JPH052637B2 - - Google Patents
Info
- Publication number
- JPH052637B2 JPH052637B2 JP58225194A JP22519483A JPH052637B2 JP H052637 B2 JPH052637 B2 JP H052637B2 JP 58225194 A JP58225194 A JP 58225194A JP 22519483 A JP22519483 A JP 22519483A JP H052637 B2 JPH052637 B2 JP H052637B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- atmosphere
- selected area
- compound
- crystal growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/04—Pattern deposit, e.g. by using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22519483A JPS60118689A (ja) | 1983-11-29 | 1983-11-29 | 結晶成長方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22519483A JPS60118689A (ja) | 1983-11-29 | 1983-11-29 | 結晶成長方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60118689A JPS60118689A (ja) | 1985-06-26 |
| JPH052637B2 true JPH052637B2 (enExample) | 1993-01-12 |
Family
ID=16825440
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22519483A Granted JPS60118689A (ja) | 1983-11-29 | 1983-11-29 | 結晶成長方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60118689A (enExample) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5943815B2 (ja) * | 1975-10-07 | 1984-10-24 | 富士通株式会社 | エピタキシヤル成長法 |
-
1983
- 1983-11-29 JP JP22519483A patent/JPS60118689A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60118689A (ja) | 1985-06-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4664940A (en) | Process for the formation of a flux of atoms and its use in an atomic beam epitaxy process | |
| JPH04212411A (ja) | エピタキシャル成長方法 | |
| JPS62232919A (ja) | 結晶成長方法 | |
| JPH05144744A (ja) | 半導体薄膜形成方法 | |
| JPH01103982A (ja) | 3−5族化合物半導体単結晶の製造方法 | |
| JP2687371B2 (ja) | 化合物半導体の気相成長法 | |
| JPH052637B2 (enExample) | ||
| Haigh | Mechanisms of metallo‐organic vapor phase epitaxy and routes to an ultraviolet‐assisted process | |
| JPH052638B2 (enExample) | ||
| JPH0388324A (ja) | 化合物半導体薄膜の形成方法 | |
| JPS62214616A (ja) | 有機金属気相成長装置 | |
| JPH0267721A (ja) | 化合物半導体薄膜の製造方法 | |
| JPH0212814A (ja) | 化合物半導体結晶成長方法 | |
| JP2714920B2 (ja) | 半導体薄膜の製造装置および製造方法 | |
| JPH0682622B2 (ja) | ガリウム砒素薄膜形成方法 | |
| JP2620546B2 (ja) | 化合物半導体のエピタキシヤル層の製造方法 | |
| JPH02307894A (ja) | 化合物半導体の成長方法 | |
| JPS62138390A (ja) | 分子線エピタキシヤル成長法 | |
| JP2717165B2 (ja) | 化合物半導体の構造形成方法 | |
| JPH08264446A (ja) | ガリウム砒素基板における選択的結晶成長方法 | |
| JPH0532482A (ja) | 分子線エピタキシヤル法及び化合物半導体膜 | |
| JPH02158125A (ja) | 化合物半導体薄膜の形成方法 | |
| Arakawa | Mesoscopic size fabrication technology | |
| JPH01230495A (ja) | 半導体結晶の成長方法 | |
| JPH02166723A (ja) | 化合物半導体の成長方法 |