HK49289A - High contrast photoresist developer - Google Patents

High contrast photoresist developer Download PDF

Info

Publication number
HK49289A
HK49289A HK492/89A HK49289A HK49289A HK 49289 A HK49289 A HK 49289A HK 492/89 A HK492/89 A HK 492/89A HK 49289 A HK49289 A HK 49289A HK 49289 A HK49289 A HK 49289A
Authority
HK
Hong Kong
Prior art keywords
developer
integer
formula
photoresist
contrast
Prior art date
Application number
HK492/89A
Other languages
German (de)
English (en)
French (fr)
Inventor
James Marvin Lewis
Robert Austin Owens
Andrew Joseph Blakeney
Original Assignee
Petrarch Systems, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Petrarch Systems, Inc. filed Critical Petrarch Systems, Inc.
Publication of HK49289A publication Critical patent/HK49289A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
HK492/89A 1983-06-17 1989-06-22 High contrast photoresist developer HK49289A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US50557183A 1983-06-17 1983-06-17

Publications (1)

Publication Number Publication Date
HK49289A true HK49289A (en) 1989-06-30

Family

ID=24010858

Family Applications (1)

Application Number Title Priority Date Filing Date
HK492/89A HK49289A (en) 1983-06-17 1989-06-22 High contrast photoresist developer

Country Status (6)

Country Link
EP (1) EP0129106B1 (OSRAM)
JP (1) JPS6012547A (OSRAM)
KR (1) KR860001559B1 (OSRAM)
CA (1) CA1251350A (OSRAM)
DE (1) DE3469074D1 (OSRAM)
HK (1) HK49289A (OSRAM)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0638396B2 (ja) * 1985-02-04 1994-05-18 ソニー株式会社 ポジタイプフオトレジストの現像方法
US4710449A (en) * 1986-01-29 1987-12-01 Petrarch Systems, Inc. High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants
JPS63158552A (ja) * 1986-12-23 1988-07-01 Fuji Photo Film Co Ltd 平版印刷版の製造方法
JPS6472154A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Positive type photoresist developing solution
JPH01177541A (ja) * 1988-01-07 1989-07-13 Fuji Photo Film Co Ltd 平版印刷版の製造方法
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5743892B2 (OSRAM) * 1973-09-04 1982-09-17
JPS608494B2 (ja) * 1978-03-01 1985-03-04 富士通株式会社 ポジ型レジスト像の形成法
DE2921142A1 (de) * 1979-05-25 1980-12-11 Bayer Ag Verwendung von perfluoralkansulfonamid- salzen als tenside
JPS5740429A (en) * 1980-08-25 1982-03-06 Chisso Corp 4-(4-n-alkyl-1-cyclohexen-1-yl)-4'-fluorobiphenyl

Also Published As

Publication number Publication date
KR850000704A (ko) 1985-02-28
JPS6012547A (ja) 1985-01-22
JPH0462576B2 (OSRAM) 1992-10-06
EP0129106B1 (en) 1988-01-27
DE3469074D1 (en) 1988-03-03
CA1251350A (en) 1989-03-21
KR860001559B1 (ko) 1986-10-04
EP0129106A1 (en) 1984-12-27

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PE Patent expired

Effective date: 20040527

PE Patent expired