JPS6425417A - Plasma treatment device - Google Patents

Plasma treatment device

Info

Publication number
JPS6425417A
JPS6425417A JP18101787A JP18101787A JPS6425417A JP S6425417 A JPS6425417 A JP S6425417A JP 18101787 A JP18101787 A JP 18101787A JP 18101787 A JP18101787 A JP 18101787A JP S6425417 A JPS6425417 A JP S6425417A
Authority
JP
Japan
Prior art keywords
flux density
magnetic flux
microwave
discharge tube
spot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18101787A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0525387B2 (cg-RX-API-DMAC7.html
Inventor
Kazuo Suzuki
Tadashi Sonobe
Yasuhiro Mochizuki
Takuya Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Service Engineering Co Ltd
Hitachi Ltd
Original Assignee
Hitachi Service Engineering Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Service Engineering Co Ltd, Hitachi Ltd filed Critical Hitachi Service Engineering Co Ltd
Priority to JP18101787A priority Critical patent/JPS6425417A/ja
Publication of JPS6425417A publication Critical patent/JPS6425417A/ja
Publication of JPH0525387B2 publication Critical patent/JPH0525387B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP18101787A 1987-07-22 1987-07-22 Plasma treatment device Granted JPS6425417A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18101787A JPS6425417A (en) 1987-07-22 1987-07-22 Plasma treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18101787A JPS6425417A (en) 1987-07-22 1987-07-22 Plasma treatment device

Publications (2)

Publication Number Publication Date
JPS6425417A true JPS6425417A (en) 1989-01-27
JPH0525387B2 JPH0525387B2 (cg-RX-API-DMAC7.html) 1993-04-12

Family

ID=16093297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18101787A Granted JPS6425417A (en) 1987-07-22 1987-07-22 Plasma treatment device

Country Status (1)

Country Link
JP (1) JPS6425417A (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01181425A (ja) * 1988-01-08 1989-07-19 Sumitomo Metal Ind Ltd プラズマ装置
JPH0314223A (ja) * 1989-06-13 1991-01-22 Fuji Electric Co Ltd Ｅｃｒプラズマｃｖｄ装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103435561B (zh) * 2013-08-19 2016-08-10 上海交通大学 一种新型d-氨基酸氧化酶抑制剂及其制备和应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60134423A (ja) * 1983-12-23 1985-07-17 Hitachi Ltd マイクロ波プラズマエツチング装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60134423A (ja) * 1983-12-23 1985-07-17 Hitachi Ltd マイクロ波プラズマエツチング装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01181425A (ja) * 1988-01-08 1989-07-19 Sumitomo Metal Ind Ltd プラズマ装置
JPH0314223A (ja) * 1989-06-13 1991-01-22 Fuji Electric Co Ltd Ｅｃｒプラズマｃｖｄ装置

Also Published As

Publication number Publication date
JPH0525387B2 (cg-RX-API-DMAC7.html) 1993-04-12

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