JPH0480989B2 - - Google Patents
Info
- Publication number
- JPH0480989B2 JPH0480989B2 JP22196884A JP22196884A JPH0480989B2 JP H0480989 B2 JPH0480989 B2 JP H0480989B2 JP 22196884 A JP22196884 A JP 22196884A JP 22196884 A JP22196884 A JP 22196884A JP H0480989 B2 JPH0480989 B2 JP H0480989B2
- Authority
- JP
- Japan
- Prior art keywords
- boron
- cvd
- film
- layer
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/28—Deposition of only one other non-metal element
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22196884A JPS61104077A (ja) | 1984-10-24 | 1984-10-24 | ホウ素皮膜の形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22196884A JPS61104077A (ja) | 1984-10-24 | 1984-10-24 | ホウ素皮膜の形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61104077A JPS61104077A (ja) | 1986-05-22 |
JPH0480989B2 true JPH0480989B2 (en:Method) | 1992-12-21 |
Family
ID=16774985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22196884A Granted JPS61104077A (ja) | 1984-10-24 | 1984-10-24 | ホウ素皮膜の形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61104077A (en:Method) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5076601B2 (ja) * | 2006-06-02 | 2012-11-21 | 株式会社豊田中央研究所 | 導電性耐食材料の製造方法 |
CN108220922B (zh) | 2016-12-15 | 2020-12-29 | 东京毅力科创株式会社 | 成膜方法、硼膜以及成膜装置 |
-
1984
- 1984-10-24 JP JP22196884A patent/JPS61104077A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61104077A (ja) | 1986-05-22 |
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