JPH0518253B2 - - Google Patents

Info

Publication number
JPH0518253B2
JPH0518253B2 JP11776884A JP11776884A JPH0518253B2 JP H0518253 B2 JPH0518253 B2 JP H0518253B2 JP 11776884 A JP11776884 A JP 11776884A JP 11776884 A JP11776884 A JP 11776884A JP H0518253 B2 JPH0518253 B2 JP H0518253B2
Authority
JP
Japan
Prior art keywords
resist film
resist
film
pattern
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11776884A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60262427A (ja
Inventor
Hitoshi Tsuji
Chiharu Kato
Kazuyuki Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP11776884A priority Critical patent/JPS60262427A/ja
Publication of JPS60262427A publication Critical patent/JPS60262427A/ja
Publication of JPH0518253B2 publication Critical patent/JPH0518253B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0272Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP11776884A 1984-06-08 1984-06-08 半導体装置の製造方法 Granted JPS60262427A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11776884A JPS60262427A (ja) 1984-06-08 1984-06-08 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11776884A JPS60262427A (ja) 1984-06-08 1984-06-08 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS60262427A JPS60262427A (ja) 1985-12-25
JPH0518253B2 true JPH0518253B2 (enrdf_load_stackoverflow) 1993-03-11

Family

ID=14719839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11776884A Granted JPS60262427A (ja) 1984-06-08 1984-06-08 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS60262427A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2105950A1 (en) * 2008-03-27 2009-09-30 United Radiant Technology Corp. Thin film etching method

Also Published As

Publication number Publication date
JPS60262427A (ja) 1985-12-25

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