JPH04980B2 - - Google Patents

Info

Publication number
JPH04980B2
JPH04980B2 JP56176998A JP17699881A JPH04980B2 JP H04980 B2 JPH04980 B2 JP H04980B2 JP 56176998 A JP56176998 A JP 56176998A JP 17699881 A JP17699881 A JP 17699881A JP H04980 B2 JPH04980 B2 JP H04980B2
Authority
JP
Japan
Prior art keywords
formula
carbon atoms
atom
group
catalyst according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56176998A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57118553A (en
Inventor
Edowaado Guriin Jooji
Aabingu Edowaado
Piitaa Sutaaku Baanaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS57118553A publication Critical patent/JPS57118553A/ja
Publication of JPH04980B2 publication Critical patent/JPH04980B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/687Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08Saturated oxiranes
    • C08G65/10Saturated oxiranes characterised by the catalysts used
    • C08G65/105Onium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/36Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41Compounds containing sulfur bound to oxygen
    • C08K5/42Sulfonic acids; Derivatives thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
JP56176998A 1980-11-04 1981-11-04 Sulfoxonium salt, polymerizable composition containing same and use as polymerization catalyst Granted JPS57118553A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8035382 1980-11-04

Publications (2)

Publication Number Publication Date
JPS57118553A JPS57118553A (en) 1982-07-23
JPH04980B2 true JPH04980B2 (zh) 1992-01-09

Family

ID=10517075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56176998A Granted JPS57118553A (en) 1980-11-04 1981-11-04 Sulfoxonium salt, polymerizable composition containing same and use as polymerization catalyst

Country Status (5)

Country Link
US (1) US4398014A (zh)
EP (1) EP0054509B1 (zh)
JP (1) JPS57118553A (zh)
CA (1) CA1181757A (zh)
DE (1) DE3174336D1 (zh)

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DE3335933A1 (de) * 1983-10-04 1985-04-18 Rütgerswerke AG, 6000 Frankfurt Mehrkomponenten-bindemittel mit verlaengerter verarbeitbarkeitszeit
ATE37242T1 (de) * 1984-02-10 1988-09-15 Ciba Geigy Ag Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung.
GB8414525D0 (en) * 1984-06-07 1984-07-11 Ciba Geigy Ag Sulphoxonium salts
US4708925A (en) * 1984-12-11 1987-11-24 Minnesota Mining And Manufacturing Company Photosolubilizable compositions containing novolac phenolic resin
US4737426A (en) * 1985-05-15 1988-04-12 Ciba-Geigy Corporation Cyclic acetals or ketals of beta-keto esters or amides
US4663269A (en) * 1985-08-07 1987-05-05 Polytechnic Institute Of New York Method of forming highly sensitive photoresist film in the absence of water
GB2180240B (en) * 1985-09-04 1989-08-23 Ciba Geigy Ag Curing cationically polymerisable compounds by irradiation
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
DE3604580A1 (de) * 1986-02-14 1987-08-20 Basf Ag Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
DE3766315D1 (de) * 1986-08-06 1991-01-03 Ciba Geigy Ag Negativ-photoresist auf basis von polyphenolen und epoxidverbindungen oder vinylethern.
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
GB2238787B (en) * 1989-12-06 1993-03-03 Ciba Geigy Ag Preparation of sulphoxonium salts
JP2602992B2 (ja) * 1990-11-15 1997-04-23 日立化成工業株式会社 化学めつき用接着剤組成物,化学めつき用接着剤フイルムおよび印刷配線板の製造法
JPH06107913A (ja) * 1992-08-10 1994-04-19 Siemens Ag 反応樹脂混合物
US5679719A (en) * 1993-03-24 1997-10-21 Loctite Corporation Method of preparing fiber/resin composites
US5565499A (en) * 1993-03-24 1996-10-15 Loctite Corporation Filament-winding compositions for fiber/resin composites
US5539012A (en) * 1993-08-18 1996-07-23 Loctite Corporation Fiber/resin composites and method of preparation
EP0646580B1 (de) * 1993-09-16 2000-05-31 Ciba SC Holding AG Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen
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ES2144836T3 (es) * 1996-07-29 2000-06-16 Ciba Sc Holding Ag Composicion liquida reticulable por radiacion, en especial para estereolitografia.
GB9921779D0 (en) * 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
US20040106769A1 (en) * 2000-07-11 2004-06-03 Hatton Kevin Brian High functional polymers
EP1322482B2 (en) * 2000-09-01 2014-11-19 Digiglass Pty. Ltd. Image carrying laminated material
US6911109B2 (en) * 2000-12-11 2005-06-28 Henkel Corporation Two-part, room temperature curable epoxy resin/ (meth)acrylate compositions and process for using same to bond substrates
CN101706639A (zh) 2002-05-03 2010-05-12 Dsmip财产有限公司 可辐射固化树脂组合物及利用该组合物的快速成型方法
GB0212977D0 (en) 2002-06-06 2002-07-17 Vantico Ag Actinic radiation curable compositions and their use
KR101109977B1 (ko) 2003-07-23 2012-03-13 디에스엠 아이피 어셋츠 비.브이. 점도 감소성 방사선 경화 수지 조성물
US8287611B2 (en) 2005-01-28 2012-10-16 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
US7591865B2 (en) 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
SE529306C2 (sv) 2005-03-18 2007-06-26 Perstorp Specialty Chem Ab Ultravioletthärdande hartskomposition
US7365104B2 (en) * 2005-03-31 2008-04-29 Eastman Kodak Company Light curable articles containing azinium salts
US8871335B2 (en) * 2005-08-31 2014-10-28 Kuraray America Inc. Solar control laminate
US7625627B2 (en) * 2005-12-30 2009-12-01 E.I. Du Pont De Nemours And Company Decorative polyvinyl butyral solar control laminates
US20070172636A1 (en) * 2005-12-30 2007-07-26 Smith Rebecca L Decorative sheets having enhanced adhesion and laminates prepared therefrom
US20070196630A1 (en) * 2005-12-30 2007-08-23 Hayes Richard A Decorative solar control laminates
US20070172637A1 (en) * 2005-12-30 2007-07-26 Hayes Richard A Decorative sheets having enhanced adhesion and penetration resistant laminates prepared therefrom
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
WO2008079934A2 (en) 2006-12-21 2008-07-03 Saint-Gobain Abrasives, Inc. Low corrosion abrasive articles and methods for forming same
US20100190881A1 (en) 2009-01-28 2010-07-29 3D Systems, Incorporated Radiation Curable Compositions Useful in Solid Freeform Fabrication Systems
EP2406318B1 (en) 2009-03-13 2021-04-21 DSM IP Assets B.V. Radiation curable resin composition and rapid three-dimensional imaging process using the same
KR101995185B1 (ko) 2009-12-17 2019-07-01 디에스엠 아이피 어셋츠 비.브이. 트라이아릴 설포늄 보레이트 양이온 광개시제를 포함하는 적층식 제작을 위한 액체 방사선 경화성 수지
CN102725689B (zh) 2010-01-22 2014-10-08 帝斯曼知识产权资产管理有限公司 能固化成具有选择性视觉效果的层的液体可辐射固化树脂及其使用方法
EP2502728B1 (en) 2011-03-23 2017-01-04 DSM IP Assets B.V. Lightweight and high strength three-dimensional articles producible by additive fabrication processes
JP2019516823A (ja) 2016-04-08 2019-06-20 ソルベイ スペシャルティ ポリマーズ ユーエスエー, エルエルシー 光硬化性ポリマー、光硬化性ポリマー組成物、及びこれを含むリソグラフィープロセス
ES2685280B2 (es) 2017-03-31 2019-06-21 Centro Tecnologico De Nanomateriales Avanzados S L Composición de resina curable por radiación y procedimiento para su obtención
WO2021124114A1 (en) 2019-12-18 2021-06-24 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same

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Also Published As

Publication number Publication date
DE3174336D1 (en) 1986-05-15
EP0054509A3 (en) 1982-08-11
CA1181757A (en) 1985-01-29
JPS57118553A (en) 1982-07-23
EP0054509A2 (de) 1982-06-23
EP0054509B1 (de) 1986-04-09
US4398014A (en) 1983-08-09

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