JPH0466097B2 - - Google Patents
Info
- Publication number
- JPH0466097B2 JPH0466097B2 JP60117103A JP11710385A JPH0466097B2 JP H0466097 B2 JPH0466097 B2 JP H0466097B2 JP 60117103 A JP60117103 A JP 60117103A JP 11710385 A JP11710385 A JP 11710385A JP H0466097 B2 JPH0466097 B2 JP H0466097B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- layer
- film
- heat treatment
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 claims description 7
- 229920003986 novolac Polymers 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60117103A JPS61276221A (ja) | 1985-05-30 | 1985-05-30 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60117103A JPS61276221A (ja) | 1985-05-30 | 1985-05-30 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61276221A JPS61276221A (ja) | 1986-12-06 |
JPH0466097B2 true JPH0466097B2 (hu) | 1992-10-22 |
Family
ID=14703474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60117103A Granted JPS61276221A (ja) | 1985-05-30 | 1985-05-30 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61276221A (hu) |
-
1985
- 1985-05-30 JP JP60117103A patent/JPS61276221A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61276221A (ja) | 1986-12-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0466097B2 (hu) | ||
JPH0458167B2 (hu) | ||
JPS6148771B2 (hu) | ||
JPH0244140B2 (hu) | ||
JPS6211491B2 (hu) | ||
JPS6130278Y2 (hu) | ||
JPS613489A (ja) | 半導体装置の製造方法 | |
JPS60110124A (ja) | 微細パタ−ン加工方法 | |
KR930006133B1 (ko) | 모스소자의 콘택트홀 형성방법 | |
JP2616820B2 (ja) | レジストパターンの形成方法 | |
JPS6154629A (ja) | フオト・レジストパタ−ンの形成方法 | |
JPH02244663A (ja) | リードフレームの製造方法 | |
KR950009293B1 (ko) | 식각선택비가 향상된 단층레지스트 패턴 형성방법 | |
JPH0582438A (ja) | 半導体装置の製造方法 | |
JPS636557A (ja) | 微細パタ−ン形成方法 | |
JPH0294439A (ja) | 半導体装置の製造方法 | |
JPH0410217B2 (hu) | ||
JPS6411938B2 (hu) | ||
JPH0551892B2 (hu) | ||
JPH0685083B2 (ja) | パタ−ン形成方法 | |
JPS6126221A (ja) | 半導体装置等の製造方法 | |
JPH0828318B2 (ja) | パターン形成方法 | |
JPS61271838A (ja) | 半導体装置の製造方法 | |
JPH0376574B2 (hu) | ||
JPS62117342A (ja) | 多層配線構造の形成方法 |