JPH0525387B2 - - Google Patents

Info

Publication number
JPH0525387B2
JPH0525387B2 JP62181017A JP18101787A JPH0525387B2 JP H0525387 B2 JPH0525387 B2 JP H0525387B2 JP 62181017 A JP62181017 A JP 62181017A JP 18101787 A JP18101787 A JP 18101787A JP H0525387 B2 JPH0525387 B2 JP H0525387B2
Authority
JP
Japan
Prior art keywords
discharge tube
microwave
magnetic field
discharge
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62181017A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6425417A (en
Inventor
Kazuo Suzuki
Tadashi Sonobe
Yasuhiro Mochizuki
Takuya Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Engineering and Services Co Ltd
Hitachi Ltd
Original Assignee
Hitachi Engineering and Services Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Engineering and Services Co Ltd, Hitachi Ltd filed Critical Hitachi Engineering and Services Co Ltd
Priority to JP18101787A priority Critical patent/JPS6425417A/ja
Publication of JPS6425417A publication Critical patent/JPS6425417A/ja
Publication of JPH0525387B2 publication Critical patent/JPH0525387B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP18101787A 1987-07-22 1987-07-22 Plasma treatment device Granted JPS6425417A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18101787A JPS6425417A (en) 1987-07-22 1987-07-22 Plasma treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18101787A JPS6425417A (en) 1987-07-22 1987-07-22 Plasma treatment device

Publications (2)

Publication Number Publication Date
JPS6425417A JPS6425417A (en) 1989-01-27
JPH0525387B2 true JPH0525387B2 (cg-RX-API-DMAC7.html) 1993-04-12

Family

ID=16093297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18101787A Granted JPS6425417A (en) 1987-07-22 1987-07-22 Plasma treatment device

Country Status (1)

Country Link
JP (1) JPS6425417A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103435561A (zh) * 2013-08-19 2013-12-11 上海交通大学 一种新型d-氨基酸氧化酶抑制剂及其制备和应用

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01181425A (ja) * 1988-01-08 1989-07-19 Sumitomo Metal Ind Ltd プラズマ装置
JP2705222B2 (ja) * 1989-06-13 1998-01-28 富士電機株式会社 Ｅｃｒプラズマｃｖｄ装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0693447B2 (ja) * 1983-12-23 1994-11-16 株式会社日立製作所 マイクロ波プラズマ処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103435561A (zh) * 2013-08-19 2013-12-11 上海交通大学 一种新型d-氨基酸氧化酶抑制剂及其制备和应用

Also Published As

Publication number Publication date
JPS6425417A (en) 1989-01-27

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