JPH05175373A - Epoxy resin composition - Google Patents

Epoxy resin composition

Info

Publication number
JPH05175373A
JPH05175373A JP34440791A JP34440791A JPH05175373A JP H05175373 A JPH05175373 A JP H05175373A JP 34440791 A JP34440791 A JP 34440791A JP 34440791 A JP34440791 A JP 34440791A JP H05175373 A JPH05175373 A JP H05175373A
Authority
JP
Japan
Prior art keywords
epoxy resin
solder
naphthol
resin
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP34440791A
Other languages
Japanese (ja)
Other versions
JP2954415B2 (en
Inventor
Hiroshi Fujita
浩史 藤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP34440791A priority Critical patent/JP2954415B2/en
Publication of JPH05175373A publication Critical patent/JPH05175373A/en
Application granted granted Critical
Publication of JP2954415B2 publication Critical patent/JP2954415B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To improve the moldability, reliability, and the properties of solder resistance at the time of soldering by arranging a specific epoxy resin, a specific phenol resin setting agent, a fused silica, and a triphenylphosphine as essential ingredients. CONSTITUTION:A co-condensation novolak epoxy resin of orthocresol and beta-naphthol represented by the formula I is contained in 30 to 100weight% of the total amount of the epoxy resin. Also, a co-condensation phenol resin setting agent of paraxylene and beta-naphthol represented by the formula II is contained in 30 to 100weight% of the total amount of the phenol resin setting agent. These elements and an inorganic filler and a setting accelerating agent are arranged as essential ingredients. Thus, it is possible to obtain an epoxy resin composition for semiconductor sealing excellent in the properties of solder heat resistance at the time of soldering without deteriorating its formability and reliability.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体デバイスの表面
実装化における耐半田ストレス性に優れた半導体封止用
エポキシ樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which is excellent in resistance to solder stress in surface mounting semiconductor devices.

【0002】[0002]

【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品を熱硬化性樹脂で封止しているが、特
に集積回路では耐熱性、耐湿性に優れたオルソクレゾー
ルノボラックエポキシ樹脂をノボラック型フェノール樹
脂で硬化させたエポキシ樹脂が用いられている。ところ
が近年、集積回路の高集積化に伴いチップがだんだん大
型化し、かつパッケージは従来のDIPタイプから、表
面実装化された小型、薄型のフラットパッケージ、SO
P,SOJ,PLCCに変わってきている。つまり大型
チップを、小型で薄いパッケージに封入することにな
り、応力によりクラックが発生、これらのクラックによ
る耐湿性の低下等の問題が大きくクローズアップされて
きている。特に半田付けの工程において、急激に250
℃以上の高温にさらされることにより、前記の問題点が
発生している。これらの大型チップを封止するのに適し
た、信頼性の高い封止用樹脂組成物の開発が望まれてき
ている。
2. Description of the Related Art Conventionally, electronic parts such as diodes, transistors, and integrated circuits have been sealed with thermosetting resin. Especially in integrated circuits, orthocresol novolak epoxy resin, which has excellent heat resistance and moisture resistance, is used as a novolak type. An epoxy resin cured with a phenol resin is used. However, in recent years, as the integration of integrated circuits has become higher and higher, the size of the chip has gradually increased, and the package has changed from the conventional DIP type to a surface-mounted small and thin flat package, SO.
It is changing to P, SOJ, PLCC. In other words, a large chip is to be enclosed in a small and thin package, and cracks are generated due to stress, and problems such as deterioration of moisture resistance due to these cracks have been greatly highlighted. Especially in the soldering process,
The above-mentioned problems are caused by being exposed to a high temperature of ℃ or more. Development of a highly reliable encapsulating resin composition suitable for encapsulating these large chips has been desired.

【0003】これらの問題点を解決するために、半田付
け時に熱衝撃を緩和する目的で、熱可塑性オリゴマーの
添加(特開昭62−115849号公報)や各種シリコ
ーン化合物の添加(特開昭62−115850号公報、
62−116654号公報、62−128162号公
報)、さらにはシリコーン変性(特開昭62−1368
60号公報)等の手法で対処しているが、いずれも半田
付け時にパッケージにクラックが生じてしまい、信頼性
の高い封止用エポキシ樹脂組成物を得るまでには至らな
かった。
In order to solve these problems, addition of a thermoplastic oligomer (Japanese Patent Laid-Open No. 62-15849) and various silicone compounds (Japanese Patent Laid-Open No. 62-15849) for the purpose of mitigating thermal shock during soldering. -11850 publication,
62-116654, 62-128162), and further silicone modification (JP-A-62-1368).
No. 60), but cracks occur in the package during soldering, and it has not been possible to obtain a highly reliable epoxy resin composition for sealing.

【0004】一方、半田付け時の耐熱ストレス性、つま
り耐半田ストレス性に優れた半導体封止用エポキシ樹脂
組成物を得る為に、樹脂系としてビフェニル型エポキシ
樹脂の使用(特開昭64−65116号公報)等が検討
されてきたが、ビフェニル型エポキシ樹脂の使用によ
り、リードフレームとの密着性及び、低吸水性が向上
し、耐半田ストレス性の向上、特にクラック発生が低減
するが、耐熱性が劣るために特に250℃以上の高温で
は、耐半田ストレス性が不十分である。
On the other hand, in order to obtain an epoxy resin composition for semiconductor encapsulation which is excellent in heat stress resistance during soldering, that is, solder stress resistance, use of a biphenyl type epoxy resin as a resin system (JP-A-64-65116). However, the use of biphenyl type epoxy resin improves the adhesion to the lead frame and the low water absorption, and improves the solder stress resistance, especially cracking is reduced, but In particular, at a high temperature of 250 ° C. or higher, the solder stress resistance is insufficient because of poor properties.

【0005】[0005]

【発明が解決しようとする課題】本発明は成形性および
信頼性を劣化させることなく、半田付け時の半田耐熱性
に優れた、半導体封止用エポキシ樹脂組成物を提供する
ものである。
SUMMARY OF THE INVENTION The present invention provides an epoxy resin composition for semiconductor encapsulation which is excellent in solder heat resistance during soldering without deteriorating moldability and reliability.

【0006】[0006]

【課題を解決するための手段】本発明のエポキシ樹脂組
成物は(A)下記式(1)で示されるオルソクレゾール
とβ−ナフトールの共縮合ノボラックエポキシ樹脂を総
エポキシ樹脂量に対して30〜100重量%含むエポキ
シ樹脂、
The epoxy resin composition of the present invention comprises (A) a co-condensed novolac epoxy resin of orthocresol and β-naphthol represented by the following formula (1) in an amount of 30 to 30 with respect to the total amount of epoxy resin. Epoxy resin containing 100% by weight,

【0007】[0007]

【化3】 [Chemical 3]

【0008】(B)下記式(2)で示されるパラキシレ
ンとβ−ナフトールの共縮合フェノール樹脂硬化剤を総
フェノール樹脂硬化剤量に対して30〜100重量%含
むフェノール樹脂硬化剤、
(B) A phenol resin curing agent containing a para-xylene and β-naphthol co-condensation phenol resin curing agent represented by the following formula (2) in an amount of 30 to 100% by weight based on the total amount of the phenol resin curing agent,

【0009】[0009]

【化4】 [Chemical 4]

【0010】(C)無機質充填材及び (D)硬化促進剤 を必須成分とする半導体封止用エポキシ樹脂組成物で、
従来のエポキシ樹脂組成物に比べ、非常に優れた半田耐
熱性を持つものである。
An epoxy resin composition for semiconductor encapsulation, which comprises (C) an inorganic filler and (D) a curing accelerator as essential components,
It has extremely excellent solder heat resistance as compared with conventional epoxy resin compositions.

【0011】本発明に用いる式(1)のオルソクレゾー
ルとβ−ナフトールの共縮合ノボラックエポキシ樹脂
は、オルソクレゾールとβ−ナフトールをホルムアルデ
ヒドより共縮合させたノボラック樹脂のエポキシ化物で
あり、その共縮合時のβ−ナフトール量は60重量%以
上が望ましく式(1)の構造を主とする化合物である。
ここでnは1〜6で、6を越えると成形時の流動性が劣
る。
The co-condensed novolac epoxy resin of orthocresol and β-naphthol of the formula (1) used in the present invention is an epoxidized novolak resin obtained by co-condensing orthocresol and β-naphthol from formaldehyde, and the co-condensation thereof. At this time, the amount of β-naphthol is preferably 60% by weight or more, and the compound mainly has the structure of formula (1).
Here, n is 1 to 6, and if it exceeds 6, the fluidity at the time of molding becomes poor.

【0012】式(1)の樹脂は、低吸水性に優れ、樹脂
の線膨張係数が小さく、成形時の離型性に優れ、半田付
け時の良好な半田耐熱性を示す。オルソクレゾールとβ
−ナフトールの共縮合ノボラックエポキシ樹脂の使用量
は、これを調節することにより半田耐熱性を最大限に引
き出すことができる。半田耐熱性の効果を出すために
は、オルソクレゾールとβ−ナフトールの共縮合ノボラ
ックエポキシ樹脂を総エポキシ樹脂量の30重量%以
上、好ましくは60重量%以上の使用が好ましい。30
重量%未満では低吸水性、低線膨張係数が十分に得られ
ず、半田耐熱性が不十分である。
The resin of the formula (1) has excellent low water absorption, a small linear expansion coefficient of the resin, excellent releasability during molding, and good solder heat resistance during soldering. Orthocresol and β
-The amount of naphthol co-condensed novolak epoxy resin used can be adjusted to maximize solder heat resistance. In order to obtain the effect of soldering heat resistance, it is preferable to use the co-condensed novolac epoxy resin of orthocresol and β-naphthol in an amount of 30% by weight or more, preferably 60% by weight or more based on the total amount of epoxy resin. Thirty
If it is less than wt%, low water absorption and low linear expansion coefficient cannot be sufficiently obtained, and solder heat resistance is insufficient.

【0013】オルソクレゾールとβ−ナフトールの共縮
合ノボラックエポキシ樹脂以外の他のエポキシ樹脂を併
用する場合、用いるエポキシ樹脂とは、エポキシ基を有
するポリマー全般をいう。例えばビスフェノール型エポ
キシ樹脂、クレゾールノボラック型エポキシ樹脂、ビフ
ェニル型エポキシ樹脂、フェノールノボラック型エポキ
シ樹脂、トリフェニルメタン型エポキシ樹脂、トリアジ
ン環含有エポキシ樹脂等のことをいう。
When an epoxy resin other than the co-condensed novolak epoxy resin of orthocresol and β-naphthol is used in combination, the epoxy resin used means all polymers having an epoxy group. For example, it means a bisphenol type epoxy resin, a cresol novolac type epoxy resin, a biphenyl type epoxy resin, a phenol novolac type epoxy resin, a triphenylmethane type epoxy resin, a triazine ring-containing epoxy resin and the like.

【0014】式(2)で示される構造のパラキシレンと
β−ナフトールの共縮合フェノール樹脂硬化剤は、エポ
キシ樹脂との反応硬化物が強靭性、低吸水性が得られる
特徴を有する。特に半田付け時の高温時での強靭性に優
れており、250〜260℃での半田付け時の半田耐熱
性に著しい効果をもたらす。ここで式(2)のnは1〜
6で、6を越えると成形時の流動性が劣る。
The para-xylene and β-naphthol co-condensation phenol resin curing agent having the structure represented by the formula (2) is characterized in that a cured product obtained by reaction with an epoxy resin has toughness and low water absorption. In particular, it has excellent toughness at high temperature during soldering, and has a remarkable effect on solder heat resistance during soldering at 250 to 260 ° C. Here, n in the formula (2) is 1 to
In case of 6, when it exceeds 6, the fluidity at the time of molding becomes poor.

【0015】半田耐熱性の効果を引き出すには式(2)
で示されるパラキシレンとβ−ナフトールの共縮合フェ
ノール樹脂硬化剤を総フェノール樹脂硬化剤の30重量
%以上、好ましくは60重量%以上の使用が望ましい。
30重量%未満では熱時強靭性が不十分となり、半田付
け時の半田耐熱性が十分に得られない。またパラキシレ
ンとβ−ナフトール共縮合フェノール樹脂硬化剤に他の
ものを併用する場合、用いるものとしてはフェノール性
水酸基を有するポリマー全体をいう。例えば、フェノー
ルノボラック樹脂、クレゾールノボラック樹脂、ジシク
ロペンタジエン変性フェノール樹脂とフェノールノボラ
ック樹脂及びクレゾールノボラック樹脂との共縮合物を
用いることができる。
To obtain the effect of solder heat resistance, the formula (2) is used.
It is desirable to use the para-xylene and β-naphthol co-condensed phenolic resin curing agent represented by the above formula in an amount of 30% by weight or more, preferably 60% by weight or more based on the total phenolic resin curing agent.
If it is less than 30% by weight, the toughness at the time of heating becomes insufficient and the solder heat resistance at the time of soldering cannot be sufficiently obtained. Further, when other one is used in combination with the para-xylene and the β-naphthol co-condensation phenol resin curing agent, it means the entire polymer having a phenolic hydroxyl group. For example, a phenol novolac resin, a cresol novolac resin, a co-condensation product of a dicyclopentadiene-modified phenol resin with a phenol novolac resin or a cresol novolac resin can be used.

【0016】本発明で用いる無機質充填材としては、溶
融シリカ粉末、球状シリカ粉末、結晶シリカ粉末、二次
凝集シリカ粉末、多孔質シリカ粉末を粉砕したシリカ粉
末、アルミナ等が挙げられ、特に溶融シリカ粉末、球状
シリカ粉末及び溶融シリカ粉末と球状シリカ粉末との混
合物が好ましい。また無機質充填材の配合量としては、
耐半田ストレス性と成形性のバランスから、総樹脂組成
物中に70〜90重量部含まれるものが望ましい。
Examples of the inorganic filler used in the present invention include fused silica powder, spherical silica powder, crystalline silica powder, secondary agglomerated silica powder, silica powder obtained by crushing porous silica powder, alumina, etc., and particularly fused silica. Powders, spherical silica powders and mixtures of fused silica powders and spherical silica powders are preferred. In addition, as the compounding amount of the inorganic filler,
From the standpoint of balance between solder stress resistance and moldability, it is desirable that the total resin composition contains 70 to 90 parts by weight.

【0017】さらに本発明に用いる硬化促進剤はエポキ
シ基と水酸基の反応を促進するものであれば良く、一般
に封止材料に使用されているものを広く使用することが
できる。例えばトリフェニルホスフィン(TPP)、ト
リブチルホスフィン、トリ(4−メチルフェニル)ホス
フィン等の有機ホスフィン化合物、トリブチルアミン、
トリエチルアミン、ベンジルジメチルアミン、トリスジ
メチルアミノメチルフェノール、1,8−ジアザビシク
ロ[5,4,0]−7−ウンデセン(DBU)等の3級
アミン、2−メチルイミダゾール、2−フェニルイミダ
ゾール、2−エチル−4−メチルイミダゾール等のイミ
ダゾール化合物等が挙げられる。これらを単独で用いて
も、あるいはその2種以上を併用することも可能であ
る。
Further, the curing accelerator used in the present invention may be any one as long as it accelerates the reaction between the epoxy group and the hydroxyl group, and those generally used for the sealing material can be widely used. For example, organic phosphine compounds such as triphenylphosphine (TPP), tributylphosphine, tri (4-methylphenyl) phosphine, tributylamine,
Tertiary amines such as triethylamine, benzyldimethylamine, trisdimethylaminomethylphenol, 1,8-diazabicyclo [5,4,0] -7-undecene (DBU), 2-methylimidazole, 2-phenylimidazole, 2-ethyl. Examples thereof include imidazole compounds such as 4-methylimidazole. These may be used alone or in combination of two or more.

【0018】本発明の組成物は前述のもの以外、必要に
応じてカーボンブラック等の着色剤、カルナバワック
ス、合成ワックス等の離型剤、ブロム化エポキシ、三酸
化アンチモン等の難燃剤、γ−グリシドキシプロピルト
リメトキシシラン等のカップリング剤、シリコーンゴ
ム、ポリブタジエン等のゴム成分を添加することができ
る。
In addition to the above, the composition of the present invention may optionally contain a coloring agent such as carbon black, a release agent such as carnauba wax and synthetic wax, a flame retardant such as brominated epoxy and antimony trioxide, and γ-. A coupling agent such as glycidoxypropyltrimethoxysilane and a rubber component such as silicone rubber and polybutadiene can be added.

【0019】本発明のエポキシ樹脂組成物はエポキシ樹
脂、硬化剤、無機質充填材、硬化促進剤、その他の添加
剤をミキサー等で均一に混合した後、ロール、押し出し
機等の一般混練装置により熱溶融混練し、冷却、粉砕す
ることにより成形材料とすることができる。
The epoxy resin composition of the present invention is prepared by uniformly mixing an epoxy resin, a curing agent, an inorganic filler, a curing accelerator, and other additives with a mixer or the like, and then heating the mixture with a general kneading device such as a roll or an extruder. A molding material can be obtained by melt-kneading, cooling and pulverizing.

【0020】[0020]

【実施例】以下本発明を実施例で具体的に説明する。配
合割合は重量部である。
EXAMPLES The present invention will be specifically described below with reference to examples. The mixing ratio is parts by weight.

【0021】実施例1 下記式(1)で示されるオルソクレゾールとβ−ナフトールの共縮合ノボラッ クエポキシ樹脂(重量比でn=1が1に対し、n=2が0.3の混合物、 エポキシ当量228、軟化点83℃) 4.5重量部Example 1 A co-condensed novolak epoxy resin of orthocresol and β-naphthol represented by the following formula (1) (a mixture of n = 1 of 1 and n = 2 of 0.3 by weight ratio, epoxy equivalent) 228, softening point 83 ° C) 4.5 parts by weight

【0022】[0022]

【化5】 [Chemical 5]

【0023】 オルソクレゾールノボラックエポキシ樹脂 (エポキシ当量200、軟化点65℃) 10.5重量部 下記式(2)で示されるパラキシレンとβ−ナフトール共縮合フェノール樹脂 硬化剤(重量比でn=1が1に対し、n=2が1.4、n=3が0.4、n=4 が0.1の混合物、水酸基当量231、軟化点113℃) 3.0重量部Orthocresol novolac epoxy resin (epoxy equivalent 200, softening point 65 ° C.) 10.5 parts by weight Para-xylene and β-naphthol co-condensed phenol resin represented by the following formula (2) Curing agent (n = 1 by weight) 1 to 1, n = 2 is 1.4, n = 3 is 0.4, n = 4 is 0.1, hydroxyl equivalent is 231, softening point is 113 ° C.) 3.0 parts by weight

【0024】[0024]

【化6】 [Chemical 6]

【0025】 フェノールノボラック樹脂 (水酸基当量105、軟化点95℃) 6.0重量部 溶融シリカ粉末 75.0重量部 トリフェニルホスフィン 0.2重量部 カーボンブラック 0.3重量部 カルナバワックス 0.5重量部 をミキサーで常温で混合し、70〜100℃で2軸ロー
ルにより混練し、冷却後粉砕して成形材料とした。得ら
れた成形材料をタブレット化し、低圧トランスファー成
形機にて175℃、70kg/cm2 、120秒の条件で半
田クラック試験用として6×6mmのチップを52pパッ
ケージに封入し、また半田耐湿試験用として3×6mmの
チップを16pSOPパッケージに封入した。封止した
テスト用素子について下記の半田クラック試験及び半田
耐湿性試験を行った。
Phenol novolac resin (hydroxyl equivalent 105, softening point 95 ° C.) 6.0 parts by weight fused silica powder 75.0 parts by weight triphenylphosphine 0.2 parts by weight carbon black 0.3 parts by weight carnauba wax 0.5 parts by weight The parts were mixed at room temperature with a mixer, kneaded with a biaxial roll at 70 to 100 ° C., cooled and pulverized to obtain a molding material. The obtained molding material is made into a tablet, and a 6 x 6 mm chip is encapsulated in a 52p package for a solder crack test under conditions of 175 ° C, 70 kg / cm 2 and 120 seconds on a low-pressure transfer molding machine, and also for a solder moisture resistance test. A 3 × 6 mm chip was encapsulated in a 16 pSOP package. The sealed test element was subjected to the following solder crack test and solder moisture resistance test.

【0026】半田クラック試験:封止したテスト用素子
を85℃、85%RHの環境下で48Hr及び72Hr
処理し、その後260℃の半田槽に10秒間浸漬後、顕
微鏡で外部クラックを観察した。 半田耐湿性試験:封止しテスト用素子を85℃、85%
RHの環境下で72Hr処理し、その後260℃の半田
槽に10秒間浸漬後、プレッシャークッカー試験(12
5℃、100%RH)を行い、回路のオープン不良を測
定した。試験結果を表1に示す。
Solder crack test: The sealed test element was subjected to an environment of 85 ° C. and 85% RH for 48 hours and 72 hours.
After processing, it was immersed in a solder bath at 260 ° C. for 10 seconds, and external cracks were observed with a microscope. Solder moisture resistance test: sealed test element at 85 ℃, 85%
It is treated for 72 hours in an environment of RH, then immersed in a solder bath at 260 ° C for 10 seconds, and then subjected to a pressure cooker test (12
The circuit was opened at 5 ° C. and 100% RH, and the open circuit failure was measured. The test results are shown in Table 1.

【0027】実施例2〜5 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。この成形材料でテスト用素子を封止した成
形品を得、この成形品を用いて実施例1と同様に半田ク
ラック試験及び半田耐湿性試験を行った。試験結果を表
1に示す。
Examples 2 to 5 Compounding was carried out according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. A molded product in which a test element was sealed with this molding material was obtained, and a solder crack test and a solder moisture resistance test were conducted using this molded product in the same manner as in Example 1. The test results are shown in Table 1.

【0028】比較例1〜5 表1の処方に従って配合し、実施例1と同様にして成形
材料を得た。この成形材料でテスト用素子を封止した成
形品を得、この成形品を用いて実施例1と同様に半田ク
ラック試験及び半田耐湿性試験を行った。試験結果を表
1に示す。
Comparative Examples 1 to 5 Compounding was carried out according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. A molded product in which a test element was sealed with this molding material was obtained, and a solder crack test and a solder moisture resistance test were conducted using this molded product in the same manner as in Example 1. The test results are shown in Table 1.

【0029】[0029]

【表1】 [Table 1]

【0030】[0030]

【発明の効果】以上のように、本発明によるエポキシ樹
脂組成物によれば、通常のエポキシ樹脂と比べ、成形性
を劣化させることがなく、耐半田ストレス性が向上し、
半田付け時におけるクラックの発生が起こらない。更に
低吸水性であるため半田耐湿性も大幅に向上する。これ
らから明かなように、本組成物は成形性、信頼性、半田
付け時の耐半田ストレス性に優れた半導体封止材料とし
て有用である。
As described above, according to the epoxy resin composition of the present invention, the moldability is not deteriorated and the solder stress resistance is improved as compared with the usual epoxy resin.
No cracks occur during soldering. Furthermore, since it has low water absorption, solder moisture resistance is also significantly improved. As is clear from these, the present composition is useful as a semiconductor encapsulating material excellent in moldability, reliability, and resistance to soldering stress during soldering.

フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C08G 59/62 NJU 8416−4J C08K 3/36 NKX 7167−4J C08L 63/00 NJW 8830−4J Continuation of front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical display location C08G 59/62 NJU 8416-4J C08K 3/36 NKX 7167-4J C08L 63/00 NJW 8830-4J

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 (A)下記式(1)で示されるオルソク
レゾールとβ−ナフトールの共縮合ノボラックエポキシ
樹脂を総エポキシ樹脂量に対して30〜100重量%含
むエポキシ樹脂、 【化1】 (n=1〜6) (B)下記式(2)で示されるパラキシレンとβ−ナフ
トールの共縮合フェノール樹脂硬化剤を総フェノール樹
脂硬化剤量に対して30〜100重量%含むフェノール
樹脂硬化剤、 【化2】 (n=1〜6) (C)無機質充填材及び (D)硬化促進剤 を必須成分とすることを特徴とする半導体封止用エポキ
シ樹脂組成物。
1. An epoxy resin comprising (A) an orthocresol and β-naphthol co-condensed novolac epoxy resin represented by the following formula (1) in an amount of 30 to 100% by weight based on the total amount of epoxy resin: (N = 1 to 6) (B) Phenolic resin curing containing a para-xylene and β-naphthol co-condensed phenolic resin curing agent represented by the following formula (2) in an amount of 30 to 100% by weight based on the total amount of the phenolic resin curing agent. Agent, (N = 1 to 6) An epoxy resin composition for semiconductor encapsulation, which comprises (C) an inorganic filler and (D) a curing accelerator as essential components.
JP34440791A 1991-12-26 1991-12-26 Epoxy resin composition Expired - Fee Related JP2954415B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34440791A JP2954415B2 (en) 1991-12-26 1991-12-26 Epoxy resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34440791A JP2954415B2 (en) 1991-12-26 1991-12-26 Epoxy resin composition

Publications (2)

Publication Number Publication Date
JPH05175373A true JPH05175373A (en) 1993-07-13
JP2954415B2 JP2954415B2 (en) 1999-09-27

Family

ID=18369017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34440791A Expired - Fee Related JP2954415B2 (en) 1991-12-26 1991-12-26 Epoxy resin composition

Country Status (1)

Country Link
JP (1) JP2954415B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014189640A (en) * 2013-03-27 2014-10-06 Dic Corp Curable composition, cured product and printed circuit board
JP2014189750A (en) * 2013-03-28 2014-10-06 Dic Corp Curable composition, cured product and printed circuit board
CN113292957A (en) * 2021-07-27 2021-08-24 武汉市三选科技有限公司 Underfill adhesive for chip packaging and chip packaging structure

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014189640A (en) * 2013-03-27 2014-10-06 Dic Corp Curable composition, cured product and printed circuit board
JP2014189750A (en) * 2013-03-28 2014-10-06 Dic Corp Curable composition, cured product and printed circuit board
CN113292957A (en) * 2021-07-27 2021-08-24 武汉市三选科技有限公司 Underfill adhesive for chip packaging and chip packaging structure

Also Published As

Publication number Publication date
JP2954415B2 (en) 1999-09-27

Similar Documents

Publication Publication Date Title
JP3004463B2 (en) Epoxy resin composition
JP2963260B2 (en) Epoxy resin composition
JP2954415B2 (en) Epoxy resin composition
JP2991850B2 (en) Epoxy resin composition
JP2951092B2 (en) Epoxy resin composition
JPH05206331A (en) Resin composition for sealing semiconductor
JPH09143345A (en) Epoxy resin composition
JP3013511B2 (en) Epoxy resin composition for semiconductor encapsulation
JP2823633B2 (en) Epoxy resin composition
JP3093051B2 (en) Epoxy resin composition
JP2951089B2 (en) Epoxy resin composition
JPH06184272A (en) Epoxy resin composition
JP2951091B2 (en) Epoxy resin composition
JP2991847B2 (en) Resin composition for semiconductor encapsulation
JP3032067B2 (en) Epoxy resin composition
JP3093050B2 (en) Epoxy resin composition
JPH07173255A (en) Epoxy resin composition
JP3302259B2 (en) Epoxy resin composition
JPH10147628A (en) Epoxy resin composition for sealing semiconductor
JP2687764B2 (en) Resin composition for semiconductor encapsulation
JPH05343570A (en) Epoxy resin composition
JPH08176278A (en) Resin composition
JPH06100658A (en) Epoxy resin composition
JPH05160300A (en) Epoxy resin composition
JPH06107772A (en) Epoxy resin composition

Legal Events

Date Code Title Description
FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090716

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100716

Year of fee payment: 11

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110716

Year of fee payment: 12

LAPS Cancellation because of no payment of annual fees