JPH0462576B2 - - Google Patents

Info

Publication number
JPH0462576B2
JPH0462576B2 JP59125000A JP12500084A JPH0462576B2 JP H0462576 B2 JPH0462576 B2 JP H0462576B2 JP 59125000 A JP59125000 A JP 59125000A JP 12500084 A JP12500084 A JP 12500084A JP H0462576 B2 JPH0462576 B2 JP H0462576B2
Authority
JP
Japan
Prior art keywords
developer
contrast
support
exposure
comparative example
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59125000A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6012547A (ja
Inventor
Maabin Ruisu Jeemuzu
Oosuchin Ooensu Robaato
Josefu Burakenii Andoryuu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MAIKUROSHII Inc
Original Assignee
MAIKUROSHII Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MAIKUROSHII Inc filed Critical MAIKUROSHII Inc
Publication of JPS6012547A publication Critical patent/JPS6012547A/ja
Publication of JPH0462576B2 publication Critical patent/JPH0462576B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP59125000A 1983-06-17 1984-06-18 高コントラストホトレジスト現像剤 Granted JPS6012547A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US50557183A 1983-06-17 1983-06-17
US505571 1983-06-17

Publications (2)

Publication Number Publication Date
JPS6012547A JPS6012547A (ja) 1985-01-22
JPH0462576B2 true JPH0462576B2 (OSRAM) 1992-10-06

Family

ID=24010858

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59125000A Granted JPS6012547A (ja) 1983-06-17 1984-06-18 高コントラストホトレジスト現像剤

Country Status (6)

Country Link
EP (1) EP0129106B1 (OSRAM)
JP (1) JPS6012547A (OSRAM)
KR (1) KR860001559B1 (OSRAM)
CA (1) CA1251350A (OSRAM)
DE (1) DE3469074D1 (OSRAM)
HK (1) HK49289A (OSRAM)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0638396B2 (ja) * 1985-02-04 1994-05-18 ソニー株式会社 ポジタイプフオトレジストの現像方法
US4710449A (en) * 1986-01-29 1987-12-01 Petrarch Systems, Inc. High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants
JPS63158552A (ja) * 1986-12-23 1988-07-01 Fuji Photo Film Co Ltd 平版印刷版の製造方法
JPS6472154A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Positive type photoresist developing solution
JPH01177541A (ja) * 1988-01-07 1989-07-13 Fuji Photo Film Co Ltd 平版印刷版の製造方法
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5743892B2 (OSRAM) * 1973-09-04 1982-09-17
JPS608494B2 (ja) * 1978-03-01 1985-03-04 富士通株式会社 ポジ型レジスト像の形成法
DE2921142A1 (de) * 1979-05-25 1980-12-11 Bayer Ag Verwendung von perfluoralkansulfonamid- salzen als tenside
JPS5740429A (en) * 1980-08-25 1982-03-06 Chisso Corp 4-(4-n-alkyl-1-cyclohexen-1-yl)-4'-fluorobiphenyl

Also Published As

Publication number Publication date
KR850000704A (ko) 1985-02-28
JPS6012547A (ja) 1985-01-22
EP0129106B1 (en) 1988-01-27
DE3469074D1 (en) 1988-03-03
CA1251350A (en) 1989-03-21
KR860001559B1 (ko) 1986-10-04
HK49289A (en) 1989-06-30
EP0129106A1 (en) 1984-12-27

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees