JPH0516584B2 - - Google Patents
Info
- Publication number
- JPH0516584B2 JPH0516584B2 JP5309985A JP5309985A JPH0516584B2 JP H0516584 B2 JPH0516584 B2 JP H0516584B2 JP 5309985 A JP5309985 A JP 5309985A JP 5309985 A JP5309985 A JP 5309985A JP H0516584 B2 JPH0516584 B2 JP H0516584B2
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- alignment key
- mask
- key
- photolithography process
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 21
- 238000000206 photolithography Methods 0.000 claims description 11
- 238000010586 diagram Methods 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60053099A JPS6224259A (ja) | 1985-03-15 | 1985-03-15 | 手動による電子部品のマスク位置合せ方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60053099A JPS6224259A (ja) | 1985-03-15 | 1985-03-15 | 手動による電子部品のマスク位置合せ方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6224259A JPS6224259A (ja) | 1987-02-02 |
JPH0516584B2 true JPH0516584B2 (US06633782-20031014-M00005.png) | 1993-03-04 |
Family
ID=12933337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60053099A Granted JPS6224259A (ja) | 1985-03-15 | 1985-03-15 | 手動による電子部品のマスク位置合せ方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6224259A (US06633782-20031014-M00005.png) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5556808A (en) * | 1994-06-30 | 1996-09-17 | Motorola Inc. | Method for aligning a semiconductor device |
JP5673719B2 (ja) | 2013-03-27 | 2015-02-18 | Tdk株式会社 | 電子部品の製造装置およびその製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5382173A (en) * | 1976-12-27 | 1978-07-20 | Fujitsu Ltd | Positioning method |
JPS5555340A (en) * | 1978-10-18 | 1980-04-23 | Nec Kyushu Ltd | Photo mask for automatically aligning exposure and automatically aligning exposure method |
JPS57167111A (en) * | 1981-04-06 | 1982-10-14 | Nec Corp | Production for thin film device |
-
1985
- 1985-03-15 JP JP60053099A patent/JPS6224259A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5382173A (en) * | 1976-12-27 | 1978-07-20 | Fujitsu Ltd | Positioning method |
JPS5555340A (en) * | 1978-10-18 | 1980-04-23 | Nec Kyushu Ltd | Photo mask for automatically aligning exposure and automatically aligning exposure method |
JPS57167111A (en) * | 1981-04-06 | 1982-10-14 | Nec Corp | Production for thin film device |
Also Published As
Publication number | Publication date |
---|---|
JPS6224259A (ja) | 1987-02-02 |
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