JPH0527494Y2 - - Google Patents
Info
- Publication number
- JPH0527494Y2 JPH0527494Y2 JP1986046698U JP4669886U JPH0527494Y2 JP H0527494 Y2 JPH0527494 Y2 JP H0527494Y2 JP 1986046698 U JP1986046698 U JP 1986046698U JP 4669886 U JP4669886 U JP 4669886U JP H0527494 Y2 JPH0527494 Y2 JP H0527494Y2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- frequency power
- high frequency
- electrode unit
- power block
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986046698U JPH0527494Y2 (cs) | 1986-03-28 | 1986-03-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986046698U JPH0527494Y2 (cs) | 1986-03-28 | 1986-03-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62157970U JPS62157970U (cs) | 1987-10-07 |
| JPH0527494Y2 true JPH0527494Y2 (cs) | 1993-07-13 |
Family
ID=30866601
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986046698U Expired - Lifetime JPH0527494Y2 (cs) | 1986-03-28 | 1986-03-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0527494Y2 (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1050622A (ja) * | 1996-08-05 | 1998-02-20 | Komatsu Ltd | 表面処理装置用ノズル、表面処理装置およびこれを用いた表面処理方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58163432A (ja) * | 1982-03-24 | 1983-09-28 | Fujitsu Ltd | プラズマ化学気相成長装置 |
| US4426348A (en) * | 1982-07-29 | 1984-01-17 | Ex-Cell-O Corporation | Polyurethane rim system |
| JPS6137969A (ja) * | 1984-07-31 | 1986-02-22 | Canon Inc | プラズマcvd薄膜製造装置 |
-
1986
- 1986-03-28 JP JP1986046698U patent/JPH0527494Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62157970U (cs) | 1987-10-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1169490B1 (en) | Vacuum processing apparatus | |
| KR101004199B1 (ko) | 성막 장치 | |
| KR101444873B1 (ko) | 기판처리장치 | |
| TW527436B (en) | Chemical vapor deposition system | |
| JP4451684B2 (ja) | 真空処理装置 | |
| JP3002448B1 (ja) | 基板処理装置 | |
| JPH04196528A (ja) | マグネトロンエッチング装置 | |
| JPWO2008123060A1 (ja) | 真空処理装置 | |
| CN101546697A (zh) | 等离子体处理装置 | |
| JPS60181274A (ja) | 基板に被着を行なう装置および方法 | |
| TW452882B (en) | Large area plasma source | |
| JPH0527494Y2 (cs) | ||
| JPH0527493Y2 (cs) | ||
| JPH0473289B2 (cs) | ||
| JP3033787B2 (ja) | プラズマ処理装置 | |
| TWI738006B (zh) | 真空處理裝置、支持軸 | |
| JP4098975B2 (ja) | プラズマ支援ウェハー処理装置の二重電極ウェハーホルダ | |
| JPH02298268A (ja) | 薄膜形成装置 | |
| JP2001023972A (ja) | プラズマ処理装置 | |
| JPH01180982A (ja) | プラズマcvd装置 | |
| JPH07122502A (ja) | プラズマ加工装置 | |
| KR20230133264A (ko) | 플라스마 처리 장치 | |
| JPS6115974A (ja) | プラズマcvd装置 | |
| JPH07147272A (ja) | 処理装置 | |
| JPS60114574A (ja) | 放電による堆積膜の製造装置 |