JPH0511652B2 - - Google Patents

Info

Publication number
JPH0511652B2
JPH0511652B2 JP62009579A JP957987A JPH0511652B2 JP H0511652 B2 JPH0511652 B2 JP H0511652B2 JP 62009579 A JP62009579 A JP 62009579A JP 957987 A JP957987 A JP 957987A JP H0511652 B2 JPH0511652 B2 JP H0511652B2
Authority
JP
Japan
Prior art keywords
pattern
photosensitive resin
semiconductor substrate
resist
resist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62009579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63177518A (ja
Inventor
Kazuhiko Urayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP62009579A priority Critical patent/JPS63177518A/ja
Publication of JPS63177518A publication Critical patent/JPS63177518A/ja
Publication of JPH0511652B2 publication Critical patent/JPH0511652B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62009579A 1987-01-19 1987-01-19 パタ−ン形成方法 Granted JPS63177518A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62009579A JPS63177518A (ja) 1987-01-19 1987-01-19 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62009579A JPS63177518A (ja) 1987-01-19 1987-01-19 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS63177518A JPS63177518A (ja) 1988-07-21
JPH0511652B2 true JPH0511652B2 (show.php) 1993-02-16

Family

ID=11724220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62009579A Granted JPS63177518A (ja) 1987-01-19 1987-01-19 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS63177518A (show.php)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2560773B2 (ja) * 1988-02-26 1996-12-04 三菱電機株式会社 パターン形成方法
JPH0299959A (ja) * 1988-10-06 1990-04-11 Matsushita Electric Ind Co Ltd パターン形成方法
JPH07105334B2 (ja) * 1989-08-28 1995-11-13 日本電気株式会社 レジストパターンの現像方法
JP2870443B2 (ja) * 1995-02-06 1999-03-17 サンケン電気株式会社 レジストパタ−ンの形成方法

Also Published As

Publication number Publication date
JPS63177518A (ja) 1988-07-21

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Legal Events

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