JPH0517880Y2 - - Google Patents
Info
- Publication number
- JPH0517880Y2 JPH0517880Y2 JP1985088424U JP8842485U JPH0517880Y2 JP H0517880 Y2 JPH0517880 Y2 JP H0517880Y2 JP 1985088424 U JP1985088424 U JP 1985088424U JP 8842485 U JP8842485 U JP 8842485U JP H0517880 Y2 JPH0517880 Y2 JP H0517880Y2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- sample
- reaction processing
- plasma
- mounting table
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985088424U JPH0517880Y2 (enrdf_load_stackoverflow) | 1985-06-12 | 1985-06-12 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985088424U JPH0517880Y2 (enrdf_load_stackoverflow) | 1985-06-12 | 1985-06-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61203544U JPS61203544U (enrdf_load_stackoverflow) | 1986-12-22 |
JPH0517880Y2 true JPH0517880Y2 (enrdf_load_stackoverflow) | 1993-05-13 |
Family
ID=30641543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985088424U Expired - Lifetime JPH0517880Y2 (enrdf_load_stackoverflow) | 1985-06-12 | 1985-06-12 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0517880Y2 (enrdf_load_stackoverflow) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2637314C2 (de) * | 1976-08-19 | 1983-12-15 | Carl Still Gmbh & Co Kg, 4350 Recklinghausen | Einrichtung für die automatische periodische Umsteuerung der Regenerativ- Beheizung von Verkokungsbatterien |
US4158589A (en) * | 1977-12-30 | 1979-06-19 | International Business Machines Corporation | Negative ion extractor for a plasma etching apparatus |
JPS5799743A (en) * | 1980-12-11 | 1982-06-21 | Matsushita Electric Ind Co Ltd | Apparatus and method of plasma etching |
-
1985
- 1985-06-12 JP JP1985088424U patent/JPH0517880Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS61203544U (enrdf_load_stackoverflow) | 1986-12-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101056219B1 (ko) | 샤워헤드 및 기판 처리 장치 | |
JPS59126778A (ja) | プラズマエツチング方法及びその装置 | |
KR20020010639A (ko) | 진공처리방법 및 진공처리장치 | |
JPS6240728A (ja) | ドライエツチング装置 | |
JPH0423429A (ja) | 半導体装置のプラズマ処理装置及びプラズマ処理方法 | |
JPS6210687B2 (enrdf_load_stackoverflow) | ||
JP2550037B2 (ja) | ドライエッチング方法 | |
JPH0517880Y2 (enrdf_load_stackoverflow) | ||
JPH02106925A (ja) | ドライエッチング装置 | |
JPS63260033A (ja) | プラズマ反応処理装置 | |
JPH0526331B2 (enrdf_load_stackoverflow) | ||
JPH0241167B2 (enrdf_load_stackoverflow) | ||
JPS5964779A (ja) | 多チヤンバ−ドライエツチング装置 | |
JPS61267325A (ja) | 有機膜の除去方法 | |
JPH0239530A (ja) | ドライエッチング装置 | |
JPS635526A (ja) | ドライエツチング装置 | |
JPS59172236A (ja) | 反応性イオンエツチング装置 | |
JPH02148835A (ja) | プラズマ処理装置 | |
JPS63260032A (ja) | 有機膜の除去方法 | |
JPS5913328A (ja) | ドライエツチング装置 | |
JPS6348832A (ja) | Cvd装置 | |
JPS62119925A (ja) | 半導体製造装置 | |
JPS59173273A (ja) | 反応性イオンエツチング装置 | |
JPS61263126A (ja) | 有機膜の除去方法 | |
JPS59119727A (ja) | ドライエツチング方法 |