GB2064152B - High-resolution resist composite - Google Patents

High-resolution resist composite

Info

Publication number
GB2064152B
GB2064152B GB8037599A GB8037599A GB2064152B GB 2064152 B GB2064152 B GB 2064152B GB 8037599 A GB8037599 A GB 8037599A GB 8037599 A GB8037599 A GB 8037599A GB 2064152 B GB2064152 B GB 2064152B
Authority
GB
United Kingdom
Prior art keywords
resolution resist
resist composite
composite
resolution
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8037599A
Other versions
GB2064152A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB2064152A publication Critical patent/GB2064152A/en
Application granted granted Critical
Publication of GB2064152B publication Critical patent/GB2064152B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB8037599A 1979-11-27 1980-11-24 High-resolution resist composite Expired GB2064152B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US9780979A 1979-11-27 1979-11-27

Publications (2)

Publication Number Publication Date
GB2064152A GB2064152A (en) 1981-06-10
GB2064152B true GB2064152B (en) 1984-02-08

Family

ID=22265225

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8037599A Expired GB2064152B (en) 1979-11-27 1980-11-24 High-resolution resist composite

Country Status (6)

Country Link
JP (1) JPS5691428A (en)
CA (1) CA1155238A (en)
DE (1) DE3044434A1 (en)
FR (1) FR2470402B1 (en)
GB (1) GB2064152B (en)
NL (1) NL8006438A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3131031A1 (en) * 1981-08-05 1983-02-24 Siemens AG, 1000 Berlin und 8000 München Method for producing area doping when fabricating integrated complementary MOS field effect transistors
US5139922A (en) * 1987-04-10 1992-08-18 Matsushita Electronics Corporation Method of making resist pattern
DE102006050363B4 (en) 2006-10-25 2018-08-16 Advanced Mask Technology Center Gmbh & Co. Kg A process for producing a photomask, a process for structuring a layer or a layer stack and resist stacks on a mask substrate

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1622302A1 (en) * 1968-02-01 1970-10-29 Telefunken Patent Process for the photographic transfer of structures onto semiconductor bodies
US3934057A (en) * 1973-12-19 1976-01-20 International Business Machines Corporation High sensitivity positive resist layers and mask formation process
JPS51129190A (en) * 1975-05-02 1976-11-10 Fujitsu Ltd Manufacturing method of semiconductor
US4024293A (en) * 1975-12-10 1977-05-17 International Business Machines Corporation High sensitivity resist system for lift-off metallization
JPS5387668A (en) * 1977-01-13 1978-08-02 Toshiba Corp Forming method of patterns
US4211834A (en) * 1977-12-30 1980-07-08 International Business Machines Corporation Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask

Also Published As

Publication number Publication date
JPS5691428A (en) 1981-07-24
JPH0468769B2 (en) 1992-11-04
GB2064152A (en) 1981-06-10
FR2470402A1 (en) 1981-05-29
DE3044434A1 (en) 1981-08-27
CA1155238A (en) 1983-10-11
NL8006438A (en) 1981-07-01
FR2470402B1 (en) 1987-03-20

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Effective date: 20001123