JPH0518447B2 - - Google Patents

Info

Publication number
JPH0518447B2
JPH0518447B2 JP60177430A JP17743085A JPH0518447B2 JP H0518447 B2 JPH0518447 B2 JP H0518447B2 JP 60177430 A JP60177430 A JP 60177430A JP 17743085 A JP17743085 A JP 17743085A JP H0518447 B2 JPH0518447 B2 JP H0518447B2
Authority
JP
Japan
Prior art keywords
alumina
groove
film
substrate
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60177430A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6237915A (ja
Inventor
Toshiaki Wada
Yoshiaki Katsuyama
Junichi Nakaoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP17743085A priority Critical patent/JPS6237915A/ja
Priority to US06/888,873 priority patent/US4777074A/en
Publication of JPS6237915A publication Critical patent/JPS6237915A/ja
Priority to US07/213,234 priority patent/US4875987A/en
Publication of JPH0518447B2 publication Critical patent/JPH0518447B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
JP17743085A 1985-08-12 1985-08-12 溝構造磁性基板の製造方法 Granted JPS6237915A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP17743085A JPS6237915A (ja) 1985-08-12 1985-08-12 溝構造磁性基板の製造方法
US06/888,873 US4777074A (en) 1985-08-12 1986-07-24 Grooved magnetic substrates and method for producing the same
US07/213,234 US4875987A (en) 1985-08-12 1988-06-29 Grooved magnetic substrates and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17743085A JPS6237915A (ja) 1985-08-12 1985-08-12 溝構造磁性基板の製造方法

Publications (2)

Publication Number Publication Date
JPS6237915A JPS6237915A (ja) 1987-02-18
JPH0518447B2 true JPH0518447B2 (enrdf_load_stackoverflow) 1993-03-12

Family

ID=16030799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17743085A Granted JPS6237915A (ja) 1985-08-12 1985-08-12 溝構造磁性基板の製造方法

Country Status (1)

Country Link
JP (1) JPS6237915A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58121118A (ja) * 1982-01-12 1983-07-19 Hitachi Ltd 薄膜磁気ヘツド
JPS59203213A (ja) * 1983-05-04 1984-11-17 Sumitomo Special Metals Co Ltd 溝構造磁性基板の製造方法

Also Published As

Publication number Publication date
JPS6237915A (ja) 1987-02-18

Similar Documents

Publication Publication Date Title
US4875987A (en) Grooved magnetic substrates and method for producing the same
JP4733890B2 (ja) ＳｉＯ２を主成分とする膜の成膜方法
US5284539A (en) Method of making segmented pyrolytic graphite sputtering targets
CN114657525B (zh) 一种FeCrAl/Ta合金涂层及其制备方法
CN115029669B (zh) 一种采用液态金属高功率脉冲磁控溅射提高沉积效率的方法
KR100698744B1 (ko) 하프늄 합금 타겟트 및 그 제조방법
CN118547254A (zh) 一种alpha相三氧化二铝铬涂层的制备方法
Seino et al. Aluminum oxide films deposited in low pressure conditions by reactive pulsed dc magnetron sputtering
JPH0518447B2 (enrdf_load_stackoverflow)
JPS59203213A (ja) 溝構造磁性基板の製造方法
JPH0364928B2 (enrdf_load_stackoverflow)
JPS60136035A (ja) 磁気デイスクの製造方法
CN113235060B (zh) 一种全α相钽涂层的制备方法
JP4666817B2 (ja) 高誘電体のエッチング装置
JPS6124213A (ja) ビスマス置換フエリ磁性ガーネツト　フイルムの形成方法
US6007685A (en) Deposition of highly doped silicon dioxide films
KR101294944B1 (ko) 초고장력 코팅막을 갖는 방향성 전기 강판 및 그 제조 방법
JPH07110912A (ja) 磁気ヘッド及びその製造方法
JPH0796702B2 (ja) 無機質基板のメタライゼーションの方法
SU1179447A1 (ru) Способ изготовлени контактного покрыти магнитоуправл емых герметизированных контактов
TW202305157A (zh) 導電矽濺射靶
JP3020245B2 (ja) マグネトロンスパッタ法および磁気記録媒体の製造方法
JPH033743B2 (enrdf_load_stackoverflow)
CN119121175A (zh) 一种钽环及其制备方法
JPH07102377A (ja) 炭素または炭素を主成分とする被膜

Legal Events

Date Code Title Description
S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

EXPY Cancellation because of completion of term