JPH0521981B2 - - Google Patents

Info

Publication number
JPH0521981B2
JPH0521981B2 JP27111385A JP27111385A JPH0521981B2 JP H0521981 B2 JPH0521981 B2 JP H0521981B2 JP 27111385 A JP27111385 A JP 27111385A JP 27111385 A JP27111385 A JP 27111385A JP H0521981 B2 JPH0521981 B2 JP H0521981B2
Authority
JP
Japan
Prior art keywords
radiation
ring
vacuum
vacuum chamber
window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP27111385A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62130275A (ja
Inventor
Isamu Morisako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP27111385A priority Critical patent/JPS62130275A/ja
Publication of JPS62130275A publication Critical patent/JPS62130275A/ja
Publication of JPH0521981B2 publication Critical patent/JPH0521981B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP27111385A 1985-12-02 1985-12-02 放射線導入窓 Granted JPS62130275A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27111385A JPS62130275A (ja) 1985-12-02 1985-12-02 放射線導入窓

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27111385A JPS62130275A (ja) 1985-12-02 1985-12-02 放射線導入窓

Publications (2)

Publication Number Publication Date
JPS62130275A JPS62130275A (ja) 1987-06-12
JPH0521981B2 true JPH0521981B2 (enExample) 1993-03-26

Family

ID=17495515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27111385A Granted JPS62130275A (ja) 1985-12-02 1985-12-02 放射線導入窓

Country Status (1)

Country Link
JP (1) JPS62130275A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10322585B4 (de) * 2003-05-20 2018-12-06 Hydac Fluidtechnik Gmbh Ventilbaukastensysteme
JP6625891B2 (ja) 2016-02-10 2019-12-25 株式会社日立ハイテクノロジーズ 真空処理装置
JP6825069B2 (ja) * 2019-11-28 2021-02-03 株式会社日立ハイテク 真空処理装置

Also Published As

Publication number Publication date
JPS62130275A (ja) 1987-06-12

Similar Documents

Publication Publication Date Title
US6067931A (en) Thermal processor for semiconductor wafers
US3188513A (en) Optical filters and lamps embodying the same
JP2925700B2 (ja) 低圧化学蒸着法によって光学干渉被膜で被覆されたガラス反射体
CA1125926A (en) Radiation detector
KR100352105B1 (ko) 적외선검출기배열용가상냉각실드및냉각필터
CA1308283C (en) Infrared detector
RU97118326A (ru) Устройство термообработки полупроводниковых пластин
US6127658A (en) Wafer heating apparatus and method with radiation absorptive peripheral barrier blocking stray radiation
JPH0521981B2 (enExample)
US3989541A (en) Solar cell assembly
US6599585B2 (en) UV curing system for heat sensitive substances and process
JP2003521814A (ja) 高パワー無線周波数放射に対する光送信機／受信機の遮蔽
JPS62201639A (ja) 紫外線照射装置
GB2213257A (en) Solar collectors
JPS5791526A (en) Heating method for substrate surface in vacuum container
JPH0256804A (ja) 光源装置
JPS63269103A (ja) 反射体
JPH0543090Y2 (enExample)
JPS63269104A (ja) 反射体
JPS6490401A (en) Endothermic reflecting mirror
JPH04202782A (ja) 放射熱制御表面処理を施した機器
MXPA97008509A (en) Thermal processor for semiconductor plates
JPS63274773A (ja) プラズマｃｖｄ装置
JPH01132094A (ja) 高周波加熱装置
JPS62148254A (ja) 可視光透過熱線遮蔽積層体

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term