JPH0468769B2 - - Google Patents

Info

Publication number
JPH0468769B2
JPH0468769B2 JP55165969A JP16596980A JPH0468769B2 JP H0468769 B2 JPH0468769 B2 JP H0468769B2 JP 55165969 A JP55165969 A JP 55165969A JP 16596980 A JP16596980 A JP 16596980A JP H0468769 B2 JPH0468769 B2 JP H0468769B2
Authority
JP
Japan
Prior art keywords
resist
layer
resist material
composite
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55165969A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5691428A (en
Inventor
Edoin Hawaado Richaado
Rin Fu Eurin
Deiuitsudo Jatsukuru Roorensu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Technologies Inc filed Critical AT&T Technologies Inc
Publication of JPS5691428A publication Critical patent/JPS5691428A/ja
Publication of JPH0468769B2 publication Critical patent/JPH0468769B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP16596980A 1979-11-27 1980-11-27 Composite resist and method of forming pattern in composite resist Granted JPS5691428A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US9780979A 1979-11-27 1979-11-27

Publications (2)

Publication Number Publication Date
JPS5691428A JPS5691428A (en) 1981-07-24
JPH0468769B2 true JPH0468769B2 (enrdf_load_stackoverflow) 1992-11-04

Family

ID=22265225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16596980A Granted JPS5691428A (en) 1979-11-27 1980-11-27 Composite resist and method of forming pattern in composite resist

Country Status (6)

Country Link
JP (1) JPS5691428A (enrdf_load_stackoverflow)
CA (1) CA1155238A (enrdf_load_stackoverflow)
DE (1) DE3044434A1 (enrdf_load_stackoverflow)
FR (1) FR2470402B1 (enrdf_load_stackoverflow)
GB (1) GB2064152B (enrdf_load_stackoverflow)
NL (1) NL8006438A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3131031A1 (de) * 1981-08-05 1983-02-24 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen der felddotierung beim herstellen von integrierten komplementaeren mos-feldeffekttransistoren
US5139922A (en) * 1987-04-10 1992-08-18 Matsushita Electronics Corporation Method of making resist pattern
DE102006050363B4 (de) 2006-10-25 2018-08-16 Advanced Mask Technology Center Gmbh & Co. Kg Verfahren zur Herstellung einer Fotomaske, Verfahren zur Strukturierung einer Schicht oder eines Schichtstapels und Resiststapel auf einem Maskensubstrat

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1622302A1 (de) * 1968-02-01 1970-10-29 Telefunken Patent Verfahren zum photographischen UEbertragen von Strukturen auf Halbleiterkoerper
US3934057A (en) * 1973-12-19 1976-01-20 International Business Machines Corporation High sensitivity positive resist layers and mask formation process
JPS51129190A (en) * 1975-05-02 1976-11-10 Fujitsu Ltd Manufacturing method of semiconductor
US4024293A (en) * 1975-12-10 1977-05-17 International Business Machines Corporation High sensitivity resist system for lift-off metallization
JPS5387668A (en) * 1977-01-13 1978-08-02 Toshiba Corp Forming method of patterns
US4211834A (en) * 1977-12-30 1980-07-08 International Business Machines Corporation Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask

Also Published As

Publication number Publication date
JPS5691428A (en) 1981-07-24
CA1155238A (en) 1983-10-11
FR2470402B1 (fr) 1987-03-20
FR2470402A1 (fr) 1981-05-29
NL8006438A (nl) 1981-07-01
DE3044434A1 (de) 1981-08-27
GB2064152B (en) 1984-02-08
GB2064152A (en) 1981-06-10

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