JPH0511920B2 - - Google Patents

Info

Publication number
JPH0511920B2
JPH0511920B2 JP62218815A JP21881587A JPH0511920B2 JP H0511920 B2 JPH0511920 B2 JP H0511920B2 JP 62218815 A JP62218815 A JP 62218815A JP 21881587 A JP21881587 A JP 21881587A JP H0511920 B2 JPH0511920 B2 JP H0511920B2
Authority
JP
Japan
Prior art keywords
synchrotron radiation
speed
sensor
exposure apparatus
extraction window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62218815A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6461700A (en
Inventor
Koichi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP62218815A priority Critical patent/JPS6461700A/ja
Publication of JPS6461700A publication Critical patent/JPS6461700A/ja
Publication of JPH0511920B2 publication Critical patent/JPH0511920B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP62218815A 1987-08-31 1987-08-31 Synchrotron radiation light exposing device Granted JPS6461700A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62218815A JPS6461700A (en) 1987-08-31 1987-08-31 Synchrotron radiation light exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62218815A JPS6461700A (en) 1987-08-31 1987-08-31 Synchrotron radiation light exposing device

Publications (2)

Publication Number Publication Date
JPS6461700A JPS6461700A (en) 1989-03-08
JPH0511920B2 true JPH0511920B2 (fr) 1993-02-16

Family

ID=16725778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62218815A Granted JPS6461700A (en) 1987-08-31 1987-08-31 Synchrotron radiation light exposing device

Country Status (1)

Country Link
JP (1) JPS6461700A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2627543B2 (ja) * 1988-09-05 1997-07-09 キヤノン株式会社 Ｓｏｒ露光システム
EP0422814B1 (fr) * 1989-10-02 1999-03-17 Canon Kabushiki Kaisha Appareil d'exposition
JP2959579B2 (ja) * 1990-06-19 1999-10-06 キヤノン株式会社 Ｘ線露光装置
DE102012215697A1 (de) * 2012-09-05 2014-03-06 Carl Zeiss Smt Gmbh Blockierelement zum Schutz von optischen Elementen in Projektionsbelichtungsanlagen

Also Published As

Publication number Publication date
JPS6461700A (en) 1989-03-08

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