JPH0523571Y2 - - Google Patents
Info
- Publication number
- JPH0523571Y2 JPH0523571Y2 JP9837386U JP9837386U JPH0523571Y2 JP H0523571 Y2 JPH0523571 Y2 JP H0523571Y2 JP 9837386 U JP9837386 U JP 9837386U JP 9837386 U JP9837386 U JP 9837386U JP H0523571 Y2 JPH0523571 Y2 JP H0523571Y2
- Authority
- JP
- Japan
- Prior art keywords
- sensor
- film thickness
- film
- substrate
- sensors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 18
- 230000008021 deposition Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 51
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000001704 evaporation Methods 0.000 description 8
- 230000008020 evaporation Effects 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 4
- 230000009977 dual effect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP9837386U JPH0523571Y2 (en:Method) | 1986-06-25 | 1986-06-25 | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP9837386U JPH0523571Y2 (en:Method) | 1986-06-25 | 1986-06-25 | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS637164U JPS637164U (en:Method) | 1988-01-18 | 
| JPH0523571Y2 true JPH0523571Y2 (en:Method) | 1993-06-16 | 
Family
ID=30966249
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP9837386U Expired - Lifetime JPH0523571Y2 (en:Method) | 1986-06-25 | 1986-06-25 | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPH0523571Y2 (en:Method) | 
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JP2012126938A (ja) * | 2010-12-14 | 2012-07-05 | Ulvac Japan Ltd | 真空蒸着装置及び薄膜の製造方法 | 
- 
        1986
        - 1986-06-25 JP JP9837386U patent/JPH0523571Y2/ja not_active Expired - Lifetime
 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPS637164U (en:Method) | 1988-01-18 | 
Similar Documents
| Publication | Publication Date | Title | 
|---|---|---|
| US20100147214A1 (en) | Dynamic Film Thickness Control System/Method and its Utilization | |
| JPH031378B2 (en:Method) | ||
| JPWO2004010746A1 (ja) | プラズマ処理装置及びその制御方法 | |
| US3747558A (en) | Cross-mounted mask changer with thickness monitoring | |
| JP2007231303A (ja) | 薄膜形成装置 | |
| JPH0523571Y2 (en:Method) | ||
| US4588942A (en) | Thickness monitoring system for intermittently exposing a quartz crystal to a material to be deposited | |
| JPH0772307A (ja) | 薄膜形成方法及び装置 | |
| JP2825298B2 (ja) | 膜厚測定装置 | |
| JP2008095158A (ja) | スパッタ成膜装置及びスパッタ成膜方法 | |
| CN214655217U (zh) | 一种磁控溅射靶随工件仿行移动装置 | |
| JPH065555A (ja) | プラズマ装置 | |
| JPH0643176Y2 (ja) | インライン式成膜装置 | |
| JP4418179B2 (ja) | 薄膜形成装置及び薄膜形成方法 | |
| JPH0527484Y2 (en:Method) | ||
| JPH04176866A (ja) | スパッタリング装置用成膜速度制御装置 | |
| JPS60245776A (ja) | 薄膜形成装置 | |
| JP3628395B2 (ja) | スパッタカソード | |
| JPH08239763A (ja) | スパッタ装置及びその調整方法 | |
| JPH0414450Y2 (en:Method) | ||
| JPH0641742A (ja) | スパッタリング装置 | |
| JP3292925B2 (ja) | 連続式スパッタ装置に於ける膜厚確認方法 | |
| JPS58108747A (ja) | スパツタ成膜装置 | |
| JPH10130839A (ja) | 薄膜形成装置及びこの装置に用いるシャッタの駆動方法 | |
| GB2337360A (en) | Ion implanter |