0527973 B2 JP H0527973B2 JP 60034555 A JP60034555 A JP 60034555A JP 3455585 A JP3455585 A JP 3455585A JP H0527973 B2 JPH0527973 B2 JP H0527973B2
Authority
JP
Japan
Prior art keywords
gas
bell gear
wafer
bell
gear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60034555A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61194838A (ja
Inventor
Katsumi Takami
Yukio Murakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP60034555A priority Critical patent/JPS61194838A/ja
Publication of JPS61194838A publication Critical patent/JPS61194838A/ja
Publication of JPH0527973B2 publication Critical patent/JPH0527973B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
JP60034555A 1985-02-25 1985-02-25 Ｃｖｄ法による薄膜形成方法 Granted JPS61194838A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60034555A JPS61194838A (ja) 1985-02-25 1985-02-25 Ｃｖｄ法による薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60034555A JPS61194838A (ja) 1985-02-25 1985-02-25 Ｃｖｄ法による薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS61194838A JPS61194838A (ja) 1986-08-29
JPH0527973B2 true JPH0527973B2 (enrdf_load_stackoverflow) 1993-04-22

Family

ID=12417556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60034555A Granted JPS61194838A (ja) 1985-02-25 1985-02-25 Ｃｖｄ法による薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS61194838A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62218574A (ja) * 1986-03-20 1987-09-25 Shinku Zairyo Kk 化学蒸着装置
JPS6389668A (ja) * 1986-10-03 1988-04-20 Hitachi Electronics Eng Co Ltd 気相反応装置および該装置の制御方法
JPH01125923A (ja) * 1987-11-11 1989-05-18 Sumitomo Chem Co Ltd 気相成長装置
JPH02222134A (ja) * 1989-02-23 1990-09-04 Nobuo Mikoshiba 薄膜形成装置
JP4878830B2 (ja) * 2005-12-12 2012-02-15 株式会社日立国際電気 基板処理装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59224118A (ja) * 1983-06-03 1984-12-17 Hitachi Ltd 光化学気相反応法

Also Published As

Publication number Publication date
JPS61194838A (ja) 1986-08-29

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