JPH0527488Y2 - - Google Patents
Info
- Publication number
- JPH0527488Y2 JPH0527488Y2 JP1989019262U JP1926289U JPH0527488Y2 JP H0527488 Y2 JPH0527488 Y2 JP H0527488Y2 JP 1989019262 U JP1989019262 U JP 1989019262U JP 1926289 U JP1926289 U JP 1926289U JP H0527488 Y2 JPH0527488 Y2 JP H0527488Y2
- Authority
- JP
- Japan
- Prior art keywords
- retaining ring
- semiconductor wafer
- planet
- holding
- deposition source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989019262U JPH0527488Y2 (enExample) | 1989-02-20 | 1989-02-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989019262U JPH0527488Y2 (enExample) | 1989-02-20 | 1989-02-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02110666U JPH02110666U (enExample) | 1990-09-04 |
| JPH0527488Y2 true JPH0527488Y2 (enExample) | 1993-07-13 |
Family
ID=31234616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989019262U Expired - Lifetime JPH0527488Y2 (enExample) | 1989-02-20 | 1989-02-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0527488Y2 (enExample) |
-
1989
- 1989-02-20 JP JP1989019262U patent/JPH0527488Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02110666U (enExample) | 1990-09-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH02122074A (ja) | 溝の側壁に層を形成する方法及びそのための機構 | |
| JPH11254324A5 (enExample) | ||
| CA2620417A1 (en) | Workpiece carrier device | |
| JPH0428860A (ja) | イオンプレーティング装置用回転テーブル | |
| US3583363A (en) | Substrate support apparatus | |
| JPH0754286Y2 (ja) | 蒸着用プラネタ | |
| US3675624A (en) | Apparatus for rotating work for thin film deposition | |
| CN217997300U (zh) | 一种dbr蒸镀载片治具 | |
| JP3824856B2 (ja) | 真空蒸着装置 | |
| JPH03209744A (ja) | ブレーキング装置及びこれを用いたブレーキング方法 | |
| JP2006063391A (ja) | 皮膜形成用ワーク保持装置 | |
| JPH07284716A (ja) | スピンコータ及びそのスピンコータにおける回転板保持方法 | |
| KR102831868B1 (ko) | 클램프어셈블리를 포함하는 이비알 장치 | |
| KR20110041588A (ko) | 렌즈 코팅용 진공 증착기의 캐리지 회전장치 | |
| JPH03271195A (ja) | 基板回転装置 | |
| JPS5853188Y2 (ja) | 溶接用固定治具 | |
| JP2840182B2 (ja) | 基板への回転式塗布方法並びに基板への回転式塗布装置 | |
| JPS6056069A (ja) | 薄膜形成装置 | |
| JPH07228974A (ja) | 蒸着装置 | |
| JPS6313912Y2 (enExample) | ||
| JPH0753265B2 (ja) | 回転式洗浄装置 | |
| JPH0343232Y2 (enExample) | ||
| JPH07138756A (ja) | 薄膜蒸着装置 | |
| JP4209576B2 (ja) | 修正方法及び修正装置 | |
| JPH0731961Y2 (ja) | 平盤ラップ盤の研磨液供給装置 |