JPH0464159B2 - - Google Patents

Info

Publication number

JPH0464159B2

JPH0464159B2 JP61106690A JP10669086A JPH0464159B2 JP H0464159 B2 JPH0464159 B2 JP H0464159B2 JP 61106690 A JP61106690 A JP 61106690A JP 10669086 A JP10669086 A JP 10669086A JP H0464159 B2 JPH0464159 B2 JP H0464159B2

Authority

JP

Japan

Prior art keywords

insulating film

tio

resistivity

film

display panel

Prior art date

1986-05-12

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Links

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• 229910010413 TiO 2 Inorganic materials 0.000 claims description 35
• 238000005566 electron beam evaporation Methods 0.000 claims description 12
• 239000000758 substrate Substances 0.000 claims description 8
• 239000008188 pellet Substances 0.000 claims description 7
• 238000000034 method Methods 0.000 claims description 6
• 239000000203 mixture Substances 0.000 claims description 5
• 238000010304 firing Methods 0.000 claims description 4
• 239000000843 powder Substances 0.000 claims description 4
• 238000010030 laminating Methods 0.000 claims description 3
• 238000004519 manufacturing process Methods 0.000 claims description 3
• 238000002156 mixing Methods 0.000 claims description 2
• 238000000465 moulding Methods 0.000 claims description 2
• 239000010408 film Substances 0.000 description 49
• 229910004298 SiO 2 Inorganic materials 0.000 description 13
• 239000010409 thin film Substances 0.000 description 11
• 239000007789 gas Substances 0.000 description 7
• 239000011521 glass Substances 0.000 description 5
• 239000000463 material Substances 0.000 description 5
• 229910052760 oxygen Inorganic materials 0.000 description 3
• 238000004544 sputter deposition Methods 0.000 description 3
• 238000010894 electron beam technology Methods 0.000 description 2
• 238000005516 engineering process Methods 0.000 description 2
• 238000002474 experimental method Methods 0.000 description 2
• 238000010438 heat treatment Methods 0.000 description 2
• 239000000155 melt Substances 0.000 description 2
• 238000007740 vapor deposition Methods 0.000 description 2
• 229910006404 SnO 2 Inorganic materials 0.000 description 1
• QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
• 230000015572 biosynthetic process Effects 0.000 description 1
• 230000001010 compromised effect Effects 0.000 description 1
• 238000000354 decomposition reaction Methods 0.000 description 1
• 230000002950 deficient Effects 0.000 description 1
• 238000000151 deposition Methods 0.000 description 1
• 238000010586 diagram Methods 0.000 description 1
• 230000000694 effects Effects 0.000 description 1
• 230000005684 electric field Effects 0.000 description 1
• 238000005401 electroluminescence Methods 0.000 description 1
• 238000001017 electron-beam sputter deposition Methods 0.000 description 1
• 238000005530 etching Methods 0.000 description 1
• 230000008020 evaporation Effects 0.000 description 1
• 238000001704 evaporation Methods 0.000 description 1
• 230000001747 exhibiting effect Effects 0.000 description 1
• 239000011159 matrix material Substances 0.000 description 1
• 230000008018 melting Effects 0.000 description 1
• 238000002844 melting Methods 0.000 description 1
• 239000001301 oxygen Substances 0.000 description 1
• 239000002245 particle Substances 0.000 description 1
• 238000002161 passivation Methods 0.000 description 1
• 238000000059 patterning Methods 0.000 description 1