JPH0523502B2 - - Google Patents
Info
- Publication number
- JPH0523502B2 JPH0523502B2 JP60220002A JP22000285A JPH0523502B2 JP H0523502 B2 JPH0523502 B2 JP H0523502B2 JP 60220002 A JP60220002 A JP 60220002A JP 22000285 A JP22000285 A JP 22000285A JP H0523502 B2 JPH0523502 B2 JP H0523502B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- edge
- patterns
- target
- dimension
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Image Analysis (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Image Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60220002A JPS6281036A (ja) | 1985-10-04 | 1985-10-04 | パタ−ン認識方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60220002A JPS6281036A (ja) | 1985-10-04 | 1985-10-04 | パタ−ン認識方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6281036A JPS6281036A (ja) | 1987-04-14 |
| JPH0523502B2 true JPH0523502B2 (enrdf_load_stackoverflow) | 1993-04-02 |
Family
ID=16744389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60220002A Granted JPS6281036A (ja) | 1985-10-04 | 1985-10-04 | パタ−ン認識方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6281036A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2610372B2 (ja) * | 1991-10-31 | 1997-05-14 | 株式会社東芝 | 合せずれ測定方法 |
| JP2002245454A (ja) * | 2001-02-20 | 2002-08-30 | Advantest Corp | 画像マッチング方法、画像マッチング装置及びウェハ処理装置 |
-
1985
- 1985-10-04 JP JP60220002A patent/JPS6281036A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6281036A (ja) | 1987-04-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4498776A (en) | Electro-optical method and apparatus for measuring the fit of adjacent surfaces | |
| US7466854B2 (en) | Size checking method and apparatus | |
| TWI585550B (zh) | Pre-alignment measuring devices and methods | |
| JPS59119204A (ja) | マ−ク位置検出方法 | |
| KR960013357B1 (ko) | 화상데이타 검사방법 및 장치 | |
| IL138158A (en) | A method for determining the internal orientation of a silicon wafer | |
| US6965687B2 (en) | Size checking method and apparatus | |
| US6600561B2 (en) | Apparatus and method for measuring pattern alignment error | |
| JP3732794B2 (ja) | 寸法検査方法及びその装置並びにマスクの製造方法 | |
| JPH0523502B2 (enrdf_load_stackoverflow) | ||
| JP3273049B2 (ja) | ウエハのアライメント方法 | |
| JPS63168708A (ja) | 回転位置決め装置 | |
| JPH0443407B2 (enrdf_load_stackoverflow) | ||
| JPH104044A (ja) | パターン検出方法ならびにアライメントマーク検出方法およびそれを用いた光学装置 | |
| JP3966800B2 (ja) | 表面検査装置 | |
| JP2979917B2 (ja) | Ｉｃチップの位置決め方法 | |
| JPS63108736A (ja) | ウエハプロ−バ装置 | |
| JP3491102B2 (ja) | 重ね合わせ測定装置 | |
| JP2986130B2 (ja) | マークの検出処理方法 | |
| JPH0256812B2 (enrdf_load_stackoverflow) | ||
| JPH04198705A (ja) | ３次元形状測定装置 | |
| KR20010104458A (ko) | 3차원 형상물 재생방법 | |
| JPH04276642A (ja) | 半導体ウエハの測定方法 | |
| JPH09283580A (ja) | 重ね合わせ誤差の測定方法 | |
| JPH02121324A (ja) | フォトマスクおよびその検査法 |