JPH049373B2 - - Google Patents
Info
- Publication number
- JPH049373B2 JPH049373B2 JP57204571A JP20457182A JPH049373B2 JP H049373 B2 JPH049373 B2 JP H049373B2 JP 57204571 A JP57204571 A JP 57204571A JP 20457182 A JP20457182 A JP 20457182A JP H049373 B2 JPH049373 B2 JP H049373B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaned
- ultraviolet
- cleaning
- lamp
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 claims description 20
- 239000000356 contaminant Substances 0.000 claims description 13
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 5
- 229910001882 dioxygen Inorganic materials 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 239000002957 persistent organic pollutant Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Treating Waste Gases (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57204571A JPS5994823A (ja) | 1982-11-24 | 1982-11-24 | 紫外線洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57204571A JPS5994823A (ja) | 1982-11-24 | 1982-11-24 | 紫外線洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5994823A JPS5994823A (ja) | 1984-05-31 |
| JPH049373B2 true JPH049373B2 (zh) | 1992-02-20 |
Family
ID=16492671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57204571A Granted JPS5994823A (ja) | 1982-11-24 | 1982-11-24 | 紫外線洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5994823A (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018168270A1 (ja) * | 2017-03-14 | 2018-09-20 | 本田技研工業株式会社 | レーザ加工機 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0659453B2 (ja) * | 1986-06-06 | 1994-08-10 | 株式会社東芝 | 基板へのレジスト塗布方法 |
| JPH0644976B2 (ja) * | 1989-04-26 | 1994-06-15 | 松下電器産業株式会社 | 光触媒の再生方法及び光触媒による脱臭装置 |
| JPH02299287A (ja) * | 1989-05-15 | 1990-12-11 | Shin Etsu Chem Co Ltd | プリント回路基板の洗浄方法 |
| JPH03254192A (ja) * | 1990-03-02 | 1991-11-13 | Matsushita Electric Works Ltd | 多層配線基板 |
| JPH1190370A (ja) * | 1997-09-22 | 1999-04-06 | Iwasaki Electric Co Ltd | 表面処理装置及びその処理方法 |
| WO2009088984A1 (en) * | 2008-01-08 | 2009-07-16 | Newport Corporation | Novel optical filters for use with mercury arc lamp monitoring applications |
| JP6967487B2 (ja) * | 2018-05-24 | 2021-11-17 | 本田技研工業株式会社 | レーザ加工機 |
-
1982
- 1982-11-24 JP JP57204571A patent/JPS5994823A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018168270A1 (ja) * | 2017-03-14 | 2018-09-20 | 本田技研工業株式会社 | レーザ加工機 |
| US11285566B2 (en) | 2017-03-14 | 2022-03-29 | Honda Motor Co., Ltd. | Laser machining apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5994823A (ja) | 1984-05-31 |
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