JPH0514451Y2 - - Google Patents
Info
- Publication number
- JPH0514451Y2 JPH0514451Y2 JP1985200788U JP20078885U JPH0514451Y2 JP H0514451 Y2 JPH0514451 Y2 JP H0514451Y2 JP 1985200788 U JP1985200788 U JP 1985200788U JP 20078885 U JP20078885 U JP 20078885U JP H0514451 Y2 JPH0514451 Y2 JP H0514451Y2
- Authority
- JP
- Japan
- Prior art keywords
- electron
- diameter
- rocking
- pattern
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985200788U JPH0514451Y2 (cg-RX-API-DMAC7.html) | 1985-12-27 | 1985-12-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985200788U JPH0514451Y2 (cg-RX-API-DMAC7.html) | 1985-12-27 | 1985-12-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62109342U JPS62109342U (cg-RX-API-DMAC7.html) | 1987-07-13 |
| JPH0514451Y2 true JPH0514451Y2 (cg-RX-API-DMAC7.html) | 1993-04-16 |
Family
ID=31163632
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985200788U Expired - Lifetime JPH0514451Y2 (cg-RX-API-DMAC7.html) | 1985-12-27 | 1985-12-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0514451Y2 (cg-RX-API-DMAC7.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2680004B2 (ja) * | 1987-11-27 | 1997-11-19 | 株式会社日立製作所 | 照射ビーム径評価用素子及び評価方法 |
| JP6433550B1 (ja) * | 2017-07-19 | 2018-12-05 | 株式会社日立製作所 | 試料保持機構、及び荷電粒子線装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5597955A (en) * | 1979-01-18 | 1980-07-25 | Tdk Corp | Screen printing machine |
| JPS58123303A (ja) * | 1982-01-19 | 1983-07-22 | 株式会社東芝 | ガス絶縁開閉装置 |
-
1985
- 1985-12-27 JP JP1985200788U patent/JPH0514451Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62109342U (cg-RX-API-DMAC7.html) | 1987-07-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5504614A (en) | Method for fabricating a DMD spatial light modulator with a hardened hinge | |
| US6320187B1 (en) | Magnification and rotation calibration patterns for particle beam projection system | |
| TW495834B (en) | Method of electron-beam exposure and mask and electron-beam exposure system used therein | |
| JP2563134B2 (ja) | 走査透過型位相差電子顕微鏡 | |
| US20070158567A1 (en) | Apparatus and adjusting method for a scanning transmission electron microscope | |
| JP2000123768A (ja) | 荷電粒子線装置及び荷電粒子線装置の調整方法及び半導体デバイスの製造方法 | |
| JP2006294301A (ja) | 走査形電子顕微鏡 | |
| JP3274212B2 (ja) | 電子線検出器及びそれを用いた電子線描画装置 | |
| TWI768191B (zh) | 用於自動對準掃描透射電子顯微鏡以便旋進電子衍射資料映射的方法 | |
| JPH0514451Y2 (cg-RX-API-DMAC7.html) | ||
| EP3379557A1 (en) | Scanning transmission electron microscope and method for high throughput acquisition of electron scattering angle distribution images | |
| JPH0313700B2 (cg-RX-API-DMAC7.html) | ||
| JPH10214784A (ja) | 電粒子リソグラフィ・システム用を較正する方法およびシステム | |
| DE19851967A1 (de) | Mikrospiegel und Verfahren zu seiner Herstellung | |
| JP3288767B2 (ja) | 荷電ビーム描画装置 | |
| JPH0235419B2 (cg-RX-API-DMAC7.html) | ||
| JP2007248082A (ja) | 荷電粒子線装置に用いられる標準試料，荷電粒子線装置、及び荷電粒子線装置に用いられる標準試料の製造方法 | |
| JPH0234144B2 (cg-RX-API-DMAC7.html) | ||
| JP2002367551A (ja) | 電子線装置 | |
| US9754696B2 (en) | Resolution test chart for X-ray imaging system and method of fabrication | |
| JP3684106B2 (ja) | 成膜装置 | |
| JP3919255B2 (ja) | 電子ビーム露光装置及びデバイス製造方法 | |
| JP2737220B2 (ja) | 走査型反射回折電子顕微鏡 | |
| JPH06338445A (ja) | 電子ビーム描画装置 | |
| JPH0697084A (ja) | ビーム誘起プロセス装置 |