JPH0510800B2 - - Google Patents
Info
- Publication number
- JPH0510800B2 JPH0510800B2 JP10442084A JP10442084A JPH0510800B2 JP H0510800 B2 JPH0510800 B2 JP H0510800B2 JP 10442084 A JP10442084 A JP 10442084A JP 10442084 A JP10442084 A JP 10442084A JP H0510800 B2 JPH0510800 B2 JP H0510800B2
- Authority
- JP
- Japan
- Prior art keywords
- tube
- end surface
- open end
- lid member
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 11
- 230000006698 induction Effects 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 33
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 14
- 229910052799 carbon Inorganic materials 0.000 description 14
- 239000000112 cooling gas Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000013459 approach Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Plasma Technology (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10442084A JPS6168900A (ja) | 1984-05-25 | 1984-05-25 | プラズマト−チの着火方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10442084A JPS6168900A (ja) | 1984-05-25 | 1984-05-25 | プラズマト−チの着火方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6168900A JPS6168900A (ja) | 1986-04-09 |
| JPH0510800B2 true JPH0510800B2 (enrdf_load_stackoverflow) | 1993-02-10 |
Family
ID=14380198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10442084A Granted JPS6168900A (ja) | 1984-05-25 | 1984-05-25 | プラズマト−チの着火方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6168900A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02260399A (ja) * | 1989-03-31 | 1990-10-23 | Fuji Denpa Koki Kk | 高気圧プラズマアーク発生方法 |
| JPH0523496U (ja) * | 1991-09-09 | 1993-03-26 | 株式会社三社電機製作所 | 減圧用インダクシヨンプラズマトーチ |
| CN103094038B (zh) | 2011-10-27 | 2017-01-11 | 松下知识产权经营株式会社 | 等离子体处理装置以及等离子体处理方法 |
| JP6037292B2 (ja) | 2013-08-20 | 2016-12-07 | パナソニックＩｐマネジメント株式会社 | プラズマ処理装置及びプラズマ処理方法 |
-
1984
- 1984-05-25 JP JP10442084A patent/JPS6168900A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6168900A (ja) | 1986-04-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |