JPH048938B2 - - Google Patents
Info
- Publication number
- JPH048938B2 JPH048938B2 JP61229858A JP22985886A JPH048938B2 JP H048938 B2 JPH048938 B2 JP H048938B2 JP 61229858 A JP61229858 A JP 61229858A JP 22985886 A JP22985886 A JP 22985886A JP H048938 B2 JPH048938 B2 JP H048938B2
- Authority
- JP
- Japan
- Prior art keywords
- size
- value
- current
- dimensions
- dimension
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61229858A JPS6386432A (ja) | 1986-09-30 | 1986-09-30 | 電子ビ−ム描画方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61229858A JPS6386432A (ja) | 1986-09-30 | 1986-09-30 | 電子ビ−ム描画方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6386432A JPS6386432A (ja) | 1988-04-16 |
| JPH048938B2 true JPH048938B2 (enExample) | 1992-02-18 |
Family
ID=16898794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61229858A Granted JPS6386432A (ja) | 1986-09-30 | 1986-09-30 | 電子ビ−ム描画方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6386432A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6998219B2 (en) | 2001-06-27 | 2006-02-14 | University Of South Florida | Maskless photolithography for etching and deposition |
| US6764796B2 (en) | 2001-06-27 | 2004-07-20 | University Of South Florida | Maskless photolithography using plasma displays |
| US6544698B1 (en) | 2001-06-27 | 2003-04-08 | University Of South Florida | Maskless 2-D and 3-D pattern generation photolithography |
| US7095484B1 (en) | 2001-06-27 | 2006-08-22 | University Of South Florida | Method and apparatus for maskless photolithography |
-
1986
- 1986-09-30 JP JP61229858A patent/JPS6386432A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6386432A (ja) | 1988-04-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8188443B2 (en) | Focusing method of charged particle beam and astigmatism adjusting method of charged particle | |
| JP3288794B2 (ja) | 荷電ビーム補正方法及びマーク検出方法 | |
| JPH0336299B2 (enExample) | ||
| US5894132A (en) | Charged-particle-beam projection-exposure apparatus with focus and tilt adjustments | |
| EP0148784B1 (en) | Calibration of electron beam apparatus | |
| JPH048938B2 (enExample) | ||
| JPH04269613A (ja) | 荷電ビームの焦点合わせ方法 | |
| JP2941732B2 (ja) | 荷電ビーム描画装置におけるビーム調整方法 | |
| JP3282324B2 (ja) | 荷電粒子ビーム露光方法 | |
| JPH04303918A (ja) | 荷電ビーム描画装置 | |
| JPH04116915A (ja) | 描画ビーム径調整方法 | |
| JPH03173119A (ja) | 電子線描画装置 | |
| JPH0414490B2 (enExample) | ||
| JP3157968B2 (ja) | 荷電粒子ビーム露光方法 | |
| JP2848417B2 (ja) | 荷電粒子ビーム露光装置および露光方法 | |
| JP3101100B2 (ja) | 電子ビーム露光装置 | |
| JP3550476B2 (ja) | 荷電粒子ビーム加工方法および加工装置 | |
| JP2605111B2 (ja) | 電子ビーム露光装置の電子ビーム補正方法 | |
| JP3450437B2 (ja) | 電子ビーム露光方法、現像方法及び装置 | |
| JPH11224642A (ja) | 電子ビーム露光装置および電子ビーム露光方法 | |
| JP2000182937A (ja) | 荷電粒子ビーム描画装置 | |
| JPS6231488B2 (enExample) | ||
| JP3110363B2 (ja) | 荷電ビーム描画装置の調整方法 | |
| JPH10284384A (ja) | 荷電粒子ビーム露光方法及び装置 | |
| JP3002246B2 (ja) | 荷電ビーム補正方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
| R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| EXPY | Cancellation because of completion of term |